SCHEMBL19808266

SCHEMBL19808266

CC(C)(C)C(=O)OCCCC1CC2CC1C(F)(F)C2(O)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20820982 0.81 — —
SCHEMBL21281784 0.75 — —
SCHEMBL22432364 0.70 — —
SCHEMBL18786075 0.69 — —
SCHEMBL13219528 0.67 CYP19A1 (0.35) —
SCHEMBL3414743 0.64 — —
SCHEMBL18897983 0.64 — —
SCHEMBL17548677 0.64 MEN1 (0.35) —
SCHEMBL20306487 0.63 — —
SCHEMBL12716328 0.62 SMN1; SMN2 (0.51) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180024435-A1 RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-01-25 — — US disclosed
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