Carbon Monoxide

Carbon Monoxide

SCHEMBL1982955

Cl[Ru]C1=CC=CC1.[C]=O.[C]=O

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3006863 0.86
SCHEMBL3007784 0.86
Carbon Monoxide SCHEMBL9218219 0.80
Carbon Monoxide SCHEMBL1981498 0.78
SCHEMBL1006483 0.74 CYP3A4 (0.43)
SCHEMBL52936 0.71
SCHEMBL14953811 0.69
SCHEMBL7542500 0.68
SCHEMBL3950005 0.67
SCHEMBL5569417 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1094068-B1 Silylation of hydroxyl group-containing compounds SHINETSU CHEMICAL CO (JP) 2004-12-15 EP claimed
EP-2339594-B1 COMPOSITION FOR PRODUCING METAL FILM, METHOD FOR PRODUCING METAL FILM, AND METHOD FOR PRODUCING METAL POWDER TOSOH CORP (JP) 2018-01-03 EP disclosed
US-9624581-B2 Composition for production of metal film, method for producing metal film and method for producing metal powder TOSOH CORPORATION (JP) 2017-04-18 US disclosed
US-20110183068-A1 COMPOSITION FOR PRODUCTION OF METAL FILM, METHOD FOR PRODUCING METAL FILM AND METHOD FOR PRODUCING METAL POWDER TOSOH CORPORATION (JP) 2011-07-28 US disclosed
EP-2339594-A1 COMPOSITION FOR PRODUCING METAL FILM, METHOD FOR PRODUCING METAL FILM, AND METHOD FOR PRODUCING METAL POWDER Tosoh Corporation (JP) 2011-06-29 EP disclosed
US-20100197938-A1 Process for producing indole compoud NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-08-05 US disclosed
US-20070083053-A1 Process for producing indole compound NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2007-04-12 US disclosed