Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 4/20 | 0.57 |
| ▸ | ESR2 | Q92731 | 4/20 | 0.57 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.51 |
| ▸ | OPRD1 | P41143 | 5/20 | 0.44 |
| ▸ | OPRM1 | P35372 | 5/20 | 0.44 |
| ▸ | OPRK1 | P41145 | 4/20 | 0.44 |
| ▸ | ACHE | P22303 | 1/20 | 0.43 |
| ▸ | HTR7 | P34969 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30475863 | 0.94 | ESR1 (0.57) | ESR1ESR2HSD11B1OPRD1OPRM1 | |
| SCHEMBL12893173 | 0.91 | ESR1 (0.71) | ESR1ESR2HSD11B1OPRD1OPRM1 | |
| Phenol SCHEMBL29118790 | 0.88 | ESR1 (0.72) | ESR1ESR2OPRM1ACHEALDH1A1 | |
| Hydrogen Peroxide SCHEMBL2349581 | 0.84 | ESR1 (0.62) | ESR1ESR2OPRM1ALDH1A1L3MBTL1 | |
| SCHEMBL23506629 | 0.82 | ESR1 (0.83) | ESR1ESR2OPRM1ACHEALDH1A1 | |
| SCHEMBL1257898 | 0.82 | ESR1 (0.83) | ESR1ESR2OPRM1ACHEALDH1A1 | |
| SCHEMBL1256665 | 0.82 | ESR1 (0.83) | ESR1ESR2OPRM1ACHEALDH1A1 | |
| SCHEMBL1257273 | 0.82 | ESR1 (0.83) | ESR1ESR2OPRM1ACHEALDH1A1 | |
| Phenol SCHEMBL29040626 | 0.82 | ESR1 (0.83) | ESR1ESR2OPRM1ACHEALDH1A1 | |
| Phenol SCHEMBL8634617 | 0.82 | ESR1 (0.83) | ESR1ESR2OPRM1ACHEALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9828355-B2 | Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-11-28 | — | — | US | disclosed |