SCHEMBL19612290

SCHEMBL19612290

CCCCCCCCOc1ccc(OCCCCCCCC)c2ccccc12

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CNR1 P21554 3/20 0.61
CNR2 P34972 3/20 0.61
MEN1 O00255 2/20 0.61
KMT2A Q03164 2/20 0.61
HTT P42858 1/20 0.61
CYP2C9 P11712 2/20 0.59
THRA P10827 1/20 0.58
THRB P10828 1/20 0.58
NR1I2 O75469 1/20 0.53
LMNA P02545 1/20 0.53
CHRM2 P08172 1/20 0.53
CYP3A4 P08684 1/20 0.53
ADRA2A P08913 1/20 0.53
MAPT P10636 1/20 0.53
OPRK1 P41145 1/20 0.53
HTR2B P41595 1/20 0.53
SLC6A3 Q01959 1/20 0.53
HDAC6 Q9UBN7 1/20 0.53
SLC2A1 P11166 1/20 0.52
FAAH O00519 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29802382 1.00 CNR1 (0.61) CNR1CNR2MEN1KMT2AHTT
SCHEMBL30630917 1.00 CNR1 (0.61) CNR1CNR2MEN1KMT2AHTT
SCHEMBL29802338 1.00 CNR1 (0.61) CNR1CNR2MEN1KMT2AHTT
SCHEMBL29802558 1.00 CNR1 (0.61) CNR1CNR2MEN1KMT2AHTT
SCHEMBL23271677 1.00 CNR1 (0.61) CNR1CNR2MEN1KMT2AHTT
SCHEMBL23271675 1.00 CNR1 (0.61) CNR1CNR2MEN1KMT2AHTT
SCHEMBL29802552 0.98 CNR1 (0.60) CNR1CNR2MEN1KMT2AHTT
SCHEMBL6938193 0.92 CNR1 (0.57) CNR1CNR2MEN1KMT2AHTT
SCHEMBL347409 0.92 CNR1 (0.57) CNR1CNR2MEN1KMT2AHTT
SCHEMBL2917038 0.92 CNR1 (0.57) CNR1CNR2MEN1KMT2AHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024085254-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN MULTILAYER BODY, AND METHOD FOR FORMING RESIST PATTERN 旭化成株式会社 2024-04-25 WO disclosed
WO-2022190208-A1 PHOTOSENSITIVE FILM, PHOTOSENSITIVE ELEMENT AND METHOD FOR PRODUCING MULTILAYER BODY 昭和電工マテリアルズ株式会社 2022-09-15 WO disclosed
WO-2022191127-A1 PHOTOSENSITIVE FILM, PHOTOSENSITIVE ELEMENT, AND LAMINATE PRODUCTION METHOD 昭和電工マテリアルズ株式会社 2022-09-15 WO disclosed
US-20170336728-A1 ULTRAVIOLET CURABLE LIQUID COMPOSITION, ULTRAVIOLET CURING INKJET INK, ULTRAVIOLET CURING WET ELECTROPHOTOGRAPHIC LIQUID DEVELOPER, ULTRAVIOLET CURING ELECTROSTATIC INKJET INK, AND IMAGE FORMING METHOD USING THEREOF CANON KABUSHIKI KAISHA (JP) 2017-11-23 US disclosed