⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28257367 | 0.71 | — | — | |
| SCHEMBL237257 | 0.71 | — | — | |
| SCHEMBL8175 | 0.71 | — | — | |
| SCHEMBL31312840 | 0.71 | — | — | |
| SCHEMBL28199950 | 0.71 | — | — | |
| SCHEMBL25252876 | 0.50 | — | — | |
| Hydrogen Sulfide SCHEMBL4176617 | 0.50 | — | — | |
| SCHEMBL3425194 | 0.50 | — | — | |
| Water SCHEMBL15814333 | 0.50 | — | — | |
| SCHEMBL4564436 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10622211-B2 | Metal-compound-removing solvent and method in lithography | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2020-04-14 | — | — | US | disclosed |
| US-20180040474-A1 | METAL-COMPOUND-REMOVING SOLVENT AND METHOD IN LITHOGRAPHY | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2018-02-08 | — | — | US | disclosed |