⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL104938 | 0.77 | — | — | |
| SCHEMBL29251446 | 0.77 | — | — | |
| Water SCHEMBL27978220 | 0.74 | — | — | |
| SCHEMBL9859927 | 0.73 | — | — | |
| SCHEMBL448494 | 0.67 | — | — | |
| SCHEMBL28656644 | 0.67 | — | — | |
| SCHEMBL264899 | 0.65 | — | — | |
| SCHEMBL1702201 | 0.65 | — | — | |
| SCHEMBL1695676 | 0.65 | — | — | |
| SCHEMBL17914111 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10995269-B2 | Etchant composition and method of fabricating integrated circuit device using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-05-04 | — | — | US | claimed |
| US-20180142151-A1 | ETCHANT COMPOSITION AND METHOD OF FABRICATING INTEGRATED CIRCUIT DEVICE USING THE SAME | SOULBRAIN CO., LTD. (KR) | 2018-05-24 | — | — | US | claimed |
| CN-108102654-B | Etchant composition and method for manufacturing integrated circuit device using the same | 三星电子株式会社 | 2022-02-18 | — | — | CN | disclosed |
| US-10995269-B2 | Etchant composition and method of fabricating integrated circuit device using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-05-04 | — | — | US | disclosed |
| US-20180142151-A1 | ETCHANT COMPOSITION AND METHOD OF FABRICATING INTEGRATED CIRCUIT DEVICE USING THE SAME | SOULBRAIN CO., LTD. (KR) | 2018-05-24 | — | — | US | disclosed |
| US-20180142151-A1 | ETCHANT COMPOSITION AND METHOD OF FABRICATING INTEGRATED CIRCUIT DEVICE USING THE SAME | SOULBRAIN CO., LTD. (KR) | 2018-05-24 | — | — | US | disclosed |