⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5144396 | 1.00 | — | — | |
| SCHEMBL12088533 | 0.76 | — | — | |
| SCHEMBL12164095 | 0.76 | — | — | |
| SCHEMBL9430411 | 0.72 | — | — | |
| SCHEMBL3643227 | 0.72 | — | — | |
| SCHEMBL9430406 | 0.72 | — | — | |
| SCHEMBL28114968 | 0.71 | — | — | |
| Hydrochloric Acid SCHEMBL4271463 | 0.69 | — | — | |
| SCHEMBL20239650 | 0.69 | ANPEP (0.33) | — | |
| Hydrochloric Acid SCHEMBL20530590 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3257835-A1 | COMPOUND, RESIN, LITHOGRAPHY UNDERLAYER FILM FORMING MATERIAL, LITHOGRAPHY UNDERLAYER FILM FORMING COMPOSITION, LITHOGRAPHY UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, METHOD FOR FORMING CIRCUIT PATTERN, AND METHOD FOR PURIFYING COMPOUND OR RESIN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2017-12-20 | — | — | EP | disclosed |