Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 | P23975 | 8/20 | 0.44 |
| ▸ | SLC6A4 | P31645 | 7/20 | 0.44 |
| ▸ | SLC6A3 | Q01959 | 7/20 | 0.44 |
| ▸ | HTR2A | P28223 | 4/20 | 0.44 |
| ▸ | HTR2B | P41595 | 2/20 | 0.44 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.44 |
| ▸ | HTR1A | P08908 | 1/20 | 0.44 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.44 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.41 |
| ▸ | SSTR4 | P31391 | 1/20 | 0.33 |
| ▸ | KAT6A | Q92794 | 1/20 | 0.33 |
| ▸ | HRH1 | P35367 | 1/20 | 0.33 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.33 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.33 |
| ▸ | HTR3A | P46098 | 1/20 | 0.33 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.32 |
| ▸ | JAK1 | P23458 | 1/20 | 0.32 |
| ▸ | ZAP70 | P43403 | 1/20 | 0.32 |
| ▸ | SYK | P43405 | 1/20 | 0.32 |
| ▸ | BTK | Q06187 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL322796 | 0.94 | — | — | |
| Fluoride SCHEMBL7750151 | 0.94 | — | — | |
| SCHEMBL7097741 | 0.94 | — | — | |
| SCHEMBL3168 | 0.94 | — | — | |
| SCHEMBL12524834 | 0.94 | — | — | |
| Ammonia Solution, Strong SCHEMBL331668 | 0.91 | — | — | |
| Hydrochloric Acid SCHEMBL18528199 | 0.91 | — | — | |
| Bromide SCHEMBL1608720 | 0.91 | — | — | |
| Hydrochloric Acid SCHEMBL3862781 | 0.91 | — | — | |
| Water SCHEMBL7481154 | 0.91 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 121 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11958935-B2 | Polyurethane insulation foam composition comprising a stabilizing compound | HUNTSMAN INTERNATIONAL LLC | 2024-04-16 | — | — | US | claimed |
| CN-112839737-B | Polyurethane heat insulation foam composition containing stabilizing compound | 亨斯迈国际有限责任公司 | 2023-08-01 | — | — | CN | claimed |
| CN-112824039-B | Polishing pad, method of manufacturing the same, and method of manufacturing semiconductor device using the same | SKC索密思株式会社 | 2023-02-17 | — | — | CN | claimed |
| CN-110385642-B | Porous polyurethane grinding pad and preparation method thereof | SKC索密思株式会社 | 2021-07-09 | — | — | CN | claimed |
| CN-109048646-B | Porous polyurethane polishing pad and method for manufacturing same | SKC索密思株式会社 | 2021-06-29 | — | — | CN | claimed |
| CN-112839737-A | Polyurethane thermal insulation foam composition containing stabilizing compound | 亨斯迈国际有限责任公司 | 2021-05-25 | — | — | CN | claimed |
| CN-112824039-A | Polishing pad, method of manufacturing the same, and method of manufacturing semiconductor device using the same | SKC索密思株式会社 | 2021-05-21 | — | — | CN | claimed |
| US-10385245-B2 | One-component moisture-curable urethane composition and method for producing same | THE YOKOHAMA RUBBER CO., LTD. (JP) | 2019-08-20 | — | — | US | claimed |
| CN-109048646-A | Porosity polyurethane polishing pad and its manufacturing method | SKC株式会社 | 2018-12-21 | — | — | CN | claimed |
| CN-105026450-A | One-component moisture-curable composition | YOKOHAMA RUBBER CO LTD | 2015-11-04 | — | — | CN | claimed |
| EP-2395036-A1 | Polyurethane dispersions with an acid-base mixture as an additive | Bayer MaterialScience AG (DE) | 2011-12-14 | — | — | EP | claimed |
| WO-2011144532-A1 | POLYURETHANE DISPERSIONS WITH AN ACID-BASE MIXTURE AS AN ADDITIVE | BAYER MATERIALSCIENCE AG (DE) | 2011-11-24 | — | — | WO | claimed |
| CN-119795027-A | Polishing pad and method for manufacturing semiconductor device using the same | SK恩普士有限公司 | 2025-04-11 | — | — | CN | disclosed |
| CN-119369287-A | Polishing pad with reduced defects and method of manufacturing semiconductor device using the same | SK恩普士有限公司 | 2025-01-28 | — | — | CN | disclosed |
| CN-119384464-A | Water-soluble polyurethane as support material and sacrificial material for 3D printing | 伊维瓦医疗有限公司 | 2025-01-28 | — | — | CN | disclosed |
| CN-115431168-B | Polishing pad and method for manufacturing semiconductor device using the same | SK恩普士有限公司 | 2024-11-08 | — | — | CN | disclosed |
| US-20030130366-A1 | Polyisocyanate polyaddition products | ARLT ANDREAS (DE) | 2003-07-10 | — | — | US | disclosed |
| US-6495611-B1 | MATTRESS OR FURNITURE UPHOLSTERY OR CARPET BACKING COMPRISING A FLEXIBLE POLYURETHANE FOAM COMPRISING HYDROPHOBIC COMPOUNDS PLUS AT LEAST ONE CYCLODEXTRIN, RESORCINARENE, CYCLOPHANE AND/OR CYCLOCALIXARENE | BASF AKTIENGESELLSCHAFT (DE) | 2002-12-17 | — | — | US | disclosed |
| CN-1371401-A | Polyether alcohols | BASF AG (DE) | 2002-09-25 | — | — | CN | disclosed |
| CN-1330668-A | Method for producing wood composites using mixed polymethylene diisocyanate/solid novolac resin binder | BAYER AG (US) | 2002-01-09 | — | — | CN | disclosed |