Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACACB | O00763 | 3/20 | 0.44 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.42 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.41 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.41 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.41 |
| ▸ | KIF11 | P52732 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.35 |
| ▸ | ELANE | P08246 | 1/20 | 0.35 |
| ▸ | PDE2A | O00408 | 1/20 | 0.35 |
| ▸ | RIPK1 | Q13546 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.32 |
| ▸ | MEN1 | O00255 | 2/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.32 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | PPARA | Q07869 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15869207 | 1.00 | ACACB (0.44) | ACACBSLC2A1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL13098213 | 0.91 | SLC6A2 (0.40) | ACACBSLC2A1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL13098196 | 0.91 | SLC6A2 (0.40) | ACACBSLC2A1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL15869203 | 0.86 | CYP26A1 (0.38) | ACACBSLC2A1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL15869220 | 0.85 | ACACB (0.44) | ACACBSLC6A2SLC6A4SLC6A3KIF11 | |
| SCHEMBL20878778 | 0.84 | ACP3 (0.49) | SLC2A1ALDH1A1TSHRMAPK1TDP1 | |
| SCHEMBL26746 | 0.84 | SLC6A2 (0.44) | ACACBSLC6A2SLC6A4SLC6A3KIF11 | |
| SCHEMBL760472 | 0.83 | ACACB (0.46) | ACACBSLC6A2SLC6A4SLC6A3KIF11 | |
| SCHEMBL18287905 | 0.81 | ELANE (0.55) | ACACBSLC6A2SLC6A4SLC6A3KIF11 | |
| SCHEMBL15869157 | 0.80 | POLB (0.41) | ACACBALDH1A1MAPK1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 240 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1308782-B1 | Chemically amplified positive resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-09-05 | — | — | EP | claimed |
| US-6660447-B2 | Copolymers of fluorinated vinyl phenol units and acrylonitrile units has high transmittance to VUV radiation | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-09 | — | — | US | claimed |
| CN-105301905-B | Chemically amplified positive resist composition and patterning method | 信越化学工业株式会社 | 2020-11-20 | — | — | CN | disclosed |
| US-20200354523-A1 | POLYMER AND POLYMER SEPARATOR COMPRISING SAME | LG CHEM, LTD. (KR) | 2020-11-12 | — | — | US | disclosed |
| EP-2955576-B1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-07-22 | — | — | EP | disclosed |
| US-9519217-B2 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-13 | — | — | US | disclosed |
| US-9377690-B2 | Compositon for forming metal oxide-containing film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-28 | — | — | US | disclosed |
| US-9377690-B2 | Compositon for forming metal oxide-containing film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-28 | — | — | US | disclosed |
| EP-2955576-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2015-12-16 | — | — | EP | disclosed |
| US-20150355543-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-10 | — | — | US | disclosed |
| EP-2105794-B1 | Novel photoacid generator, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-19 | — | — | EP | disclosed |
| US-20010033994-A1 | Chemical amplification, positive resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-25 | — | — | US | disclosed |
| US-20010031421-A1 | Chemical amplification resist compositions | SHIN-ETSU CHEMICAL CO., LTD. OF (JP) | 2001-10-18 | — | — | US | disclosed |
| US-20010018162-A1 | Novel polymers, chemical amplification resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1126322-A2 | Fluorine-containing polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-22 | — | — | EP | disclosed |
| US-20010010890-A1 | Polymers, chemical amplification resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-02 | — | — | US | disclosed |
| EP-1117003-A1 | Chemical amplification type resist composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-1113005-A1 | Sulfonium salt compounds | Wako Pure Chemical Industries, Ltd. (JP) | 2001-07-04 | — | — | EP | disclosed |
| US-20010003772-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICDL CO., LTD. OF (JP) | 2001-06-14 | — | — | US | disclosed |
| EP-1077391-A1 | Onium salts, photoacid generators for resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-02-21 | — | — | EP | disclosed |