SCHEMBL195422

SCHEMBL195422

C=C(COC(C(=C)C(=O)O)(C(C)C)C(C)C)C(=O)O

nearest known ligand 0.33

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
TET2 Q6N021 4/20 0.33
TET3 O43151 1/20 0.31
TET1 Q8NFU7 1/20 0.31
GRIK1 P39086 1/20 0.31
GRIK2 Q13002 1/20 0.31
GRM1 Q13255 1/20 0.31
GRM2 Q14416 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL194862 0.84 TET2 (0.31) TET2
SCHEMBL195805 0.82
SCHEMBL195219 0.75 TET2 (0.32) TET2
SCHEMBL195105 0.75 TET2 (0.41) TET2TET3TET1
SCHEMBL222486 0.72 TET2 (0.38) TET2
SCHEMBL195079 0.72 TET2 (0.34) TET2
SCHEMBL28694979 0.71 TET2 (0.45) TET2TET3TET1GRIK1GRIK2
SCHEMBL195398 0.69 TET2 (0.32) TET2
SCHEMBL194839 0.68 TET2 (0.35) TET2
SCHEMBL5957008 0.67 TET2 (0.42) TET2TET3TET1GRIK1GRIK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 150 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024203854-A1 METHOD FOR STORING ETHER GROUP-CONTAINING POLYVALENT UNSATURATED COMPOUND COMPOSITION, ETHER GROUP-CONTAINING POLYVALENT UNSATURATED COMPOUND COMPOSITION, MONOMER COMPOSITION, TETRAHYDROPYRAN RING POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, MEMBER FOR DISPLAY DEVICE, AND METHOD FOR PRODUCING SAME 株式会社日本触媒 2024-10-03 WO disclosed
US-20240287231-A1 CURABLE RESIN COMPOSITION AND METHOD OF MANUFACTURING ARTICLE CANON KK (JP) 2024-08-29 US disclosed
US-11987658-B2 Curable resin composition and method of manufacturing article CANON KABUSHIKI KAISHA (JP) 2024-05-21 US disclosed
US-20230031949-A1 DISPLAY DEVICE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-02-02 US disclosed
EP-3042934-B1 COLORED COMPOSITION, CURED FILM, COLOR FILTER, COLOR-FILTER MANUFACTURING METHOD, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, POLYMER, AND XANTHENE DYE FUJIFILM CORP (JP) 2022-11-09 EP disclosed
US-20220282013-A1 CURABLE RESIN COMPOSITION AND METHOD OF MANUFACTURING ARTICLE CANON KABUSHIKI KAISHA (JP) 2022-09-08 US disclosed
EP-2553025-B1 COLORED COMPOSITION, INKJET INK, COLOR FILTER AND METHOD OF PRODUCING THE SAME, SOLID-STATE IMAGE SENSOR AND DISPLAY DEVICE FUJIFILM CORP (JP) 2022-01-12 EP disclosed
US-20200096864-A1 FILM, COLOR FILTER, SOLID IMAGE PICKUP ELEMENT, AND INFRARED SENSOR FUJIFILM CORPORATION (JP) 2020-03-26 US disclosed
US-10578966-B2 Coloring composition, film, color filter, pattern forming method, method of manufacturing color filter, solid image pickup element, and infrared sensor FUJIFILM CORPORATION (JP) 2020-03-03 US disclosed
EP-2715416-B1 COLORED RADIATION-SENSITIVE COMPOSITION FOR COLOR FILTER, PATTERN FORMING METHOD, COLOR FILTER AND METHOD OF PRODUCING THE SAME, AND SOLID-STATE IMAGE SENSOR FUJIFILM CORP (JP) 2019-10-30 EP disclosed
US-20100239965-A1 COLORED CURABLE COMPOSITION, COLOR FILTER, AND METHOD FOR PRODUCING COLOR FILTER FUJIFILM CORPORATION (JP) 2010-09-23 US disclosed
EP-2230269-A2 Colored curable composition, color filter, and method for producing color filter FUJIFILM Corporation (JP) 2010-09-22 EP disclosed
EP-1304340-B1 RESINS FOR RESISTS AND CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS MITSUBISHI RAYON CO (JP) 2008-10-29 EP disclosed
US-20080241713-A1 COLORED PHOTOCURABLE COMPOSITION FOR SOLID STATE IMAGE PICK-UP DEVICE, COLOR FILTER AND METHOD FOR PRODUCTION THEREOF, AND SOLID STATE IMAGE PICK-UP DEVICE FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
EP-1975702-A2 Colored photocurable composition for solid state image pick-up device, color filter and method for production thereof, and solid state image pick-up device Fujifilm Corporation (JP) 2008-10-01 EP disclosed
US-6927011-B2 Resins for resists and chemically amplifiable resist compositions MITSUBISHI RAYON CO., LTD. (JP) 2005-08-09 US disclosed
US-20030148214-A1 Resins for resists and chemically amplifiable resist compositions MITSUBISHI CHEMICAL CORPORATION (JP) 2003-08-07 US disclosed
EP-1304340-A1 RESINS FOR RESISTS AND CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS Mitsubishi Rayon Co., Ltd. (JP) 2003-04-23 EP disclosed
US-6262214-B1 TRANSPARENCY, HEAT-RESISTANCE AND MECHANICAL STRENGTH; USED TO MAKE LENSES, OPTICAL DISKS, OPTICAL FIBERS MITSUBISHI RAYON CO., LTD. (JP) 2001-07-17 US disclosed
EP-0936227-A1 LOWLY BIREFRINGENT POLYMER, PROCESS FOR THE PRODUCTION THEREOF, AND OPTICAL PICKUP LENS MITSUBISHI RAYON CO., LTD. (JP) 1999-08-18 EP disclosed