⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8690407 | 0.60 | — | — | |
| Hexamethylbenzene SCHEMBL114857 | 0.57 | RXFP1 (0.33) | — | |
| Hexamethylbenzene SCHEMBL3853890 | 0.52 | RXFP1 (0.31) | — | |
| Hexamethylbenzene SCHEMBL8980194 | 0.52 | RXFP1 (0.31) | — | |
| Hexamethylbenzene SCHEMBL9577265 | 0.52 | RXFP1 (0.31) | — | |
| SCHEMBL17581120 | 0.50 | — | — | |
| Hexamethylbenzene SCHEMBL14954046 | 0.48 | — | — | |
| Hexamethylbenzene SCHEMBL14954050 | 0.48 | — | — | |
| Hexamethylbenzene SCHEMBL14954044 | 0.48 | — | — | |
| Hexamethylbenzene SCHEMBL14954175 | 0.48 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11067889-B2 | Compound, composition, and method for producing same, underlayer film forming material for lithography, composition for underlayer film formation for lithography, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-07-20 | — | — | US | disclosed |
| US-20200247739-A1 | COMPOUND, RESIN, COMPOSITION, PATTERN FORMATION METHOD, AND PURIFICATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-08-06 | — | — | US | disclosed |
| US-10723690-B2 | (Meth)acryloyl compound and method for producing same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-07-28 | — | — | US | disclosed |
| US-10550068-B2 | Compound and method for producing same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-02-04 | — | — | US | disclosed |
| US-20180246407-A1 | COMPOUND, COMPOSITION, AND METHOD FOR PRODUCING SAME, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, AND PURIFICATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-08-30 | — | — | US | disclosed |
| US-20180210341-A1 | NOVEL (METH)ACRYLOYL COMPOUND AND METHOD FOR PRODUCING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-07-26 | — | — | US | disclosed |
| US-20180201570-A1 | NOVEL COMPOUND AND METHOD FOR PRODUCING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-07-19 | — | — | US | disclosed |
| EP-3345889-A1 | COMPOUND AND METHOD FOR PRODUCING SAME, COMPOSITION, COMPOSITION FOR FORMING OPTICAL COMPONENT, COMPOSITION FOR FORMING LITHOGRAPHY FILM, RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, MATERIAL FOR FORMING LITHOGRAPHIC UNDERLAYER FILM, COMPOSITION FOR FORMING LITHOGRAPHIC UNDERLAYER FILM, METHOD FOR PRODUCING LITHOGRAPHIC UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, METHOD FOR FORMING CIRCUIT PATTERN, AND PURIFICATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-07-11 | — | — | EP | disclosed |
| EP-3327505-A1 | NOVEL COMPOUND AND METHOD FOR PRODUCING SAME | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-05-30 | — | — | EP | disclosed |
| EP-3326997-A1 | NEW (METH)ACRYLOYL COMPOUND AND PRODUCTION METHOD FOR SAME | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-05-30 | — | — | EP | disclosed |