⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL455162 | 0.74 | — | — | |
| SCHEMBL455163 | 0.74 | — | — | |
| SCHEMBL4823996 | 0.74 | — | — | |
| SCHEMBL27181872 | 0.70 | — | — | |
| SCHEMBL27180286 | 0.70 | — | — | |
| SCHEMBL27779707 | 0.70 | — | — | |
| SCHEMBL909455 | 0.62 | — | — | |
| SCHEMBL3146981 | 0.62 | — | — | |
| SCHEMBL809102 | 0.62 | — | — | |
| SCHEMBL20207 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4207251-B1 | PLASMA ETCHING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT | RESONAC CORP (JP) | 2025-08-06 | — | — | EP | claimed |
| CN-113784776-B | Gas treatment method and gas treatment apparatus | 株式会社力森诺科 | 2024-03-19 | — | — | CN | claimed |
| US-20240038546-A1 | PLASMA ETCHING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT | SHOWA DENKO K.K. (JP) | 2024-02-01 | — | — | US | claimed |
| CN-116762158-A | Method for forming pattern of metal oxide and method for manufacturing semiconductor element | 株式会社力森诺科 | 2023-09-15 | — | — | CN | claimed |
| CN-115699266-A | Plasma etching method and method for manufacturing semiconductor element | 昭和电工株式会社 | 2023-02-03 | — | — | CN | claimed |
| CN-113784776-A | Gas processing method and gas processing apparatus | 昭和电工株式会社 | 2021-12-10 | — | — | CN | claimed |
| US-7462480-B2 | Stimulation of microbial dechlorination of polychorinated biphenyls with halogenated ethenes | UNIVERSITY OF MARYLAND BIOTECHNOLOGY INSTITUTE (US) | 2008-12-09 | — | — | US | claimed |
| US-20060057705-A1 | Stimulation of microbial dechlorination of polychlorinated biphenyls with halogenated ethenes | UNIVERSITY OF MARYLAND BALTIMORE COUNTY | 2006-03-16 | — | — | US | claimed |
| WO-2003065011-A2 | STIMULATION OF MICROBIAL DECHLORINATION OF POLYCHLORINATED BIPHENYLS WITH HALOGENATED ETHENES | UNIVERSITY OF MARYLAND BIOTECHNOLOGY INSTITUTE (US) | 2003-08-07 | — | — | WO | claimed |
| CN-113784776-B | Gas treatment method and gas treatment apparatus | 株式会社力森诺科 | 2024-03-19 | — | — | CN | disclosed |
| CN-116762158-A | Method for forming pattern of metal oxide and method for manufacturing semiconductor element | 株式会社力森诺科 | 2023-09-15 | — | — | CN | disclosed |
| CN-115699266-A | Plasma etching method and method for manufacturing semiconductor element | 昭和电工株式会社 | 2023-02-03 | — | — | CN | disclosed |
| US-20220411685-A1 | FLUORORUBBER COMPOSITION AND SEALING MATERIAL | UNIMATEC CO., LTD. (JP) | 2022-12-29 | — | — | US | disclosed |
| EP-4039752-A1 | FLUORORUBBER COMPOSITION AND SEAL MATERIAL | Unimatec Co., Ltd. (JP) | 2022-08-10 | — | — | EP | disclosed |
| EP-1049680-A1 | SUBSTITUTED AMINOALKYLIDENAMINO TRIAZINES AS HERBICIDES | Bayer Aktiengesellschaft (DE) | 2000-11-08 | — | — | EP | disclosed |
| EP-1037882-A1 | SUBSTITUTED 2,4-DIAMINO-1,3,5-TRIAZINES | BAYER AG (DE) | 2000-09-27 | — | — | EP | disclosed |
| WO-2000021938-A1 | SUBSTITUTED HERBICIDAL FORMYLAMINOTRIAZINES | BAYER AKTIENGESELLSCHAFT (DE) | 2000-04-20 | — | — | WO | disclosed |
| WO-1999037627-A1 | SUBSTITUTED AMINOALKYLIDENAMINO TRIAZINES AS HERBICIDES | BAYER AKTIENGESELLSCHAFT (DE) | 1999-07-29 | — | — | WO | disclosed |
| WO-1999029677-A1 | SUBSTITUTED 2,4-DIAMINO-1,3,5-TRIAZINES | BAYER AKTIENGESELLSCHAFT (DE) | 1999-06-17 | — | — | WO | disclosed |
| WO-1999019309-A1 | SUBSTITUTED 2,4-DIAMINO-1,3,5-TRIAZINES | BAYER AKTIENGESELLSCHAFT (DE) | 1999-04-22 | — | — | WO | disclosed |