SCHEMBL2003289

SCHEMBL2003289

N#CSCCCCC(CC(F)(C(F)(F)F)C(F)(F)F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL773491 0.95
SCHEMBL4318250 0.92
SCHEMBL4325755 0.88
SCHEMBL12270726 0.84
SCHEMBL4320068 0.83
SCHEMBL14615147 0.80
SCHEMBL4317218 0.80
SCHEMBL799430 0.79
SCHEMBL4557460 0.79
SCHEMBL805070 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110213113-A1 PRODUCTION PROCESSES AND SYSTEMS, COMPOSITIONS, SURFACTANTS, MONOMER UNITS, METAL COMPLEXES, PHOSPHATE ESTERS, GLYCOLS, AQUEOUS FILM E. I. DU PONT DE NEMOURS AND COMPANY CHEMTURA CORPORATION (US) 2011-09-01 US disclosed
US-20110213113-A1 PRODUCTION PROCESSES AND SYSTEMS, COMPOSITIONS, SURFACTANTS, MONOMER UNITS, METAL COMPLEXES, PHOSPHATE ESTERS, GLYCOLS, AQUEOUS FILM E. I. DU PONT DE NEMOURS AND COMPANY CHEMTURA CORPORATION (US) 2011-09-01 US disclosed
US-7964553-B2 Fluorinated compositions comprising at least one CF3 group and at least one CF2CH2CH(CF3) group, processes for manufacturing the fluorinated compositions, and methods for treating substrates with the fluorinated compositions; surfactants, fire extinguishants, monomers E. I. Dupont de Nmeours and Company (US) 2011-06-21 US disclosed
US-7964553-B2 Fluorinated compositions comprising at least one CF3 group and at least one CF2CH2CH(CF3) group, processes for manufacturing the fluorinated compositions, and methods for treating substrates with the fluorinated compositions; surfactants, fire extinguishants, monomers E. I. Dupont de Nmeours and Company (US) 2011-06-21 US disclosed
US-7964553-B2 Fluorinated compositions comprising at least one CF3 group and at least one CF2CH2CH(CF3) group, processes for manufacturing the fluorinated compositions, and methods for treating substrates with the fluorinated compositions; surfactants, fire extinguishants, monomers E. I. Dupont de Nmeours and Company (US) 2011-06-21 US disclosed
US-20080108785-A1 Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams and foam stabilizers E. I. DU PONT DE NEMOURS AND COMPANY 2008-05-08 US disclosed
US-20080108785-A1 Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams and foam stabilizers E. I. DU PONT DE NEMOURS AND COMPANY 2008-05-08 US disclosed
US-20080108785-A1 Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams and foam stabilizers E. I. DU PONT DE NEMOURS AND COMPANY 2008-05-08 US disclosed
WO-2008027604-A2 PRODUCTION PROCESSES AND SYSTEMS, COMPOSITIONS, SURFACTANTS MONOMER UNITS, METAL COMPLEXES, PHOSPHATE ESTERS, GLYCOLS, AQUEOUS FILM FORMING FOAMS AND FOAM STABILIZERS GREAT LAKES CHEMICAL CORPORATION (US) 2008-03-06 WO disclosed