SCHEMBL2006270

SCHEMBL2006270

CC(S)c1[c]cccc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4433093 0.80
SCHEMBL96104 0.80
SCHEMBL28857777 0.76
SCHEMBL310012 0.76
SCHEMBL1233149 0.76
SCHEMBL28659321 0.76
SCHEMBL14957560 0.76
SCHEMBL9490640 0.76
SCHEMBL1072224 0.76
SCHEMBL16426499 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2137576-B1 DUAL PHOTOINITIATOR, PHOTOCURABLE COMPOSITION, USE THEREOF AND PROCESS FOR PRODUCING A THREE DIMENSIONAL ARTICLE 3D SYSTEMS INCORPORATED (US) 2018-08-29 EP disclosed
US-7964248-B2 Dual photoinitiator, photocurable composition, use thereof and process for producing a three dimensional article HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2011-06-21 US disclosed
US-20100327493-A1 DUAL PHOTOINITIATOR, PHOTOCURABLE COMPOSITION, USE THEREOF AND PROCESS FOR PRODUCING A THREE DIMENSIONAL ARTICLE HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2010-12-30 US disclosed
EP-2137576-A1 DUAL PHOTOINITIATOR, PHOTOCURABLE COMPOSITION, USE THEREOF AND PROCESS FOR PRODUCING A THREE DIMENSIONAL ARTICLE Huntsman Advanced Materials Americas LLC (US) 2009-12-30 EP disclosed
WO-2008127930-A1 DUAL PHOTOINITIATOR, PHOTOCURABLE COMPOSITION, USE THEREOF AND PROCESS FOR PRODUCING A THREE DIMENSIONAL ARTICLE HUNTSMAN ADVANCED MATERIALS AMERICAS INC. 2008-10-23 WO disclosed