SCHEMBL195214

SCHEMBL195214

C=CC(=O)O/C=C\C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30817329 1.00 TSHR (0.38)
SCHEMBL34966 1.00
SCHEMBL865963 1.00
SCHEMBL28122355 0.97
SCHEMBL28284465 0.97
SCHEMBL28259165 0.97
SCHEMBL28384358 0.97
Ethylene SCHEMBL27439591 0.97 TSHR (0.37)
Carbamic Acid SCHEMBL20496119 0.91 TSHR (0.36)
Ethylene Glycol SCHEMBL9234317 0.91 TSHR (0.45)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 227 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3182204-B1 PLANOGRAPHIC PRINTING PLATE PRECURSOR USING A POLYMERIZABLE COMPOSITION FUJIFILM CORP (JP) 2021-10-20 EP disclosed
EP-3124548-B1 MICROLENS COMPRING A TRANSPARENT FILM AND SOLID-STATE IMAGING DEVICE USING THE SAME FUJIFILM CORP (JP) 2020-12-02 EP disclosed
CN-105467765-B Photosensitive composition, method for producing cured film, and use thereof 富士胶片株式会社 2020-04-24 CN disclosed
US-10570240-B2 Active energy ray-curable composition and antistatic film FUJIFILM CORPORATION (JP) 2020-02-25 US disclosed
EP-2102709-B1 PIGMENT-DISPERSED COMPOSITION, CURABLE COMPOSITION, COLOR FILTER AND PRODUCTION METHOD THEREOF FUJIFILM CORP (JP) 2019-06-26 EP disclosed
US-10287422-B2 Dispersion composition, curable composition using the same, transparent film, microlens, and solid-state imaging device FUJIFILM CORPORATION (JP) 2019-05-14 US disclosed
EP-2102708-B1 CURABLE COMPOSITION, COLOR FILTER, AND MANUFACTURING METHOD OF THE SAME FUJIFILM CORP (JP) 2018-05-16 EP disclosed
US-9914788-B2 Active energy ray-curable composition and antistatic film FUJIFILM CORPORATION (JP) 2018-03-13 US disclosed
EP-1859954-B2 Planographic printing plate precursor and stack thereof FUJIFILM CORP (JP) 2017-11-08 EP disclosed
US-9810821-B2 Infrared ray cutoff filter FUJIFILM CORPORATION (JP) 2017-11-07 US disclosed
EP-1505441-A2 Alkali-soluble polymer and polymerizable composition thereof FUJI PHOTO FILM CO., LTD. (JP) 2005-02-09 EP disclosed
US-20040234893-A9 Resin composition and thermo/photosensitive composition FUJI PHOTO FILM CO., LTD. 2004-11-25 US disclosed
US-20040131972-A1 Resin composition and thermo/photosensitive composition FUJI PHOTO FILM CO., LTD. 2004-07-08 US disclosed
US-6746820-B2 CAPABLE OF FORMING AN IMAGE BY SCANNING EXPOSURE SUCH AS LASER; RESIST FOR FORMING A PRINTED WIRING BOARD, A COLOR FILTER OR A PHOSPHOR PATTERN MITSUBISHI PAPER MILLS LIMITED (JP) 2004-06-08 US disclosed
EP-1389521-A2 Thermosensitive/photosensitive resin composition Fuji Photo Film Co., Ltd. (JP) 2004-02-18 EP disclosed
US-20040009426-A1 Photopolymerizable monomers hardenable by an infrared exposure; electrostatic capacitance rate of increased ratio of such photosensitive formulation, is no more than 0.7 FUJI PHOTO FILM CO., LTD. 2004-01-15 US disclosed
EP-1369231-A2 Infrared photosensitive composition and image recording material for infrared exposure FUJI PHOTO FILM CO., LTD. (JP) 2003-12-10 EP disclosed
US-20030008239-A1 Image recording material FUJIFILM CORPORATION (JP) 2003-01-09 US disclosed
US-20020182537-A1 Light-sensitive composition and light-sensitive lithographic printing plate MITSUBISHI PAPER MILLS LIMITED (JP) 2002-12-05 US disclosed
EP-1182033-A1 Image recording material FUJI PHOTO FILM CO., LTD. (JP) 2002-02-27 EP disclosed