SCHEMBL20215496

SCHEMBL20215496

CCC(C)(I)C(=O)OC1CC2CCC1C(CC(O)(C(F)(F)F)C(F)(F)F)C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18457344 0.87 — —
SCHEMBL20820948 0.84 — —
SCHEMBL13430303 0.79 — —
SCHEMBL11890221 0.79 — —
SCHEMBL91317 0.78 — —
SCHEMBL2735057 0.78 — —
SCHEMBL20215479 0.77 — —
SCHEMBL12761029 0.77 — —
SCHEMBL23974056 0.76 ATM (0.33) —
SCHEMBL14556915 0.76 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9989847-B2 Onium salt compound, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-05 — — US disclosed
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