SCHEMBL2018616

SCHEMBL2018616

OC([S])=S

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1550403 0.73
SCHEMBL31376902 0.73
SCHEMBL27076 0.73
SCHEMBL382648 0.71
SCHEMBL6228272 0.71
SCHEMBL43778 0.71
Ammonia Solution, Strong SCHEMBL2222834 0.67
Hydrochloric Acid SCHEMBL10598713 0.67
Ammonia Solution, Strong SCHEMBL7960184 0.67 CA1 (0.33)
Hydrogen Sulfide SCHEMBL9496497 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2370269-B1 PATTERNING PROCESS 3M INNOVATIVE PROPERTIES CO (US) 2015-08-05 EP disclosed
US-8950324-B2 Apparatus and method for microcontact printing using a pressurized roller 3M INNOVATIVE PROPERTIES COMPANY (US) 2015-02-10 US disclosed
US-8858813-B2 Patterning process 3M INNOVATIVE PROPERTIES COMPANY (US) 2014-10-14 US disclosed
EP-2516162-A1 APPARATUS AND METHOD FOR MICROCONTACT PRINTING USING A PRESSURIZED ROLLER 3M Innovative Properties Company (US) 2012-10-31 EP disclosed
US-20120247355-A1 APPARATUS AND METHOD FOR MICROCONTACT PRINTING USING A PRESSURIZED ROLLER 3M INNOVATIVE PROPERTIES COMPANY 2012-10-04 US disclosed
EP-2370269-A1 PATTERNING PROCESS 3M Innovative Properties Company (US) 2011-10-05 EP disclosed
US-20110226733-A1 PATTERNING PROCESS 3M INNOVATIVE PROPERTIES COMPANY 2011-09-22 US disclosed
WO-2011079032-A1 APPARATUS AND METHOD FOR MICROCONTACT PRINTING USING A PRESSURIZED ROLLER 3M INNOVATIVE PROPERTIES COMPANY (US) 2011-06-30 WO disclosed
WO-2010068535-A1 PATTERNING PROCESS 3M INNOVATIVE PROPERTIES COMPANY (US) 2010-06-17 WO disclosed