⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13143414 | 1.00 | — | — | |
| SCHEMBL13404907 | 1.00 | — | — | |
| SCHEMBL11761728 | 0.84 | TSHR (0.35) | — | |
| SCHEMBL16889104 | 0.79 | — | — | |
| SCHEMBL16889102 | 0.79 | — | — | |
| SCHEMBL14764018 | 0.79 | — | — | |
| SCHEMBL16889103 | 0.79 | — | — | |
| SCHEMBL29233381 | 0.79 | — | — | |
| SCHEMBL16889108 | 0.79 | — | — | |
| SCHEMBL8042153 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 144 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12578648-B2 | Rinsing liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2026-03-17 | — | — | US | disclosed |
| US-20250382724-A1 | SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE PROCESSING METHOD, AND SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE PROCESSING SYSTEM | TOKYO OHKA KOGYO CO LTD (JP) | 2025-12-18 | — | — | US | disclosed |
| US-20250369155-A1 | PROCESSING METHOD FOR SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE, SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE PROCESSING SYSTEM, AND REPLENISHING LIQUID | TOKYO OHKA KOGYO CO LTD (JP) | 2025-12-04 | — | — | US | disclosed |
| EP-3435158-B1 | ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, METHOD FOR PURIFYING ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | FUJIFILM CORP (JP) | 2025-11-19 | — | — | EP | disclosed |
| US-12386265-B2 | Pattern forming method and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2025-08-12 | — | — | US | disclosed |
| US-12306538-B2 | Treatment liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2025-05-20 | — | — | US | disclosed |
| EP-4539106-A1 | PROCESSING METHOD FOR SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE, SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE PROCESSING SYSTEM, AND REPLENISHING LIQUID | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-04-16 | — | — | EP | disclosed |
| EP-4539105-A1 | SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE PROCESSING METHOD, AND SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE PROCESSING SYSTEM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-04-16 | — | — | EP | disclosed |
| CN-115605517-B | Compound, (co) polymer, composition, resist pattern forming method, and method for producing compound and (co) polymer | 三菱瓦斯化学株式会社 | 2024-09-06 | — | — | CN | disclosed |
| US-20240295822-A1 | PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-09-05 | — | — | US | disclosed |
| US-7094516-B2 | Benzobisazole compound and optical recording medium containing the compound | MITSUI CHEMICALS, INC. (JP) | 2006-08-22 | — | — | US | disclosed |
| EP-1672626-A1 | OPTICAL RECORDING MEDIUM AND COMPOUND USED IN THE OPTICAL RECORDING MEDIUM | Mitsui Chemicals, Inc. (JP) | 2006-06-21 | — | — | EP | disclosed |
| US-20050208425-A1 | Imide compound and optical recording media made by using the same | YAMAMOTO CHEMICALS, INC. (JP) | 2005-09-22 | — | — | US | disclosed |
| EP-1180765-B1 | Optical recording medium and porphycene compound | MITSUI CHEMICALS INC (JP) | 2005-04-06 | — | — | EP | disclosed |
| EP-1445115-A1 | IMIDE COMPOUNDS AND OPTICAL RECORDING MEDIA MADE BY USING THE SAME | Mitsui Chemicals, Inc. (JP) | 2004-08-11 | — | — | EP | disclosed |
| US-6627288-B1 | Optical recording medium and porphycene compound | MITSUI CHEMICALS, INC. (JP) | 2003-09-30 | — | — | US | disclosed |
| US-20030091931-A1 | Benzbisazole compound and optical recording medium containing the compound | MITSUI CHEMICALS, INC. (JP) | 2003-05-15 | — | — | US | disclosed |
| EP-1245571-A1 | BENZBISAZOLE COMPOUND AND OPTICAL RECORDING MEDIUM CONTAINING THE COMPOUND | Mitsui Chemicals, Inc. (JP) | 2002-10-02 | — | — | EP | disclosed |
| EP-1180765-A1 | Optical recording medium and porphycene compound | Mitsui Chemicals, Inc. (JP) | 2002-02-20 | — | — | EP | disclosed |
| US-6106999-A | SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS | MITSUI CHEMICALS (JP) | 2000-08-22 | — | — | US | disclosed |