SCHEMBL19756105

SCHEMBL19756105

O=C(OCCS(=O)(=O)O)c1ccc(OC(=O)c2c(I)c(I)c(I)c(I)c2C(=O)O)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ STS P08842 9/20 0.38
▸ MAPT P10636 5/20 0.38
▸ KMT2A Q03164 3/20 0.38
▸ MEN1 O00255 2/20 0.34
▸ ALDH1A1 P00352 2/20 0.34
▸ HPGD P15428 2/20 0.34
▸ THRB P10828 1/20 0.34
▸ TDP1 Q9NUW8 1/20 0.34
▸ PARP10 Q53GL7 1/20 0.34
▸ KLK1 P06870 1/20 0.34
▸ PRSS1 P07477 1/20 0.34
▸ LMNA P02545 1/20 0.33
▸ ESR1 P03372 1/20 0.33
▸ CYP1A2 P05177 1/20 0.33
▸ CYP2D6 P10635 1/20 0.33
▸ TSHR P16473 1/20 0.33
▸ MAPK1 P28482 1/20 0.33
▸ CYP2C19 P33261 1/20 0.33
▸ NR1H2 P55055 1/20 0.33
▸ RNASEL Q05823 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19756102 0.83 — —
SCHEMBL25476281 0.81 STS (0.36) STSMAPTKMT2AMEN1ALDH1A1
SCHEMBL25913774 0.78 STS (0.34) STSMAPTKMT2AMEN1ALDH1A1
SCHEMBL25528072 0.78 STS (0.34) STSMAPTKMT2AMEN1ALDH1A1
SCHEMBL27600534 0.77 TDP1 (0.47) STSMAPTALDH1A1TDP1LMNA
SCHEMBL27600533 0.77 TSHR (0.48) STSALDH1A1TDP1LMNAESR1
SCHEMBL19756201 0.76 STS (0.36) STSMAPTKMT2AMEN1ALDH1A1
SCHEMBL18775854 0.76 STS (0.48) STSMAPTKMT2AALDH1A1HPGD
SCHEMBL19756091 0.76 — —
SCHEMBL21912405 0.75 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230273519-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD JSR CORPORATION (JP) 2023-08-31 — — US disclosed
US-20170369616-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-12-28 — — US disclosed
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