SCHEMBL1971122

SCHEMBL1971122

CC(C)(COCCOCCO)OC(C)(C)COCCOCCO

nearest known ligand 0.52

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.52
KMT2A Q03164 2/20 0.52
TSHR P16473 2/20 0.48
MAPK1 P28482 1/20 0.48
THRB P10828 1/20 0.41
HTT P42858 1/20 0.41
MAPT P10636 1/20 0.41
ALDH1A1 P00352 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1970273 0.95 TSHR (0.45) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL23521367 0.86 MEN1 (0.42) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL27533707 0.84 MEN1 (0.50) MEN1KMT2ATSHRMAPK1THRB
Triethylene Glycol SCHEMBL10428020 0.81 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
Tetraethylene Glycol SCHEMBL9322985 0.81 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL19426799 0.80 MEN1 (0.58) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL1608772 0.80 MEN1 (0.58) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL3911013 0.80 MEN1 (0.58) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL23250821 0.80 MEN1 (0.58) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL3923317 0.80 MEN1 (0.58) MEN1KMT2ATSHRMAPK1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103687894-B For the preparation of the activation method of the DMC catalysts of polyether glycol BAYER INTELLECTUAL PROPERTY GMBH (DE) 2016-01-13 CN claimed
CN-103687894-A Method for activating double metal cyanide catalysts for producing polyether polyols BAYER IP GMBH 2014-03-26 CN claimed
CN-112996828-B Method for producing polyoxymethylene-polyoxyalkylene block copolymers 科思创知识产权两合公司 2023-02-24 CN disclosed
US-20220228315-A1 METHOD FOR PRINTING ON NON-WOVEN TEXTILE SUBSTRATES USING RADIATION-CURING INKS BASF COATINGS GMBH (DE) 2022-07-21 US disclosed
EP-3959372-A1 METHOD FOR PRINTING ON NON-WOVEN TEXTILE SUBSTRATES USING RADIATION-CURING INKS BASF Coatings GmbH (DE) 2022-03-02 EP disclosed
CN-110446734-B Flame-retardant phosphorus-functional polyether carbonate polyols and process for their preparation 科思创德国股份有限公司 2021-11-23 CN disclosed
CN-112996828-A Method for producing polyoxymethylene-polyoxyalkylene block copolymers 科思创知识产权两合公司 2021-06-18 CN disclosed
CN-107636043-B Method for producing polyether carbonate polyols 科思创德国股份有限公司 2020-11-20 CN disclosed
CN-106471042-B Method for producing polyether carbonate polyols and device therefor 科思创德国股份有限公司 2020-09-04 CN disclosed
CN-111201264-A Diblock copolymers and their use as surfactants 科思创德国股份有限公司 2020-05-26 CN disclosed
CN-105683246-B Low viscosity polyether carbonate polyol with side chain 科思创德国股份有限公司 2018-06-26 CN disclosed
EP-0877065-B1 PIGMENT-BASE INK COMPOSITION CAPABLE OF FORMING IMAGES EXCELLENT IN RESISTANCE TO SCUFFING SEIKO EPSON CORP (JP) 2006-07-19 EP disclosed
US-20050043422-A1 Process for producing synthetic resin foam DAIKIN INDUSTRIES, LTD. (JP) 2005-02-24 US disclosed
EP-1457506-A1 PROCESS FOR PRODUCING SYNTHETIC RESIN FOAM Daikin Industries, Ltd. (JP) 2004-09-15 EP disclosed
EP-0761783-B1 Pigment ink composition capable of forming image having no significant bleeding or feathering SEIKO EPSON CORP (JP) 2001-11-14 EP disclosed
US-6132502-A WATER SOLUBLE OR DISPERSIBLE PIGMENT, WATER SOLUBLE EMULSION, WATER AND TWO OR MORE OF: DIETHYLENE GLYCOL MONOBUTYL ETHER, TRIETHYLENE GLYCOL MONOBUTYL ETHER, PROPYLENE GLYCOL MONOBUTYL ETHER, AND DIPROPYLENE GLYCOL MONOBUTYL ETHER SEIKO EPSON CORPORATION (JP) 2000-10-17 US disclosed
US-6004389-A PIGMENTS, GLYCOL ETHER AND WATER SEIKO EPSON CORPORATION (JP) 1999-12-21 US disclosed
EP-0877065-A1 PIGMENT-BASE INK COMPOSITION CAPABLE OF FORMING IMAGES EXCELLENT IN RESISTANCE TO SCUFFING SEIKO EPSON CORPORATION (JP) 1998-11-11 EP disclosed
US-5746818-A Pigment ink composition capable of forming image having no significant bleeding or feathering SEIKO EPSON CORPORATION (JP) 1998-05-05 US disclosed
EP-0761783-A2 Pigment ink composition capable of forming image having no significant bleeding or feathering SEIKO EPSON CORPORATION (JP) 1997-03-12 EP disclosed