Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.49 |
| ▸ | RAB9A | P51151 | 2/20 | 0.49 |
| ▸ | NPC1 | O15118 | 1/20 | 0.49 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | P2RX7 | Q99572 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 3/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | SIRT5 | Q9NXA8 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1991244 | 0.91 | MEN1 (0.39) | MEN1KMT2ARAB9ANPC1HPGD | |
| SCHEMBL7529601 | 0.82 | MEN1 (0.40) | MEN1KMT2ARAB9ANPC1HPGD | |
| SCHEMBL189532 | 0.80 | MEN1 (0.54) | MEN1KMT2ARAB9ANPC1HPGD | |
| SCHEMBL7269130 | 0.80 | MEN1 (0.54) | MEN1KMT2ARAB9ANPC1HPGD | |
| SCHEMBL3915501 | 0.80 | MEN1 (0.54) | MEN1KMT2ARAB9ANPC1HPGD | |
| SCHEMBL1527315 | 0.80 | MEN1 (0.54) | MEN1KMT2ARAB9ANPC1HPGD | |
| SCHEMBL1527314 | 0.80 | MEN1 (0.54) | MEN1KMT2ARAB9ANPC1HPGD | |
| SCHEMBL20573120 | 0.80 | MEN1 (0.54) | MEN1KMT2ARAB9ANPC1HPGD | |
| SCHEMBL20573107 | 0.80 | MEN1 (0.54) | MEN1KMT2ARAB9ANPC1HPGD | |
| SCHEMBL5449679 | 0.80 | MEN1 (0.54) | MEN1KMT2ARAB9ANPC1HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0590573-B1 | Resin for plastic lens | HITACHI CHEMICAL CO LTD (JP) | 1998-01-07 | — | — | EP | claimed |
| CN-116041999-B | Organic encapsulation film composition and application thereof | 武汉尚赛光电科技有限公司 | 2024-12-24 | — | — | CN | disclosed |
| CN-116063925-B | Photocurable composition, hard coating layer thereof and application thereof | 武汉尚赛光电科技有限公司 | 2024-08-16 | — | — | CN | disclosed |
| CN-116063637-B | Composition for forming dielectric film, application thereof and display device | 武汉尚赛光电科技有限公司 | 2023-09-15 | — | — | CN | disclosed |
| CN-116063925-A | Photocurable composition, hard coating layer thereof and application thereof | 武汉尚赛光电科技有限公司 | 2023-05-05 | — | — | CN | disclosed |
| CN-116063637-A | Composition for forming dielectric film, application thereof and display device | 武汉尚赛光电科技有限公司 | 2023-05-05 | — | — | CN | disclosed |
| CN-116041999-A | Organic encapsulation film composition and application thereof | 武汉尚赛光电科技有限公司 | 2023-05-02 | — | — | CN | disclosed |
| US-11036133-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2021-06-15 | — | — | US | disclosed |
| US-20200124961-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2020-04-23 | — | — | US | disclosed |
| US-9594303-B2 | Resist pattern-forming method and photoresist composition | JSR CORPORATION (JP) | 2017-03-14 | — | — | US | disclosed |
| US-7521169-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| CN-101333297-A | Organic/inorganic hybrid material and method for forming the same | IND TECH RES INST (CN) | 2008-12-31 | — | — | CN | disclosed |
| WO-2008135212-A1 | METAL SALT NANOGEL-CONTAINING POLYMERS | HELLING GUENTER (DE) | 2008-11-13 | — | — | WO | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| EP-0762197-B1 | Photographic recording material | AGFA GEVAERT AG (DE) | 2000-01-12 | — | — | EP | disclosed |
| EP-0553801-B1 | Use of sulfur-containing acid phosphoric ester as internal release agent | MITSUI TOATSU CHEMICALS (JP) | 1997-04-23 | — | — | EP | disclosed |
| EP-0762197-A1 | Photographic recording material | Agfa-Gevaert AG (DE) | 1997-03-12 | — | — | EP | disclosed |
| EP-0666498-A2 | Silver halide photographic material | Agfa-Gevaert AG (DE) | 1995-08-09 | — | — | EP | disclosed |
| US-5389708-A | Polymerizing polyisocyanate or polyisothiocyanate with polyol or polythiol in presence of thiophosphoric or dithiophosphoric acid ester | MITSUI TOATSU CHEMICALS, INC. (JP) | 1995-02-14 | — | — | US | disclosed |
| EP-0553801-A1 | Use of sulfur-containing acid phosphoric ester as internal release agent | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1993-08-04 | — | — | EP | disclosed |