Benzene

Benzene

SCHEMBL19838142

C1=Cc2cccc3cccc(c23)C1.C1=Cc2cccc3cccc(c23)C1.c1ccccc1

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 3/20 0.41
▸ CYP3A4 P08684 2/20 0.41
▸ CA1 P00915 1/20 0.38
▸ CA2 P00918 1/20 0.38
▸ CYP2C19 P33261 2/20 0.36
▸ CYP2D6 P10635 1/20 0.36
▸ ALDH1A1 P00352 4/20 0.35
▸ HSD17B10 Q99714 4/20 0.35
▸ HPGD P15428 3/20 0.35
▸ CYP1A2 P05177 2/20 0.35
▸ CYP1A1 P04798 1/20 0.35
▸ CYP1B1 Q16678 1/20 0.35
▸ KDM4E B2RXH2 2/20 0.34
▸ TYMS P04818 1/20 0.32
▸ LMNA P02545 1/20 0.32
▸ PARP1 P09874 1/20 0.32
▸ MAPK1 P28482 1/20 0.30
▸ ATM Q13315 1/20 0.30
▸ L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzene SCHEMBL27434033 1.00 TSHR (0.41) TSHRCYP3A4CA1CA2CYP2C19
Benzene SCHEMBL27613941 0.98 CA1 (0.41) TSHRCYP3A4CA1CA2CYP2C19
Benzene SCHEMBL27454874 0.98 CYP3A4 (0.40) TSHRCYP3A4CA1CA2CYP2C19
SCHEMBL7712 0.98 TSHR (0.43) TSHRCYP3A4CA1CA2CYP2C19
SCHEMBL27642281 0.98 TSHR (0.43) TSHRCYP3A4CA1CA2CYP2C19
SCHEMBL29555130 0.98 TSHR (0.43) TSHRCYP3A4CA1CA2CYP2C19
SCHEMBL17685497 0.98 TSHR (0.43) TSHRCYP3A4CA1CA2CYP2C19
SCHEMBL29376031 0.98 TSHR (0.43) TSHRCYP3A4CA1CA2CYP2C19
SCHEMBL7432807 0.98 TSHR (0.43) TSHRCYP3A4CA1CA2CYP2C19
SCHEMBL27642594 0.98 TSHR (0.43) TSHRCYP3A4CA1CA2CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240208179-A1 LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE NISSAN CHEMICAL CORPORATION (JP) 2024-06-27 — — US disclosed
US-20240199924-A1 LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE NISSAN CHEMICAL CORPORATION (JP) 2024-06-20 — — US disclosed
CN-118160066-A Laminate, stripper composition, and method for producing processed semiconductor substrate 日产化学株式会社 2024-06-07 — — CN disclosed
EP-4306609-A1 LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE Nissan Chemical Corporation (JP) 2024-01-17 — — EP disclosed
CN-117157739-A Laminate, stripper composition, and method for producing processed semiconductor substrate 日产化学株式会社 2023-12-01 — — CN disclosed
CN-117157738-A Laminate, stripper composition, and method for producing processed semiconductor substrate 日产化学株式会社 2023-12-01 — — CN disclosed
CN-117098824-A Adhesive composition, laminate, method for producing laminate, and method for producing processed substrate 日产化学株式会社 2023-11-21 — — CN disclosed
CN-117083697-A Laminate, stripper composition, and method for producing processed semiconductor substrate 日产化学株式会社 2023-11-17 — — CN disclosed
WO-1997010193-A9 ETHYNYL SUBSTITUTED AROMATIC COMPOUNDS, SYNTHESIS, POLYMERS AND USES THEREOF THE DOW CHEMICAL COMPANY (US) 2018-02-08 — — WO disclosed
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