⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL60538 | 0.89 | — | — | |
| SCHEMBL17184227 | 0.75 | — | — | |
| SCHEMBL9974583 | 0.74 | — | — | |
| SCHEMBL4805998 | 0.72 | — | — | |
| SCHEMBL9422485 | 0.72 | — | — | |
| SCHEMBL8731684 | 0.69 | — | — | |
| Tetrafluoroethylene SCHEMBL19133726 | 0.69 | — | — | |
| SCHEMBL9569852 | 0.69 | — | — | |
| SCHEMBL19525685 | 0.67 | — | — | |
| SCHEMBL10395967 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6682666-B2 | ROTATING AND POLYMERIZING FIRST COMPONENT; FILLING LIQUID SECOND COMPONENT AND POLYMERIZING WHILE SUBJECTING FIRST COMPONENT TO DISSOLUTION, DIFFUSION OR RADIAL MIXING | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-01-27 | — | — | US | claimed |
| US-20020031318-A1 | Object with radially varying refractive index, and producing method and apparatus thereof | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-03-14 | — | — | US | claimed |
| US-8323872-B2 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-12-04 | — | — | US | disclosed |
| US-20120249995-A1 | RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO. LTD. (JP) | 2012-10-04 | — | — | US | disclosed |
| EP-1589377-B1 | Patterning process and resist overcoat material | SHINETSU CHEMICAL CO (JP) | 2012-05-23 | — | — | EP | disclosed |
| US-8088537-B2 | Resist top coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-7670750-B2 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-02 | — | — | US | disclosed |
| US-7642034-B2 | Photoresists; (meth)acrylate fluoropolymer which is insoluble in water, dissolvable in aqueous alkaline solution, and immiscible with resist films so that it enables pattern formation by the immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-01-05 | — | — | US | disclosed |
| US-20090197200-A1 | Resist top coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-06 | — | — | US | disclosed |
| US-7569323-B2 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-04 | — | — | US | disclosed |
| US-7455952-B2 | Patterning process and resist overcoat material | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-11-25 | — | — | US | disclosed |
| US-20070122736-A1 | RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. | 2007-05-31 | — | — | US | disclosed |
| US-20070122741-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-31 | — | — | US | disclosed |
| US-20070026341-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-02-01 | — | — | US | disclosed |
| US-20070003867-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-04 | — | — | US | disclosed |
| US-20060029884-A1 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-02-09 | — | — | US | disclosed |
| EP-1589377-A2 | Patterning process and resist overcoat material | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-10-26 | — | — | EP | disclosed |
| US-20050233254-A1 | Patterning process and resist overcoat material | SHIN-ETSU CHEMICAL CO., LTD. | 2005-10-20 | — | — | US | disclosed |
| US-6197091-B1 | Ozone purification process | THE BOC GROUP, INC. | 2001-03-06 | — | — | US | disclosed |
| EP-1036758-A1 | Ozone purification | THE BOC GROUP, INC. (US) | 2000-09-20 | — | — | EP | disclosed |