Fluoride Ion

Fluoride Ion

SCHEMBL1996392

C[N+]1(C)CCCC1.[F-]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride Ion SCHEMBL4615559 0.96
SCHEMBL34886 0.95
Methyl Alcohol SCHEMBL29229453 0.92 KDM4E (0.33)
SCHEMBL12757222 0.91 KDM4E (0.33)
SCHEMBL2857671 0.91
Iodide SCHEMBL597934 0.91
SCHEMBL9752211 0.91
Bromide SCHEMBL1697180 0.91
SCHEMBL8504637 0.91 KDM4E (0.33)
SCHEMBL16566642 0.91 KDM4E (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117999475-A Electrochemical gas sensor and electrolyte for electrochemical gas sensor 德尔格安全股份两合公司 2024-05-07 CN disclosed
CN-117843588-A Preparation method of quaternary ammonium tetrafluoroborate 香河昆仑新能源材料股份有限公司 2024-04-09 CN disclosed
EP-4196779-A1 ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR Dräger Safety AG & Co. KGaA (DE) 2023-06-21 EP disclosed
WO-2023046704-A1 ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR Dräger Safety AG & Co. KGaA (DE) 2023-03-30 WO disclosed
US-9243013-B2 Ionic compound, method for producing the same, and ion-conductive material comprising the same NIPPON SHOKUBAI CO., LTD. (JP) 2016-01-26 US disclosed
US-20110150736-A1 IONIC COMPOUND, METHOD FOR PRODUCING THE SAME, AND ION-CONDUCTIVE MATERIAL COMPRISING THE SAME NIPPON SHOKUBAI CO., LTD. (JP) 2011-06-23 US disclosed
EP-2327707-A1 IONIC COMPOUND, PROCESS FOR PRODUCING SAME, AND ION-CONDUCTIVE MATERIAL COMPRISING SAME Nippon Shokubai Co., Ltd. (JP) 2011-06-01 EP disclosed
US-20080210900-A1 Selective Wet Etchings Of Oxides PNC BANK, NATIONAL ASSOCIATION 2008-09-04 US disclosed
EP-1880410-A2 SELECTIVE WET ETCHING OF OXIDES SACHEM, INC. (US) 2008-01-23 EP disclosed
WO-2006124201-A2 SELECTIVE WET ETCHING OF OXIDES SACHEM, INC. (US) 2006-11-23 WO disclosed