Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 10/20 | 0.50 |
| ▸ | HPGD | P15428 | 9/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 7/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.50 |
| ▸ | NPC1 | O15118 | 6/20 | 0.50 |
| ▸ | RAB9A | P51151 | 6/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 5/20 | 0.50 |
| ▸ | CYP2C19 | P33261 | 4/20 | 0.50 |
| ▸ | CYP2C9 | P11712 | 4/20 | 0.50 |
| ▸ | MAPT | P10636 | 4/20 | 0.50 |
| ▸ | CYP2D6 | P10635 | 3/20 | 0.50 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.44 |
| ▸ | GFER | P55789 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 3/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.43 |
| ▸ | NPY1R | P25929 | 1/20 | 0.43 |
| ▸ | NPY2R | P49146 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL195928 | 1.00 | KDM4E (0.50) | KDM4EHPGDSMN1; SMN2ALDH1A1NPC1 | |
| SCHEMBL8956501 | 0.98 | KDM4E (0.49) | KDM4EHPGDSMN1; SMN2ALDH1A1NPC1 | |
| SCHEMBL195496 | 0.84 | HPGD (0.49) | KDM4EHPGDSMN1; SMN2ALDH1A1NPC1 | |
| SCHEMBL195495 | 0.84 | HPGD (0.49) | KDM4EHPGDSMN1; SMN2ALDH1A1NPC1 | |
| SCHEMBL321609 | 0.83 | HPGD (0.48) | KDM4EHPGDSMN1; SMN2ALDH1A1NPC1 | |
| SCHEMBL321610 | 0.83 | HPGD (0.48) | KDM4EHPGDSMN1; SMN2ALDH1A1NPC1 | |
| SCHEMBL2829047 | 0.82 | KDM4E (0.61) | KDM4EHPGDSMN1; SMN2ALDH1A1NPC1 | |
| SCHEMBL2829046 | 0.82 | KDM4E (0.61) | KDM4EHPGDSMN1; SMN2ALDH1A1NPC1 | |
| SCHEMBL11486053 | 0.79 | NPC1 (0.47) | KDM4EHPGDSMN1; SMN2ALDH1A1NPC1 | |
| SCHEMBL11486054 | 0.79 | NPC1 (0.47) | KDM4EHPGDSMN1; SMN2ALDH1A1NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 170 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0137228-B1 | PHOTOPOLYMERIZABLE COMPOSITION | FUJI PHOTO FILM CO., LTD. (JP) | 1988-10-05 | — | — | EP | claimed |
| EP-0137228-A2 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1985-04-17 | — | — | EP | claimed |
| EP-3392292-B1 | METHOD FOR PRODUCING HETEROCYCLE-CONTAINING POLYMER PRECURSOR, HETEROCYCLE-CONTAINING POLYMER PRECURSOR, AND USE FOR SAME | FUJIFILM CORP (JP) | 2023-06-28 | — | — | EP | disclosed |
| EP-3162868-B1 | THERMAL BASE GENERATOR, THERMOSETTING RESIN COMPOSITION, CURED FILM, CURED FILM MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2022-10-05 | — | — | EP | disclosed |
| CN-108700836-B | Method for manufacturing laminate and method for manufacturing semiconductor device | 富士胶片株式会社 | 2022-06-28 | — | — | CN | disclosed |
| CN-107966877-B | Composition for color filter | 富士胶片株式会社 | 2022-04-12 | — | — | CN | disclosed |
| CN-107709407-B | Polyimide precursor composition, photosensitive resin composition, cured film, method for producing cured film, semiconductor device, and method for producing polyimide precursor composition | 富士胶片株式会社 | 2020-11-17 | — | — | CN | disclosed |
| US-10780679-B2 | Laminate, method for manufacturing laminate, semiconductor device, and method for manufacturing the semiconductor device | FUJIFILM CORPORATION (JP) | 2020-09-22 | — | — | US | disclosed |
| EP-3339352-B1 | RESIN, COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM AND SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2020-09-16 | — | — | EP | disclosed |
| CN-108137803-B | Resin, composition, cured film, method for producing cured film, and semiconductor device | 富士胶片株式会社 | 2020-04-17 | — | — | CN | disclosed |
| CN-107709408-B | Precursor composition, photosensitive resin composition, method for producing precursor composition, cured film, method for producing cured film, and semiconductor device | 富士胶片株式会社 | 2020-02-14 | — | — | CN | disclosed |
| US-20050037281-A1 | Light-sensitive sheet comprising support, first and second light-sensitive layers and barrier layer | FUJI PHOTO FILM CO., LTD. | 2005-02-17 | — | — | US | disclosed |
| EP-1507171-A2 | Light-Sensitive sheet comprising support, first and second light-sensitive layers and barrier layer | FUJI PHOTO FILM CO., LTD. (JP) | 2005-02-16 | — | — | EP | disclosed |
| US-20050025946-A1 | Light-sensitive sheet comprising support, first light-sensitive layer and second light-sensitive layer | FUJI PHOTO FILM CO., LTD. | 2005-02-03 | — | — | US | disclosed |
| EP-1489460-A2 | Light-sensitive sheet comprising support, first light-sensitive layer and second light-sensitive layer | Fuji Photo Film Co., Ltd. (JP) | 2004-12-22 | — | — | EP | disclosed |
| US-5030548-A | Photoiniator system comprising a 4,4'-bis(dialkylamino) benzophenone, an aromatic ketone and lophine dimer; also present a halogen compound leuco and dye; lithography; printing plates; photoresists | FUJI PHOTO FILM CO., LTD. (JP) | 1991-07-09 | — | — | US | disclosed |
| US-4661434-A | PHOTORESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 1987-04-28 | — | — | US | disclosed |
| US-4657942-A | LITHOGRAPHIC PRINTING PLATES, RESIN LETTERPRESS, RESISTS, 2-MERCAPTO-1,3,4-TIADIAZOLE FOR INCREASED SENSITIVITY | FUJI PHOTO FILM CO., LTD. (JP) | 1987-04-14 | — | — | US | disclosed |
| US-4584260-A | 4,41-BIS(DIALKYLAMINO)BENZOPHENONE A BENZOPHENONE, 1,3,4-OXADIAZOLE COMPOUND, AROMATIC HALOGENATED SULFONE, QUINAZOLINE AND TRIAZINE COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1986-04-22 | — | — | US | disclosed |
| EP-0137228-A2 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1985-04-17 | — | — | EP | disclosed |