Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SSTR4 | P31391 | 2/20 | 0.36 |
| ▸ | NAAA | Q02083 | 2/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 3/20 | 0.34 |
| ▸ | CHRM2 | P08172 | 6/20 | 0.33 |
| ▸ | CHRM4 | P08173 | 6/20 | 0.33 |
| ▸ | CHRM1 | P11229 | 6/20 | 0.33 |
| ▸ | CHRM3 | P20309 | 6/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15521038 | 0.88 | KMT2A (0.36) | SSTR4NAAAEPHX2CHRM2CHRM4 | |
| SCHEMBL26353589 | 0.85 | SSTR4 (0.36) | SSTR4NAAAEPHX2EPHX1CHRM2 | |
| SCHEMBL118416 | 0.85 | SSTR4 (0.36) | SSTR4NAAAEPHX2EPHX1CHRM2 | |
| SCHEMBL26353243 | 0.85 | SSTR4 (0.36) | SSTR4NAAAEPHX2EPHX1CHRM2 | |
| SCHEMBL13527858 | 0.83 | HSD17B10 (0.35) | SSTR4NAAAEPHX2EPHX1CHRM2 | |
| SCHEMBL2611785 | 0.82 | CHRM2 (0.33) | SSTR4NAAAEPHX2EPHX1CHRM2 | |
| SCHEMBL27575141 | 0.81 | EPHX1 (0.36) | SSTR4NAAAEPHX2EPHX1CHRM2 | |
| SCHEMBL14839293 | 0.81 | SSTR4 (0.34) | SSTR4NAAAEPHX2EPHX1CHRM2 | |
| SCHEMBL13527845 | 0.80 | HDAC4 (0.33) | SSTR4NAAAEPHX2EPHX1CHRM2 | |
| SCHEMBL19982412 | 0.79 | CHRM2 (0.32) | SSTR4NAAAEPHX2EPHX1CHRM2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9810981-B2 | Pattern formation method, etching method, electronic device manufacturing method, and electronic device | FUJIFILM CORPORATION (JP) | 2017-11-07 | — | — | US | disclosed |