⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19822880 | 0.84 | — | — | |
| SCHEMBL19822878 | 0.84 | — | — | |
| SCHEMBL15153383 | 0.61 | CA1 (0.32) | — | |
| SCHEMBL24116357 | 0.60 | — | — | |
| SCHEMBL17974526 | 0.60 | — | — | |
| SCHEMBL8324582 | 0.60 | — | — | |
| SCHEMBL21652845 | 0.60 | — | — | |
| SCHEMBL282635 | 0.60 | — | — | |
| SCHEMBL12036488 | 0.57 | — | — | |
| SCHEMBL13072132 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11693316-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-04 | — | — | US | disclosed |
| US-20220206384-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-06-30 | — | — | US | disclosed |
| US-20180072651-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-15 | — | — | US | disclosed |