⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19829298 | 0.81 | SMN1; SMN2 (0.30) | — | |
| SCHEMBL19432806 | 0.78 | — | — | |
| SCHEMBL18431932 | 0.76 | — | — | |
| SCHEMBL21577311 | 0.76 | — | — | |
| SCHEMBL15383907 | 0.75 | — | — | |
| SCHEMBL22111753 | 0.75 | — | — | |
| SCHEMBL22000898 | 0.75 | — | — | |
| SCHEMBL19982543 | 0.75 | — | — | |
| SCHEMBL23686517 | 0.70 | — | — | |
| SCHEMBL22905172 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11009790-B2 | Photoacid generator and photoresist composition including the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-05-18 | — | — | US | disclosed |
| US-20180031967-A1 | PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-02-01 | — | — | US | disclosed |
| US-20180031967-A1 | PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-02-01 | — | — | US | disclosed |