SCHEMBL1999210

SCHEMBL1999210

FC1C(F)C(F)(F)C(F)(F)C(F)(F)C1F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL370762 0.84
SCHEMBL15409418 0.84
SCHEMBL15410523 0.84
SCHEMBL424208 0.84
SCHEMBL15410658 0.84
SCHEMBL24633451 0.84
SCHEMBL17924577 0.75
SCHEMBL471760 0.75
SCHEMBL11353695 0.74
SCHEMBL8204702 0.72 MEN1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8418530-B1 Compositions and methods for detecting leaks in HVAC/R systems MAINSTREAM ENGINEERING CORPORATION (US) 2013-04-16 US claimed
US-7960331-B2 Replacement solvents having improved properties and methods of using the same GRZYLL LAWRENCE R 2011-06-14 US claimed
US-7429557-B2 Replacement solvents having improved properties and methods of using the same MAINSTREAM ENGINEERING CORPORATION (US) 2008-09-30 US claimed
CN-118679554-A Etching method 株式会社力森诺科 2024-09-20 CN disclosed
US-11574821-B2 Substrate treating method, substrate treating liquid and substrate treating apparatus SCREEN Holdings Co., Ltd. 2023-02-07 US disclosed
CN-111116306-B Preparation method of hexafluorobenzene 洛阳森蓝化工材料科技有限公司 2022-09-13 CN disclosed
US-20220189762-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2022-06-16 US disclosed
US-11302525-B2 Substrate processing method and substrate processing apparatus SCREEN Holdings Co., Ltd. 2022-04-12 US disclosed
US-20210331192-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS SCREEN Holdings Co., Ltd. 2021-10-28 US disclosed
US-11133175-B2 Substrate treating method and substrate treating apparatus SCREEN Holdings Co., Ltd. 2021-09-28 US disclosed
CN-111116306-A Preparation method of hexafluorobenzene 洛阳森蓝化工材料科技有限公司 2020-05-08 CN disclosed
US-7566409-B1 Replacement solvents having improved properties for refrigeration flushes MAINSTREAM ENGINEERING CORPORATION (US) 2009-07-28 US disclosed
US-7531495-B2 Cleaning agent, cleaning method and cleaning apparatus ASAHI KASEI KABUSHIKI KAISHA (JP) 2009-05-12 US disclosed
US-20090026418-A1 Replacement Solvents Having Improved Properties and Methods of Using the Same MAINSTREAM ENGINEERING CORP. (US) 2009-01-29 US disclosed
US-20090005282-A1 Replacement Solvents Having Improved Properties and Methods of Using the Same MAINSTREAM ENGINEERING CORP. (US) 2009-01-01 US disclosed
EP-1288284-B1 CLEANING AGENT, CLEANING METHOD AND CLEANING APPARATUS ASAHI CHEMICAL IND (JP) 2008-10-29 EP disclosed
US-7429557-B2 Replacement solvents having improved properties and methods of using the same MAINSTREAM ENGINEERING CORPORATION (US) 2008-09-30 US disclosed
US-20060166851-A1 Replacement solvents having improved properties and methods of using the same MAINSTREAM ENGINEERING CORP. 2006-07-27 US disclosed
US-20030168079-A1 Cleaning agent, cleaning method and cleaning apparatus TOKUYAMA METEL CORPORATION (JP) 2003-09-11 US disclosed
EP-1288284-A1 CLEANING AGENT, CLEANING METHOD AND CLEANING APPARATUS Asahi Kasei Kabushiki Kaisha (JP) 2003-03-05 EP disclosed