SCHEMBL195409

SCHEMBL195409

O=c1c(Cl)ccc2[nH]c3ccccc3cc1-2

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDR P35968 5/20 0.56
CHEK1 O14757 1/20 0.56
KDM4E B2RXH2 4/20 0.47
MAPT P10636 4/20 0.47
HPGD P15428 4/20 0.47
RAB9A P51151 3/20 0.47
MEN1 O00255 3/20 0.47
ALDH1A1 P00352 3/20 0.47
KMT2A Q03164 3/20 0.47
NPC1 O15118 2/20 0.47
CYP1A2 P05177 1/20 0.47
CYP2C9 P11712 1/20 0.47
CYP2C19 P33261 1/20 0.47
CASP3 P42574 1/20 0.47
SENP8 Q96LD8 1/20 0.47
SENP7 Q9BQF6 1/20 0.47
SENP6 Q9GZR1 1/20 0.47
DAO P14920 2/20 0.42
BRD4 O60885 2/20 0.42
DDO Q99489 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5384647 0.82 DAO (0.49) MAPTHPGDALDH1A1CYP1A2DAO
SCHEMBL7088772 0.80 KDR (0.56) KDRCHEK1KDM4EMAPTHPGD
SCHEMBL354610 0.80 KDR (0.56) KDRCHEK1KDM4EMAPTHPGD
SCHEMBL71078 0.80 KDR (0.56) KDRCHEK1KDM4EMAPTHPGD
SCHEMBL3234457 0.80 KDR (0.56) KDRCHEK1KDM4EMAPTHPGD
SCHEMBL9690611 0.80 KDR (0.56) KDRCHEK1KDM4EMAPTHPGD
SCHEMBL3735366 0.80 KDR (0.56) KDRCHEK1KDM4EMAPTHPGD
SCHEMBL3859295 0.80 KDR (0.56) KDRCHEK1KDM4EMAPTHPGD
SCHEMBL11055769 0.80 KDR (0.55) KDRCHEK1KDM4EMAPTHPGD
SCHEMBL7088619 0.80 KDR (0.51) KDRCHEK1KDM4EMAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 228 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0585457-B1 PHOTOCURABLE ADHESIVE JAPAN INST ADVANCED DENTISTRY (JP) 1996-10-02 EP claimed
US-12018189-B2 Composition for adhesives, outer package material for electricity storage devices, and method for producing same RESONAC CORPORATION (JP) 2024-06-25 US disclosed
WO-2023238286-A1 PHOTOSENSITIVE RESIN COMPOSITION ラサ工業株式会社 2023-12-14 WO disclosed
CN-111562720-B Photo-sensitized chemically amplified resist material, pattern forming method, semiconductor device, mask for lithography, and template for nanoimprint 东京毅力科创株式会社 2023-09-29 CN disclosed
CN-109694352-B Imidazole ketoxime ester compound, preparation method, composition and application 江苏裕事达新材料科技有限责任公司 2023-04-07 CN disclosed
CN-115536589-A Imidazole ketoxime ester compound, preparation method, composition and application 江苏裕事达新材料科技有限责任公司 2022-12-30 CN disclosed
EP-3162868-B1 THERMAL BASE GENERATOR, THERMOSETTING RESIN COMPOSITION, CURED FILM, CURED FILM MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE FUJIFILM CORP (JP) 2022-10-05 EP disclosed
US-20220127498-A1 COMPOSITION FOR ADHESIVES, OUTER PACKAGE MATERIAL FOR ELECTRICITY STORAGE DEVICES, AND METHOD FOR PRODUCING SAME SHOWA DENKO K.K. (JP) 2022-04-28 US disclosed
CN-107966877-B Composition for color filter 富士胶片株式会社 2022-04-12 CN disclosed
EP-3950867-A1 COMPOSITION FOR ADHESIVES, OUTER PACKAGE MATERIAL FOR ELECTRICITY STORAGE DEVICES, AND METHOD FOR PRODUCING SAME Showa Denko K.K. (JP) 2022-02-09 EP disclosed
US-5503074-A ALUMINUM BASE WITH SPECIFIED ROUGHNESS AND WHITENESS HAVING FORMED THEREON HOMOGENEOUS PRIMER LAYER COMPRISING BINDER, PHOTOSENSITIVE LAYER, SILICONE RUBBER LAYER FUJI PHOTO FILM CO., LTD. (JP) 1996-04-02 US disclosed
EP-0701170-A2 Photosensitive lithographic printing plate requiring no fountain solution and process for producing the same FUJI PHOTO FILM CO., LTD. (JP) 1996-03-13 EP disclosed
US-5432208-A Adhesives for glass or ceramics JAPAN INSTITUTE OF ADVANCED DENTISTRY (JP) 1995-07-11 US disclosed
EP-0652489-A1 Process for processing a photosensitive lithographic printing plate requiring no fountain solution FUJI PHOTO FILM CO., LTD. (JP) 1995-05-10 EP disclosed
US-5334486-A Reaction product of glycidyl methacrylate and a polyamine; photopolymerization initiator FUJI PHOTO FILM CO., LTD. (JP) 1994-08-02 US disclosed
EP-0585457-A1 PHOTOCURABLE ADHESIVE JAPAN INSTITUTE OF ADVANCED DENTISTRY (JP) 1994-03-09 EP disclosed
EP-0560347-A1 Method for preparing dry lithographic plates Fuji Photo Film Co., Ltd. (JP) 1993-09-15 EP disclosed
US-5232813-A PS PLATE FOR USE IN MAKING LITHOGRAPHIC PRINTING PLATE REQUIRING NO DAMPENING WATER UTILIZING IRRADIATION CURED PRIMER LAYER CONTAINING POLYURETHANE RESIN AND DIAZONIUM SALT POLYCONDENSATE PHOTOPOLYMERIZABLE LIGHT-SENSITIVE LAYER AND SILICONE RUBBER LAYER FUJI PHOTO FILM CO., LTD. (JP) 1993-08-03 US disclosed
EP-0492590-A1 Photopolymerizable composition and dry PS plate Fuji Photo Film Co., Ltd. (JP) 1992-07-01 EP disclosed
US-5061598-A PRESENSITIZED; DURABILITY, SCRATCH RESISTANCE FUJI PHOTO FILM CO., LTD. (JP) 1991-10-29 US disclosed