⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL709630 | 0.97 | — | — | |
| SCHEMBL17599072 | 0.90 | — | — | |
| SCHEMBL1767159 | 0.83 | — | — | |
| SCHEMBL1702920 | 0.69 | — | — | |
| SCHEMBL11230884 | 0.69 | — | — | |
| SCHEMBL487409 | 0.67 | — | — | |
| SCHEMBL548297 | 0.67 | — | — | |
| SCHEMBL11324609 | 0.67 | — | — | |
| SCHEMBL9158290 | 0.67 | — | — | |
| SCHEMBL9319044 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170038679-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND | JSR CORPORATION (JP) | 2017-02-09 | — | — | US | disclosed |
| US-9523911-B2 | Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound | JSR CORPORATION (JP) | 2016-12-20 | — | — | US | disclosed |
| US-20140342288-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND | JSR CORPORATION (JP) | 2014-11-20 | — | — | US | disclosed |
| EP-1857471-B1 | POLYMERIZATION CATALYST COMPOSITION AND PROCESS FOR PRODUCTION OF POLYMER | MITSUI CHEMICALS INC (JP) | 2013-04-24 | — | — | EP | disclosed |
| US-8153667-B2 | ATPase inhibitors; Substituted fluorene or benzenerings joined to an alkylene through a sulfone or sulfoxide linkage; without excessive toxicity, irritation, allergic response etc.; sleep dioredrs like excessive sleepiness; Parkinson's disease; Alzheimer's disease; ADD; ADHA; depression, fatigue | CEPHALON, INC. (US) | 2012-04-10 | — | — | US | disclosed |
| US-7960305-B2 | a mixture of a phosphazenium compound such as tetrakis[tris(dimethylamino)phosphoranylideneamino]phosphonium chloride, transition metal halides and an organic halogen compound as an activator, used for addition homo/copolymerization; living polymers | MITSUI CHEMICALS, INC. (JP) | 2011-06-14 | — | — | US | disclosed |
| US-20080177014-A1 | Polymerization Catalyst Composition and Process for Production of Polymer | MITSUI CHEMICALS, INC. (JP) | 2008-07-24 | — | — | US | disclosed |
| US-20080070956-A1 | Tricyclic aromatic and bis-phenyl sulfinyl derivatives | CEPHALON, INC. (US) | 2008-03-20 | — | — | US | disclosed |
| EP-1857471-A1 | POLYMERIZATION CATALYST COMPOSITION AND PROCESS FOR PRODUCTION OF POLYMER | Mitsui Chemicals, Inc. (JP) | 2007-11-21 | — | — | EP | disclosed |
| EP-0283333-B1 | CHLOROFORMIATES WITH A VINYLIC STRUCTURE, PROCESS FOR THEIR PREPARATION AND THEIR USE | SOCIETE NATIONALE DES POUDRES ET EXPLOSIFS (FR) | 1990-05-23 | — | — | EP | disclosed |
| US-4808743-A | Vinyl chloroformates and preparation | SOCIETE NATIONALE DES POUDRES ET EXPLOSIFS (FR) | 1989-02-28 | — | — | US | disclosed |
| EP-0283333-A1 | Chloroformiates with a vinylic structure, process for their preparation and their use | SOCIETE NATIONALE DES POUDRES ET EXPLOSIFS (FR) | 1988-09-21 | — | — | EP | disclosed |