SCHEMBL1991389

SCHEMBL1991389

CC(F)C(F)(Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL816837 0.83
Dichlorodifluoromethane SCHEMBL4882123 0.78
SCHEMBL1989933 0.78
SCHEMBL23872339 0.78
Ethane SCHEMBL9788377 0.75
SCHEMBL9538317 0.75
SCHEMBL1989935 0.75
SCHEMBL5351959 0.74
SCHEMBL24871 0.73
SCHEMBL1172952 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170333941-A1 HIGH ENERGY EFFICIENCY PHASE CHANGE DEVICE USING CONVEX SURFACE FEATURES U.S. DEPARTMENT OF ENERGY 2017-11-23 US claimed
EP-0630278-B1 NON-TOXIC, ENVIRONMENTALLY BENIGN FIRE EXTINGUISHANTS TAG INVESTMENTS INC (CA) 1999-11-24 EP claimed
US-12516275-B2 Composition; cleaning agent, aerosol composition, draining agent, foaming agent, or heat-transfer medium containing the composition; system using the heat-transfer medium; and method of cleaning articles CENTRAL GLASS COMPANY, LIMITED (JP) 2026-01-06 US disclosed
US-12453961-B2 Chromium catalyst, its preparation and use BASF CORPORATION (US) 2025-10-28 US disclosed
US-20250313497-A1 High Protein Organic Materials as Fuel and Processes for Making the Same AKBEV GROUP, LLC (US) 2025-10-09 US disclosed
US-12378492-B2 High protein organic materials as fuel and processes for making the same AKBEV GROUP, LLC (US) 2025-08-05 US disclosed
US-20250153147-A1 CHROMIUM CATALYST, ITS PREPARATION AND USE BASF CORPORATION (US) 2025-05-15 US disclosed
CN-118516082-A Solvent composition, aerosol composition, cleaning agent and method for cleaning article 中央硝子株式会社 2024-08-20 CN disclosed
CN-113444492-B Solvent composition, aerosol composition, cleaning agent and method for cleaning article 中央硝子株式会社 2024-05-17 CN disclosed
US-20240110116-A1 High Protein Organic Materials as Fuel and Processes for Making the Same AKBEV GROUP, LLC (US) 2024-04-04 US disclosed
US-20240043777-A1 Composition; Cleaning Agent, Aerosol Composition, Draining Agent, Foaming Agent, or Heat-Transfer Medium Containing the Composition; System Using the Heat-Transfer Medium; And Method of Cleaning Articles CENTRAL GLASS CO., LTD. (JP) 2024-02-08 US disclosed
EP-1581468-A1 MATERIALS AND METHODS FOR THE CONVERSION OF HYDROFLUOROCARBONS PCBU Services, Inc. (US) 2005-10-05 EP disclosed
WO-2004060842-A1 MATERIALS AND METHODS FOR THE CONVERSION OF HYDROFLUOROCARBONS PCBU SERVICES, INC. (US) 2004-07-22 WO disclosed
US-20040127757-A1 Materials and methods for the conversion of hydrofluorocarbons RECREATIONAL WATER PRODUCTS, INC. 2004-07-01 US disclosed
EP-0630278-B1 NON-TOXIC, ENVIRONMENTALLY BENIGN FIRE EXTINGUISHANTS TAG INVESTMENTS INC (CA) 1999-11-24 EP disclosed
EP-0176636-B1 POLYMERIC THIN FILM AND PRODUCTS CONTAINING THE SAME JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1990-05-09 EP disclosed
US-4693799-A LOW TEMPERATURE PULSE DISCHARGING JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1987-09-15 US disclosed
US-4636435-A Polymeric thin film, process for producing the same and products containing said thin film JAPAN SYNTHETIC RUBBER COMPANY LIMITED (JP) 1987-01-13 US disclosed
US-3992208-A Photo-sensitive etchant and method for forming metal image using same FUJI PHOTO FILM CO., LTD. (JA) 1976-11-16 US disclosed
US-3960559-A Method of making a semiconductor device utilizing a light-sensitive etching agent FUJI PHOTO FILM CO., LTD. (JA) 1976-06-01 US disclosed