⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1032719 | 0.76 | — | — | |
| SCHEMBL138268 | 0.76 | — | — | |
| SCHEMBL7712886 | 0.71 | — | — | |
| SCHEMBL344873 | 0.71 | — | — | |
| SCHEMBL269968 | 0.69 | — | — | |
| SCHEMBL5275160 | 0.69 | — | — | |
| SCHEMBL93438 | 0.65 | — | — | |
| SCHEMBL51804 | 0.65 | — | — | |
| SCHEMBL1715624 | 0.65 | — | — | |
| SCHEMBL3033018 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12015122-B2 | Silicon-based energy storage devices with carboxylic ether, carboxylic acid based salt, or acrylate electrolyte containing electrolyte additives | ENEVATE CORPORATION (US) | 2024-06-18 | — | — | US | claimed |
| US-20210218059-A1 | SILICON-BASED ENERGY STORAGE DEVICES WITH CARBOXYLIC ETHER, CARBOXYLIC ACID BASED SALT, OR ACRYLATE ELECTROLYTE CONTAINING ELECTROLYTE ADDITIVES | ENEVATE CORPORATION | 2021-07-15 | — | — | US | claimed |
| US-20190190070-A1 | SILICON-BASED ENERGY STORAGE DEVICES WITH CARBOXYLIC ETHER, CARBOXYLIC ACID BASED SALT, OR ACRYLATE ELECTROLYTE CONTAINING ELECTROLYTE ADDITIVES | ENEVATE CORPORATION | 2019-06-20 | — | — | US | claimed |
| WO-2019113528-A1 | SILICON-BASED ENERGY STORAGE DEVICES WITH CARBOXYLIC ETHER, CARBOXYLIC ACID BASED SALT, OR ACRYLATE ELECTROLYTE CONTAINING ELECTROLYTE ADDITIVES | ENEVATE CORPORATION (US) | 2019-06-13 | — | — | WO | claimed |
| US-12015122-B2 | Silicon-based energy storage devices with carboxylic ether, carboxylic acid based salt, or acrylate electrolyte containing electrolyte additives | ENEVATE CORPORATION (US) | 2024-06-18 | — | — | US | disclosed |
| US-20210218059-A1 | SILICON-BASED ENERGY STORAGE DEVICES WITH CARBOXYLIC ETHER, CARBOXYLIC ACID BASED SALT, OR ACRYLATE ELECTROLYTE CONTAINING ELECTROLYTE ADDITIVES | ENEVATE CORPORATION | 2021-07-15 | — | — | US | disclosed |
| US-10978739-B2 | Silicon-based energy storage devices with carboxylic ether, carboxylic acid based salt, or acrylate electrolyte containing electrolyte additives | ENEVATE CORPORATION (US) | 2021-04-13 | — | — | US | disclosed |
| US-20190190070-A1 | SILICON-BASED ENERGY STORAGE DEVICES WITH CARBOXYLIC ETHER, CARBOXYLIC ACID BASED SALT, OR ACRYLATE ELECTROLYTE CONTAINING ELECTROLYTE ADDITIVES | ENEVATE CORPORATION | 2019-06-20 | — | — | US | disclosed |
| WO-2019113528-A1 | SILICON-BASED ENERGY STORAGE DEVICES WITH CARBOXYLIC ETHER, CARBOXYLIC ACID BASED SALT, OR ACRYLATE ELECTROLYTE CONTAINING ELECTROLYTE ADDITIVES | ENEVATE CORPORATION (US) | 2019-06-13 | — | — | WO | disclosed |
| EP-1537158-B1 | RADIATION CURED POLYURETHANES WITH CAPPED AMINO GROUPS | BASF SE (DE) | 2013-04-24 | — | — | EP | disclosed |
| US-7964328-B2 | Condensation polymer photoconductive elements | EASTMAN KODAK COMPANY (US) | 2011-06-21 | — | — | US | disclosed |
| US-7579127-B2 | Blocked polyisocyanates incorporating planar electron-deficient tetracobonylbisimide moieties | EASTMAN KODAK COMPANY (US) | 2009-08-25 | — | — | US | disclosed |
| EP-1915647-A1 | CONDENSATION POLYMER PHOTOCONDUCTIVE ELEMENTS | Eastman Kodak Company (US) | 2008-04-30 | — | — | EP | disclosed |
| US-20070292795-A1 | Blocked polyisocyanates incorporating planar electron-deficient tetracabonylbisimide moieties | EASTMAN KODAK COMPANY | 2007-12-20 | — | — | US | disclosed |
| WO-2007024522-A1 | CONDENSATION POLYMER PHOTOCONDUCTIVE ELEMENTS | EASTMAN KODAK COMPANY (US) | 2007-03-01 | — | — | WO | disclosed |
| US-20070042282-A1 | Condensation polymer photoconductive elements | EASTMAN KODAK COMPANY | 2007-02-22 | — | — | US | disclosed |
| US-20050244652-A1 | Radiation curable polyurethanes with capped amino groups | BASF AKTIENGESELLSCHAFT (DE) | 2005-11-03 | — | — | US | disclosed |
| US-5102774-A | Carboxyl-containing polyurethanes of trimethylhexamethylene diisocyanate, dimethylolpropionic acid and an hydroxyethyl (meth)acrylate; methylene chloride solvent resistance | ARMSTRONG WORLD INDUSTRIES, INC. (US) | 1992-04-07 | — | — | US | disclosed |
| US-5089376-A | From condensation reaction of a diisocyanate, a hydroxy alkyl acrylate, and a carboxylic acid polyol | ARMSTRONG WORLD INDUSTRIES, INC. (US) | 1992-02-18 | — | — | US | disclosed |
| EP-0323803-A1 | Stabilization of coatings by N-formylated hindered amines | CIBA-GEIGY AG (CH) | 1989-07-12 | — | — | EP | disclosed |