SCHEMBL198496

SCHEMBL198496

CCCCCc1[c]c(CCCCC)ccc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KCNH2 Q12809 2/20 0.48
GPR84 Q9NQS5 1/20 0.41
LIPG Q9Y5X9 3/20 0.40
LPL P06858 2/20 0.40
TDP1 Q9NUW8 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
PTGS2 P35354 2/20 0.39
ALOX5 P09917 1/20 0.39
ESR1 P03372 2/20 0.39
ADRA2A P08913 2/20 0.39
ADORA3 P0DMS8 2/20 0.39
TACR2 P21452 2/20 0.39
SLC6A2 P23975 2/20 0.39
SLC6A4 P31645 2/20 0.39
SLC6A3 Q01959 2/20 0.39
KDM4E B2RXH2 1/20 0.39
ALDH1A1 P00352 1/20 0.39
LMNA P02545 1/20 0.39
SHBG P04278 1/20 0.39
TP53 P04637 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL201783 0.98 KCNH2 (0.52) KCNH2GPR84LIPGLPLPTGS2
SCHEMBL198833 0.98 KCNH2 (0.52) KCNH2GPR84LIPGLPLPTGS2
SCHEMBL200062 0.98 KCNH2 (0.52) KCNH2GPR84LIPGLPLPTGS2
SCHEMBL201321 0.98 KCNH2 (0.52) KCNH2GPR84LIPGLPLPTGS2
SCHEMBL199031 0.98 KCNH2 (0.52) KCNH2GPR84LIPGLPLPTGS2
SCHEMBL198352 0.98 KCNH2 (0.52) KCNH2GPR84LIPGLPLPTGS2
SCHEMBL198223 0.98 KCNH2 (0.52) KCNH2GPR84LIPGLPLPTGS2
SCHEMBL198408 0.98 KCNH2 (0.52) KCNH2GPR84LIPGLPLPTGS2
SCHEMBL198524 0.98 KCNH2 (0.52) KCNH2GPR84LIPGLPLPTGS2
SCHEMBL200132 0.98 KCNH2 (0.52) KCNH2GPR84LIPGLPLPTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106892945-A A kind of N-heterocyclic carbine-palladium complex, its preparation method and application 温州大学 2017-06-27 CN claimed
CN-110818545-B Method for preparing substituted aryl ketone by ketone arylation 上海化工研究院有限公司 2022-12-09 CN disclosed
WO-2021011638-A1 SILYL-BRIDGED PYRIDYLAMIDE CATALYSTS AND METHODS THEREOF EXXONMOBIL CHEMICAL PATENTS INC. (US) 2021-01-21 WO disclosed
US-20210017303-A1 Silyl-Bridged Pyridylamide Catalysts and Methods Thereof EXXONMOBIL CHEMICAL PATENTS INC. 2021-01-21 US disclosed
WO-2019053541-A1 ACRYLATES THROUGH OLEFIN/CARBON DIOXIDE COUPLING SABIC GLOBAL TECHNOLOGIES B.V. (NL) 2019-03-21 WO disclosed
WO-2019053540-A1 METHODS OF PRODUCING ALPHA, BETA-UNSATURATED CARBOXYLIC ACID SALTS FROM ALKANES AND CARBON DIOXIDE SABIC GLOBAL TECHNOLOGIES B.V. (NL) 2019-03-21 WO disclosed
CN-108779105-A Buchwald-Hartwig arylation methods are used to prepare tertiary aromatic amine 优美科股份公司及两合公司 2018-11-09 CN disclosed
WO-2017158469-A1 METHODS OF MAKING ALPHA, BETA-UNSATURATED CARBOXYLIC ACIDS OR SALTS SABIC GLOBAL TECHNOLOGIES B.V. (NL) 2017-09-21 WO disclosed
CN-106892945-A A kind of N-heterocyclic carbine-palladium complex, its preparation method and application 温州大学 2017-06-27 CN disclosed
US-9235117-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device FUJIFILM CORPORATION (JP) 2016-01-12 US disclosed
WO-2004000894-A1 YTTRIUM-BASED ETHYLENE POLYMERIZATION CATALYSTS WITH BULKY AMIDINATE ANCILLARY LIGANDS EXXONMOBIL CHEMICAL PATENTS INC. (US) 2003-12-31 WO disclosed
EP-1367439-A1 Radiation-sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2003-12-03 EP disclosed
US-6630280-B1 Resin and compound that generates an arylsulfonic acid when exposed to actinic radiation; sensitivity; resolution; smoothness FUJI PHOTO FILM CO., LTD. (JP) 2003-10-07 US disclosed
US-20030134221-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2003-07-17 US disclosed
US-20030108811-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2003-06-12 US disclosed
US-20020012866-A1 Positive photoresist composition FUJIFILM CORPORATION (JP) 2002-01-31 US disclosed
US-6207343-B1 RESIN CONTAINING GROUPS WHICH DECOMPOSE BY THE ACTION OF AN ACID TO ENHANCE ITS SOLUBILITY IN AN ALKALINE DEVELOPING SOLUTION AND A COMPOUND WHICH GENERATES AN ACID UPON IRRADIATION WITH ACTINIC RAYS OR RADIATION FUJI PHOTO FILM CO., LTD. (JP) 2001-03-27 US disclosed
EP-0283310-B1 N-BENZHYDRYL-SUBSTITUTED HETEROCYCLIC DERIVATIVES, THEIR PREPARATION AND THEIR USE Sankyo Company Limited (JP) 1993-05-26 EP disclosed
US-5028610-A Calcium Channel Blockers SANKYO COMPANY LIMITED (JP) 1991-07-02 US disclosed
EP-0283310-A1 N-Benzhydryl-substituted heterocyclic derivatives, their preparation and their use Sankyo Company Limited (JP) 1988-09-21 EP disclosed