SCHEMBL195396

SCHEMBL195396

CCCCOC(=O)C=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL7567022 0.98 ATM (0.68)
SCHEMBL8992513 0.98 ATM (0.68)
Methyl Alcohol SCHEMBL5605876 0.98 ATM (0.68)
Alcohol SCHEMBL27686238 0.96 ATM (0.65)
SCHEMBL525121 0.93 HCAR2 (0.62)
Butyl Alcohol SCHEMBL27705263 0.92 ATM (0.61)
SCHEMBL6676413 0.91 HCAR2 (0.63)
SCHEMBL4783244 0.91 HCAR2 (0.63)
SCHEMBL6675004 0.91 HCAR2 (0.63)
SCHEMBL6676231 0.91 HCAR2 (0.63)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1317 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120004771-A Method for producing organic sulfinate compound 中国石油化工股份有限公司 2025-05-16 CN claimed
CN-119059908-A Preparation method of avermectin acid intermediate 3-formyl n-butyl crotonate 重庆英斯凯药业有限公司 2024-12-03 CN claimed
CN-118459859-A Preparation method of modified graphene quantum dot antibacterial agent and PET antibacterial master batch 孙福伟 2024-08-09 CN claimed
CN-112635715-B Lithium ion battery anode slurry, and homogenizing method and application thereof 湖北亿纬动力有限公司 2022-09-09 CN claimed
CN-114479759-A Semiconductor element flexible packaging agent, preparation method thereof and film packaging method 深圳市首骋新材料科技有限公司 2022-05-13 CN claimed
CN-112635715-A Lithium ion battery anode slurry, and homogenizing method and application thereof 湖北亿纬动力有限公司 2021-04-09 CN claimed
US-10705424-B2 Negative-working photoresist compositions for laser ablation and use thereof MERCK PATENT GMBH (DE) 2020-07-07 US claimed
US-9334488-B2 Xylose isomerase genes and their use in fermentation of pentose sugars DSM IP ASSETS B.V. (NL) 2016-05-10 US claimed
US-8710147-B2 Carbonyl-ene functionalized polyolefins CHEVRON ORONITE COMPANY LLC. (US) 2014-04-29 US claimed
CN-102532502-B Biological functionalization degradable polyester and preparation method thereof UNIV JINAN 2013-09-04 CN claimed
CN-102093352-A Key intermediate for minodronate, method for synthesizing key intermediate and method for synthesizing minodronate with intermediate XIANBIN SU 2011-06-15 CN claimed
EP-1173411-A1 POLYALDIMINES OF OLIGOMERIC AMINOBENZOIC ACID DERIVATIVES, AND THEIR USE FOR PREPARATION OF MOISTURE-CURABLE, STORAGE-STABLE, ONE-PART POLYREAS Finetech Ltd (IL) 2002-01-23 EP claimed
EP-0948553-B1 FRACTIONATED NOVOLAK RESIN FROM CRESOL-FORMALDEHYDE REACTION MIXTURE AND PHOTORESIST COMPOSITION THEREFROM CLARIANT FINANCE BVI LTD (VG) 2001-04-11 EP claimed
WO-2000064860-A1 POLYALDIMINES OF OLIGOMERIC AMINOBENZOIC ACID DERIVATIVES, AND THEIR USE FOR PREPARATION OF MOISTURE-CURABLE, STORAGE-STABLE, ONE-PART POLYREAS FINETECH LTD. (IL) 2000-11-02 WO claimed
US-5756594-A CATALYTIC POLYMERIZATION OF ALDEHYDE CARBOXYLATE MONOMER TO FORM POLYACETAL AND CROSSLINKING WITH POLYVINYL ETHERS, DIESTERS, DIEPOXIDES, ANHYDRIDES, DINITRILES AND DIACYL COMPOUNDS BASF AKTIENGESELLSCHAFT (DE) 1998-05-26 US claimed
US-5506332-A COPOLYMERIZING GLYOXYLIC ESTERS WITH CYCLIC FORMALS USING ANIONIC OR CATIONIC CATALYSTS BASF AKTIENGESELLSCHAFT (DE) 1996-04-09 US claimed
EP-0211667-B1 RADIATION-SENSITIVE RESIN COMPOSITION JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-03-11 EP claimed
EP-0457367-A1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-11-21 EP claimed
EP-0211667-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1987-02-25 EP claimed
US-4525541-A REACTION WITH AN ACETOACETATE COMPOUND NIPPON ZEON CO. LTD. (JP) 1985-06-25 US claimed