Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 3/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.40 |
| ▸ | HMGCR | P04035 | 2/20 | 0.38 |
| ▸ | PTGES | O14684 | 1/20 | 0.36 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.36 |
| ▸ | PPARG | P37231 | 1/20 | 0.36 |
| ▸ | GLRA3 | O75311 | 1/20 | 0.36 |
| ▸ | GLRB | P48167 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.35 |
| ▸ | MEN1 | O00255 | 4/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | TSHR | P16473 | 3/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.35 |
| ▸ | BLM | P54132 | 2/20 | 0.35 |
| ▸ | ATM | Q13315 | 2/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.35 |
| ▸ | USP2 | O75604 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30077247 | 1.00 | CYP1A2 (0.40) | CYP1A2CYP2C9CYP2C19HMGCRPTGES | |
| SCHEMBL134694 | 0.92 | HMGCR (0.44) | CYP1A2CYP2C9CYP2C19HMGCRPTGES | |
| Methane SCHEMBL30445756 | 0.91 | HMGCR (0.43) | CYP1A2CYP2C9CYP2C19HMGCRPTGES | |
| SCHEMBL29228065 | 0.91 | CYP1A2 (0.45) | CYP1A2CYP2C9CYP2C19HMGCRGLRA3 | |
| SCHEMBL2026376 | 0.88 | HMGB1 (0.39) | CYP1A2PTGESALOX5PPARGKMT2A | |
| SCHEMBL2133313 | 0.87 | CYP1A2 (0.41) | CYP1A2CYP2C9CYP2C19HMGCRGLRA3 | |
| SCHEMBL2945793 | 0.85 | PPARG (0.43) | CYP1A2CYP2C9CYP2C19HMGCRPTGES | |
| SCHEMBL17491365 | 0.84 | PPARG (0.42) | CYP1A2CYP2C9CYP2C19HMGCRPTGES | |
| SCHEMBL106873 | 0.84 | HMGCR (0.40) | CYP1A2CYP2C9CYP2C19HMGCRPTGES | |
| SCHEMBL284534 | 0.84 | PPARG (0.42) | CYP1A2CYP2C9CYP2C19HMGCRPTGES |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3137540-B1 | STABILIZING COMPOSITIONS FOR STABILIZING MATERIALS AGAINST ULTRAVIOLET LIGHT AND THERMAL DEGRADATION | CYTEC IND INC (US) | 2024-10-30 | — | — | EP | claimed |
| EP-2864310-B1 | STABILIZER COMPOSITIONS CONTAINING SUBSTITUTED CHROMAN COMPOUNDS AND METHODS OF USE | CYTEC TECH CORP (US) | 2022-10-26 | — | — | EP | claimed |
| US-20220212375-A1 | POLYMERIC HOLLOW ARTICLES CONTAINING CHROMAN-BASED COMPOUNDS AND MADE BY ROTATIONAL MOLDING | CYTEC TECHNOLOGY CORP. | 2022-07-07 | — | — | US | claimed |
| US-20220153959-A1 | POLYOLEFIN COMPOSITIONS CONTAINING SUBSTITUTED CHROMAN COMPOUNDS AND MOLDED ARTICLES PRODUCED THEREFROM | CYTEC TECHNOLOGY CORP. | 2022-05-19 | — | — | US | claimed |
| US-10975278-B2 | Granular stabilizer compositions for use in polymer resins and methods of making same | CYTEC INDUSTRIES INC. (US) | 2021-04-13 | — | — | US | claimed |
| EP-2652014-B1 | PROCESSING ADDITIVES AND USES OF SAME IN ROTATIONAL MOLDING | CYTEC TECH CORP (US) | 2020-07-01 | — | — | EP | claimed |
| US-10407563-B2 | Processes for producing molded articles stabilized against ultraviolet light and thermal degradation | CYTEC INDUSTRIES INC. (US) | 2019-09-10 | — | — | US | claimed |
| US-20190264084-A1 | GRANULAR STABILIZER COMPOSITIONS FOR USE IN POLYMER RESINS AND METHODS OF MAKING SAME | CYTEC INDUSTRIES INC. (US) | 2019-08-29 | — | — | US | claimed |
| US-20170349730-A1 | PROCESSES FOR PRODUCING MOLDED ARTICLES STABILIZED AGAINST ULTRAVIOLET LIGHT AND THERMAL DEGRADATION | CYTEC INDUSTRIES INC. (US) | 2017-12-07 | — | — | US | claimed |
| US-9725579-B2 | Stabilizing compositions for stabilizing materials against ultraviolet light and thermal degradation | CYTEC INDUSTRIES INC. (US) | 2017-08-08 | — | — | US | claimed |
| US-20150315465-A1 | STABILIZING COMPOSITIONS FOR STABILIZING MATERIALS AGAINST ULTRAVIOLET LIGHT AND THERMAL DEGRADATION | CYTEC INDUSTRIES INC. (US) | 2015-11-05 | — | — | US | claimed |
| US-8501846-B2 | Stabilizer compositions | CYTEC TECHNOLOGY CORP. (US) | 2013-08-06 | — | — | US | claimed |
| US-20130145962-A1 | Stabilizer Compositions Containing Substituted Chroman Compounds and Methods of Use | CYTEC TECHNOLOGY CORP. (US) | 2013-06-13 | — | — | US | claimed |
| US-8445178-B2 | Composition for radical polymerization and method of forming pattern using the composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-05-21 | — | — | US | claimed |
| US-20120146257-A1 | PROCESSING ADDITIVES AND USES OF SAME IN ROTATIONAL MOLDING | CYTEC TECHNOLOGY CORP. (US) | 2012-06-14 | — | — | US | claimed |
| US-20100256266-A1 | STABILIZER COMPOSITIONS | CYTEC TECHNOLOGY CORP. (US) | 2010-10-07 | — | — | US | claimed |
| US-7759417-B2 | Stabilizer compositions | CYTEC TECHNOLOGY CORP. (US) | 2010-07-20 | — | — | US | claimed |
| US-20100119976-A1 | COMPOSITION FOR RADICAL POLYMERIZATION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-05-13 | — | — | US | claimed |
| US-20090149581-A1 | STABILIZER COMPOSITIONS | CYTEC TECHNOLOGY CORP. (US) | 2009-06-11 | — | — | US | claimed |
| EP-3786216-B1 | PROCESSING ADDITIVES AND USES OF SAME IN ROTATIONAL MOLDING | CYTEC TECH CORP (US) | 2026-02-11 | — | — | EP | disclosed |
| EP-3137540-B1 | STABILIZING COMPOSITIONS FOR STABILIZING MATERIALS AGAINST ULTRAVIOLET LIGHT AND THERMAL DEGRADATION | CYTEC IND INC (US) | 2024-10-30 | — | — | EP | disclosed |
| US-12076888-B2 | Stabilized compositions and process for producing same | CYTEC INDUSTRIES INC. (US) | 2024-09-03 | — | — | US | disclosed |
| EP-2864310-B1 | STABILIZER COMPOSITIONS CONTAINING SUBSTITUTED CHROMAN COMPOUNDS AND METHODS OF USE | CYTEC TECH CORP (US) | 2022-10-26 | — | — | EP | disclosed |
| US-20220212375-A1 | POLYMERIC HOLLOW ARTICLES CONTAINING CHROMAN-BASED COMPOUNDS AND MADE BY ROTATIONAL MOLDING | CYTEC TECHNOLOGY CORP. | 2022-07-07 | — | — | US | disclosed |
| US-20220153959-A1 | POLYOLEFIN COMPOSITIONS CONTAINING SUBSTITUTED CHROMAN COMPOUNDS AND MOLDED ARTICLES PRODUCED THEREFROM | CYTEC TECHNOLOGY CORP. | 2022-05-19 | — | — | US | disclosed |
| US-11312043-B2 | Processing additives and uses of same in rotational molding | CYTEC TECHNOLOGY CORP. (US) | 2022-04-26 | — | — | US | disclosed |
| US-20220048218-A1 | STABILIZED COMPOSITIONS AND PROCESS FOR PRODUCING SAME | CYTEC INDUSTRIES INC. (US) | 2022-02-17 | — | — | US | disclosed |
| US-10975278-B2 | Granular stabilizer compositions for use in polymer resins and methods of making same | CYTEC INDUSTRIES INC. (US) | 2021-04-13 | — | — | US | disclosed |
| US-10974417-B2 | Encapsulated stabilizer compositions | CYTEC INDUSTRIES INC. (US) | 2021-04-13 | — | — | US | disclosed |
| EP-3786216-A1 | PROCESSING ADDITIVES AND USES OF SAME IN ROTATIONAL MOLDING | Cytec Technology Corp. (US) | 2021-03-03 | — | — | EP | disclosed |
| EP-2652014-B1 | PROCESSING ADDITIVES AND USES OF SAME IN ROTATIONAL MOLDING | CYTEC TECH CORP (US) | 2020-07-01 | — | — | EP | disclosed |
| US-10407563-B2 | Processes for producing molded articles stabilized against ultraviolet light and thermal degradation | CYTEC INDUSTRIES INC. (US) | 2019-09-10 | — | — | US | disclosed |
| US-20190264084-A1 | GRANULAR STABILIZER COMPOSITIONS FOR USE IN POLYMER RESINS AND METHODS OF MAKING SAME | CYTEC INDUSTRIES INC. (US) | 2019-08-29 | — | — | US | disclosed |
| EP-3328929-B1 | ENCAPSULATED STABILIZER COMPOSITIONS | CYTEC IND INC (US) | 2019-04-17 | — | — | EP | disclosed |
| US-20180222087-A1 | ENCAPSULATED STABILIZER COMPOSITIONS | CYTEC INDUSTRIES INC. | 2018-08-09 | — | — | US | disclosed |
| EP-3328929-A1 | ENCAPSULATED STABILIZER COMPOSITIONS | Cytec Industries Inc. (US) | 2018-06-06 | — | — | EP | disclosed |
| US-20170349730-A1 | PROCESSES FOR PRODUCING MOLDED ARTICLES STABILIZED AGAINST ULTRAVIOLET LIGHT AND THERMAL DEGRADATION | CYTEC INDUSTRIES INC. (US) | 2017-12-07 | — | — | US | disclosed |
| US-9725579-B2 | Stabilizing compositions for stabilizing materials against ultraviolet light and thermal degradation | CYTEC INDUSTRIES INC. (US) | 2017-08-08 | — | — | US | disclosed |
| WO-2017023755-A1 | ENCAPSULATED STABILIZER COMPOSITIONS | CYTEC INDUSTRIES INC. (US) | 2017-02-09 | — | — | WO | disclosed |
| US-20150315465-A1 | STABILIZING COMPOSITIONS FOR STABILIZING MATERIALS AGAINST ULTRAVIOLET LIGHT AND THERMAL DEGRADATION | CYTEC INDUSTRIES INC. (US) | 2015-11-05 | — | — | US | disclosed |
| US-8530119-B2 | Positive photosensitive resin composition, cured film, protective film, interlayer insulating film, and semiconductor device and display element using the same | SUMITOMO BAKELITE CO., LTD. (JP) | 2013-09-10 | — | — | US | disclosed |
| US-8501846-B2 | Stabilizer compositions | CYTEC TECHNOLOGY CORP. (US) | 2013-08-06 | — | — | US | disclosed |
| US-20130145962-A1 | Stabilizer Compositions Containing Substituted Chroman Compounds and Methods of Use | CYTEC TECHNOLOGY CORP. (US) | 2013-06-13 | — | — | US | disclosed |
| US-8445178-B2 | Composition for radical polymerization and method of forming pattern using the composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-05-21 | — | — | US | disclosed |
| US-20120146257-A1 | PROCESSING ADDITIVES AND USES OF SAME IN ROTATIONAL MOLDING | CYTEC TECHNOLOGY CORP. (US) | 2012-06-14 | — | — | US | disclosed |
| US-20120100484-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PROTECTIVE FILM, INTERLAYER INSULATING FILM, AND SEMICONDUCTOR DEVICE AND DISPLAY ELEMENT USING THE SAME | SUMITOMO BAKELITE CO., LTD. (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20110155416-A1 | TREE RESISTANT INSULATION COMPOSITIONS | GENERAL CABLE TECHNOLOGIES CORPORATION (US) | 2011-06-30 | — | — | US | disclosed |
| US-7968623-B2 | Tree resistant insulation compositions | GENERAL CABLE TECHNOLOGIES CORP. (US) | 2011-06-28 | — | — | US | disclosed |
| US-20100256266-A1 | STABILIZER COMPOSITIONS | CYTEC TECHNOLOGY CORP. (US) | 2010-10-07 | — | — | US | disclosed |
| US-7759417-B2 | Stabilizer compositions | CYTEC TECHNOLOGY CORP. (US) | 2010-07-20 | — | — | US | disclosed |
| US-20100119976-A1 | COMPOSITION FOR RADICAL POLYMERIZATION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-05-13 | — | — | US | disclosed |
| US-20090264567-A1 | Stabilized Cross-Linked Polyolefin Compositions | ADDIVANT USA, LLC | 2009-10-22 | — | — | US | disclosed |
| US-20090149581-A1 | STABILIZER COMPOSITIONS | CYTEC TECHNOLOGY CORP. (US) | 2009-06-11 | — | — | US | disclosed |
| EP-1885783-A1 | STABILIZED CROSS-LINKED POLYOLEFIN COMPOSITIONS | Chemtura Europe GmbH (CH) | 2008-02-13 | — | — | EP | disclosed |
| WO-2006114283-A9 | STABILIZED CROSS-LINKED POLYOLEFIN COMPOSITIONS | CHEMTURA EUROP GMBH (CH) | 2007-09-27 | — | — | WO | disclosed |
| WO-2006114283-A1 | STABILIZED CROSS-LINKED POLYOLEFIN COMPOSITIONS | CHEMTURA EUROPE GMBH (CH) | 2006-11-02 | — | — | WO | disclosed |
| WO-2006114283-A1 | STABILIZED CROSS-LINKED POLYOLEFIN COMPOSITIONS | CHEMTURA EUROPE GMBH (CH) | 2006-11-02 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20220212375-A1 | POLYMERIC HOLLOW ARTICLES CONTAINING CHROMAN-BASED COMPOUNDS AND MADE BY ROTATIONAL MOLDING | RPS7, MRPS27, F7 | CYP1A2 3666/4885CYP2C9 2822/4885CYP2C19 3053/4885 |
| US-20220153959-A1 | POLYOLEFIN COMPOSITIONS CONTAINING SUBSTITUTED CHROMAN COMPOUNDS AND MOLDED ARTICLES PRODUCED THEREFROM | NOTUM, PMM2, WASF2 | CYP1A2 2191/4885CYP2C9 3018/4885CYP2C19 3896/4885 |
| US-11312043-B2 | Processing additives and uses of same in rotational molding | MCM4, MCM5, GRN | CYP1A2 2834/4885CYP2C9 1375/4885CYP2C19 2064/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.