⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5704730 | 1.00 | — | — | |
| SCHEMBL445979 | 1.00 | — | — | |
| SCHEMBL5704626 | 1.00 | — | — | |
| SCHEMBL198594 | 0.98 | — | — | |
| SCHEMBL5704677 | 0.88 | — | — | |
| SCHEMBL28655382 | 0.88 | — | — | |
| SCHEMBL6928726 | 0.86 | — | — | |
| SCHEMBL5930730 | 0.83 | — | — | |
| SCHEMBL22335831 | 0.82 | — | — | |
| SCHEMBL18293512 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 120 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12540073-B2 | Heterogeneous hydrogen-catalyst solid fuel reaction mixture and reactor | BRILLIANT LIGHT POWER, INC. (US) | 2026-02-03 | — | — | US | disclosed |
| US-20240043593-A1 | Fluorine-Containing Polymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-02-08 | — | — | US | disclosed |
| CN-116848162-A | Fluorine-containing polymer | 中央硝子株式会社 | 2023-10-03 | — | — | CN | disclosed |
| US-20230045778-A9 | HETEROGENEOUS HYDROGEN-CATALYST SOLID FUEL REACTION MIXTURE AND REACTOR | BRILLIANT LIGHT POWER, INC. (US) | 2023-02-09 | — | — | US | disclosed |
| WO-2022124183-A1 | FLUORINE-CONTAINING POLYMER | セントラル硝子株式会社 | 2022-06-16 | — | — | WO | disclosed |
| US-20200299130-A1 | HETEROGENEOUS HYDROGEN-CATALYST REACTOR | BRILLIANT LIGHT POWER, INC. (US) | 2020-09-24 | — | — | US | disclosed |
| US-9991553-B2 | Electrolyte for lithium air battery and lithium air battery including the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-06-05 | — | — | US | disclosed |
| US-9991553-B2 | Electrolyte for lithium air battery and lithium air battery including the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-06-05 | — | — | US | disclosed |
| US-20150349365-A1 | ELECTROLYTE FOR LITHIUM AIR BATTERY AND LITHIUM AIR BATTERY INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2015-12-03 | — | — | US | disclosed |
| US-20150349365-A1 | ELECTROLYTE FOR LITHIUM AIR BATTERY AND LITHIUM AIR BATTERY INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2015-12-03 | — | — | US | disclosed |
| US-20030008231-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-01-09 | — | — | US | disclosed |
| US-20020161148-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-10-31 | — | — | US | disclosed |
| US-20020051935-A1 | Resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-05-02 | — | — | US | disclosed |
| US-20020051936-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-02 | — | — | US | disclosed |
| US-20020048724-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-25 | — | — | US | disclosed |
| US-20020004569-A1 | Polymer, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-10 | — | — | US | disclosed |
| US-20010038969-A1 | Novel polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. OF (JP) | 2001-11-08 | — | — | US | disclosed |
| US-20010033989-A1 | Novel polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-25 | — | — | US | disclosed |
| US-20010018162-A1 | Novel polymers, chemical amplification resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1126322-A2 | Fluorine-containing polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-22 | — | — | EP | disclosed |