⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3085484 | 0.74 | — | — | |
| SCHEMBL4707868 | 0.74 | — | — | |
| SCHEMBL28773909 | 0.69 | — | — | |
| SCHEMBL30636750 | 0.69 | — | — | |
| SCHEMBL6048671 | 0.67 | — | — | |
| SCHEMBL14184378 | 0.67 | TSHR (0.36) | — | |
| SCHEMBL16180561 | 0.65 | — | — | |
| SCHEMBL9158543 | 0.64 | — | — | |
| SCHEMBL9902961 | 0.61 | TSHR (0.31) | — | |
| SCHEMBL1686664 | 0.61 | TSHR (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8247589-B2 | Organic silicon phosphate and fabrication method thereof | GRAND TEK ADVANCE MATERIAL SCIENCE CO., LTD. (TW) | 2012-08-21 | — | — | US | claimed |
| US-20110160475-A1 | ORGANIC SILICON PHOSPHATE AND FABRICATION METHOD THEREOF | GRAND TEK ADVANCE MATERIAL SCIENCE CO., LTD. (TW) | 2011-06-30 | — | — | US | claimed |
| US-8247589-B2 | Organic silicon phosphate and fabrication method thereof | GRAND TEK ADVANCE MATERIAL SCIENCE CO., LTD. (TW) | 2012-08-21 | — | — | US | disclosed |
| US-20120114544-A1 | ORGANIC CHLOROHYDROSILANE AND METHOD FOR PREPARING THEM | SAMSUNG FINE CHEMICALS CO., LTD (KR) | 2012-05-10 | — | — | US | disclosed |
| US-20110160475-A1 | ORGANIC SILICON PHOSPHATE AND FABRICATION METHOD THEREOF | GRAND TEK ADVANCE MATERIAL SCIENCE CO., LTD. (TW) | 2011-06-30 | — | — | US | disclosed |
| US-7541134-B2 | Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-06-02 | — | — | US | disclosed |
| US-7485690-B2 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-03 | — | — | US | disclosed |
| EP-1798599-B1 | Antireflection film composition, patterning process and substrate using the same | SHINETSU CHEMICAL CO (JP) | 2008-08-06 | — | — | EP | disclosed |
| US-7385021-B2 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-06-10 | — | — | US | disclosed |
| US-20070213204-A1 | Ziegler-Natta catalyst with in situ-generated donor | NOVOLEN TECHNOLOGY HOLDINGS C.V. | 2007-09-13 | — | — | US | disclosed |
| EP-1798599-A1 | Antireflection film composition, patterning process and substrate using the same | Shinetsu Chemical Co., Ltd. (JP) | 2007-06-20 | — | — | EP | disclosed |
| US-20070134916-A1 | Antireflection film composition, patterning process and substrate using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-06-14 | — | — | US | disclosed |
| US-20050277058-A1 | Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same | SHIN-ETSU CHEMICAL CO., LTD. | 2005-12-15 | — | — | US | disclosed |
| US-20050274692-A1 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. | 2005-12-15 | — | — | US | disclosed |
| US-20050277755-A1 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | SHIN-ETSU CHEMICAL CO., LTD. | 2005-12-15 | — | — | US | disclosed |