SCHEMBL198641

SCHEMBL198641

c1cc(-c2cccc3ncccc23)c2cccnc2c1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.64
KDM4E B2RXH2 1/20 0.64
CA12 O43570 2/20 0.54
CA1 P00915 2/20 0.54
CA2 P00918 2/20 0.54
CA9 Q16790 2/20 0.54
POLB P06746 1/20 0.52
ACVR1 Q04771 3/20 0.50
CYP3A4 P08684 1/20 0.50
LMNA P02545 2/20 0.48
MEN1 O00255 2/20 0.48
KMT2A Q03164 2/20 0.48
HSP90AA1 P07900 1/20 0.48
HSP90AB1 P08238 1/20 0.48
HTT P42858 1/20 0.48
BLM P54132 1/20 0.48
HIF1A Q16665 1/20 0.48
ALDH1A1 P00352 1/20 0.48
P2RX7 Q99572 1/20 0.47
SLC22A12 Q96S37 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7918743 0.93 MAPT (0.56) MAPTKDM4ECA12CA1CA2
SCHEMBL22015704 0.89 CYP3A4 (0.62) MAPTKDM4ECA12CA1CA2
SCHEMBL27841121 0.89 MAPT (0.56) MAPTKDM4ECA12CA1CA2
SCHEMBL15730741 0.88 ACVR1 (0.50) MAPTKDM4ECA12CA1CA2
SCHEMBL24621926 0.87 MAPT (0.54) MAPTKDM4ECA12CA1CA2
SCHEMBL17334527 0.87 CA12 (0.57) MAPTKDM4ECA12CA1CA2
SCHEMBL27752837 0.86 CA12 (0.49) MAPTKDM4ECA12CA1CA2
SCHEMBL4067917 0.86 KDM4E (0.57) MAPTKDM4ECA12CA1CA2
SCHEMBL4658401 0.85 CA12 (0.59) MAPTKDM4ECA12CA1CA2
SCHEMBL20371605 0.84 KDM4E (0.47) MAPTKDM4ECA12CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113754668-B Organic compound and application thereof 武汉天马微电子有限公司 2023-01-20 CN disclosed
CN-113754668-A Organic compound and application thereof 武汉天马微电子有限公司 2021-12-07 CN disclosed
US-9972802-B2 Organic electroluminescent element Konica Minolta, Inc. (JP) 2018-05-15 US disclosed
US-9972802-B2 Organic electroluminescent element Konica Minolta, Inc. (JP) 2018-05-15 US disclosed
US-20150076469-A1 ORGANIC ELECTROLUMINESCENT ELEMENT Konica Minolta, Inc. (JP) 2015-03-19 US disclosed
US-20150076469-A1 ORGANIC ELECTROLUMINESCENT ELEMENT Konica Minolta, Inc. (JP) 2015-03-19 US disclosed
EP-2390241-B1 METHOD FOR MANUFACTURING CONJUGATED AROMATIC COMPOUND SUMITOMO CHEMICAL CO (JP) 2014-10-01 EP disclosed
US-8598349-B2 Method for manufacturing conjugated aromatic compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-12-03 US disclosed
US-8293905-B2 Bipyridine compound, transition metal complex, and method for production of conjugated aromatic compound using the transition metal complex SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-10-23 US disclosed
US-20120193619-A1 ORGANIC ELECTROLUMINESCENT ELEMENT AND LIGHTING DEVICE USING SAME KONICA MINOLTA HOLDINGS, INC. (JP) 2012-08-02 US disclosed
EP-2172470-A1 BIPYRIDINE COMPOUND, TRANSITION METAL COMPLEX, AND METHOD FOR PRODUCTION OF CONJUGATED AROMATIC COMPOUND USING THE TRANSITION METAL COMPLEX Sumitomo Chemical Company, Limited (JP) 2010-04-07 EP disclosed
EP-0872903-B1 Method for making hydrogen storage alloy powder and electrode comprising the alloy powder SHINETSU CHEMICAL CO (JP) 2001-10-04 EP disclosed
US-6277519-B1 QUENCHING AN ALLOY MELT; COMMINUTION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-08-21 US disclosed
US-6096144-A TREATING WITH ACIDIC OR ALKALINE SOLUTION OF CONJUGATED UNSATURATED COMPOUND WITH AT LEAST 5 BONDS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-08-01 US disclosed
US-5858571-A TREATING A PULVERIZED HYDROGEN ABSORBING ALLOY WITH A SOLUTION COMPRISING A CONJUGATED UNSATURATED COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-01-12 US disclosed
EP-0872903-A1 Method for making hydrogen storage alloy powder and electrode comprising the alloy powder Shin-Etsu Chemical Co., Ltd. (JP) 1998-10-21 EP disclosed
EP-0172427-B1 PROCESS FOR PRODUCTION OF VINYL CHLORIDE POLYMER Shin-Etsu Chemical Co., Ltd. (JP) 1989-07-05 EP disclosed
US-4758639-A Process for production of vinyl polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-07-19 US disclosed
US-4757124-A Suspension or emulsion polymerizing vinyl chloride monomer or mixture of vinyl chloride with vinyl monomer copolymerizable therewith in reactor with walls coated with antiscaling compound containing dye or pigments SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-07-12 US disclosed
EP-0172427-A2 Process for production of vinyl chloride polymer Shin-Etsu Chemical Co., Ltd. (JP) 1986-02-26 EP disclosed