Sulfuric Acid

Sulfuric Acid

SCHEMBL2008809

O=S(=O)([O-])[O-].O=S(=O)([O-])[O-].[Fe+3].[K+]

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.42
ALDH1A1 P00352 1/20 0.42
TSHR P16473 1/20 0.42
KMT2A Q03164 1/20 0.42
TP53 P04637 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfuric Acid SCHEMBL5159856 1.00 MEN1 (0.42) MEN1ALDH1A1TSHRKMT2ATP53
Sulfuric Acid SCHEMBL5165661 0.94 MEN1 (0.39) MEN1ALDH1A1TSHRKMT2ATP53
Sulfuric Acid SCHEMBL11306096 0.94 MEN1 (0.39) MEN1ALDH1A1TSHRKMT2ATP53
Sulfuric Acid SCHEMBL19138815 0.94 MEN1 (0.39) MEN1ALDH1A1TSHRKMT2ATP53
Sulfuric Acid SCHEMBL11906005 0.94 MEN1 (0.39) MEN1ALDH1A1TSHRKMT2ATP53
Sulfuric Acid SCHEMBL11909869 0.94 MEN1 (0.46) MEN1ALDH1A1TSHRKMT2ATP53
Sulfuric Acid SCHEMBL7994929 0.94 MEN1 (0.46) MEN1ALDH1A1TSHRKMT2ATP53
Sulfuric Acid SCHEMBL19184 0.94
Sulfuric Acid SCHEMBL11176659 0.94 MEN1 (0.46) MEN1ALDH1A1TSHRKMT2ATP53
Sulfuric Acid SCHEMBL15169448 0.94 MEN1 (0.46) MEN1ALDH1A1TSHRKMT2ATP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 207 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12187919-B2 Polishing slurry composition KCTECH CO., LTD. (KR) 2025-01-07 US claimed
WO-2024162639-A1 POLISHING SLURRY COMPOSITION 주식회사 케이씨텍 2024-08-08 WO claimed
CN-117782749-A One-step hematoxylin eosin staining mixed reagent 嘉兴市中医医院 2024-03-29 CN claimed
WO-2023243905-A1 POLISHING SLURRY COMPOSITION FOR SILICON CARBIDE WAFER 주식회사 케이씨텍 2023-12-21 WO claimed
CN-117049487-A Method for chemically removing magnesium from phosphorite 四川大学 2023-11-14 CN claimed
CN-116609321-A Qualitative detection method for external sulfides in water body 山东金兆珠宝有限公司 2023-08-18 CN claimed
CN-112759040-B Composite electric flocculant and method for treating cold-rolling emulsion wastewater through electric flocculation 北京中科圣泰环境科技有限公司 2023-01-06 CN claimed
CN-115541511-A Unsaturated iron binding force determination kit and application thereof 武汉生之源生物科技股份有限公司 2022-12-30 CN claimed
CN-109912545-B Modified cationic compound, preparation method thereof and solid-phase chemical cleaning agent for drilling fluid 中石化石油工程技术服务有限公司 2022-10-14 CN claimed
US-20220195243-A1 POLISHING SLURRY COMPOSITION KCTECH CO., LTD. (KR) 2022-06-23 US claimed
US-20040108277-A1 Reverse osmosis pretreatment using low pressure filtration IONICS, INCORPORATED 2004-06-10 US claimed
US-6719819-B2 COMPRISES COLLOIDAL SILICA; FOR ALUMINUM DISKS AND GLASS-MADE HARD DISKS NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2004-04-13 US claimed
US-20030110711-A1 Polishing composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2003-06-19 US claimed
EP-1287088-A1 POLISHING COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2003-03-05 EP claimed
WO-2003008336-A2 REVERSE OSMOSIS PRETREATMENT USING LOW PRESSURE FILTRATION MICROBAR, INC. (US) 2003-01-30 WO claimed
US-6398827-B1 STABLE AQUEOUS SPHERICAL MONILIFORM COLLOIDAL SILICA BONDED WITH METAL OXIDE; MONOPLANAR; IRON OXIDE OR INORGANIC SALT ACCELERATOR; ALUMINA DISKS; SILICA SURFACES; SEMICONDUCTORWAFERS NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2002-06-04 US claimed
WO-2002008139-A2 METHOD OF INCREASING THE HEAT INSULATING CAPACITY OF A MATERIAL BALMORAL TECHNOLOGIES (PTY) LIMITED (ZA) 2002-01-31 WO claimed
WO-2001085868-A1 POLISHING COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2001-11-15 WO claimed
EP-1065251-A1 Polishing composition Nissan Chemical Industries, Ltd. (JP) 2001-01-03 EP claimed
EP-0005679-B1 CONTINUOUS PROCESS FOR OBTAINING PURE ALUMINIUM OXIDE FROM AN ACID LIQUOR ORIGINATING FROM THE CHLORO-SULFURIC LEACHING OF AN ALUMINOUS MINERAL, AND THE PURIFICATION OF THE LIQUOR SEPARATED FROM THE ALUMINIUM OXIDE ALUMINIUM PECHINEY (FR) 1982-09-08 EP claimed