SCHEMBL2026086

SCHEMBL2026086

C=C(CCl)C(=O)OCC(C)O

nearest known ligand 0.44

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.44
MAPT P10636 1/20 0.38
ALDH1A1 P00352 1/20 0.33
MAPK1 P28482 1/20 0.31
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7706137 0.86 TSHR (0.45) TSHRMAPTALDH1A1MAPK1HSD17B10
SCHEMBL2022273 0.85 TSHR (0.41) TSHRMAPTALDH1A1
SCHEMBL3379752 0.82 TSHR (0.45) TSHRMAPTMAPK1HSD17B10
SCHEMBL5084806 0.82 TSHR (0.45) TSHRMAPTMAPK1HSD17B10
SCHEMBL2023803 0.81 TSHR (0.37) TSHR
SCHEMBL2025630 0.81 TSHR (0.33) TSHRALDH1A1
SCHEMBL10709805 0.80 TSHR (0.44) TSHRMAPTMAPK1HSD17B10
SCHEMBL1371113 0.79 TSHR (0.47) TSHRMAPTALDH1A1MAPK1HSD17B10
SCHEMBL2809912 0.78 TSHR (0.42) TSHRMAPTALDH1A1MAPK1HSD17B10
SCHEMBL9067256 0.78 MAPT (0.49) TSHRMAPTALDH1A1MAPK1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104835551-A Highly conductive water-based ink SUN CHEMICAL CORP 2015-08-12 CN disclosed
EP-2059568-B1 HIGHLY CONDUCTIVE WATER-BASED INK SUN CHEMICAL CORP (US) 2014-09-03 EP disclosed
US-8709289-B2 High conductive water-based silver ink SUN CHEMICAL CORPORATION (US) 2014-04-29 US disclosed
US-8709288-B2 High conductive water-based silver ink SUN CHEMICAL CORPORATION (US) 2014-04-29 US disclosed
US-20120082939-A1 ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2012-04-05 US disclosed
US-20120082939-A1 ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2012-04-05 US disclosed
US-20110155812-A1 HIGH CONDUCTIVE WATER-BASED SILVER INK SUN CHEMICAL CORP. (US) 2011-06-30 US disclosed
EP-2059568-A1 HIGHLY CONDUCTIVE WATER-BASED INK Sun Chemical Corporation (US) 2009-05-20 EP disclosed
US-20080182090-A1 HIGH CONDUCTIVE WATER-BASED SILVER INK SUN CHEMICAL CORPORATION (US) 2008-07-31 US disclosed
WO-2008031015-A1 HIGHLY CONDUCTIVE WATER-BASED INK SUN CHEMICAL CORPORATION (US) 2008-03-13 WO disclosed
US-5399611-A Paint blend with thermosetting or thermoplastic resin and inorganic pigment THE SHERWIN-WILLIAMS COMPANY (US) 1995-03-21 US disclosed
US-5248717-A Hydroxy-functional polyester diluents as additives in coating compositions THE SHERWIN-WILLIAMS COMPANY (US) 1993-09-28 US disclosed
US-5104955-A Automotive paints; blends with film-forming polymers THE SHERWIN-WILLIAMS COMPANY (US) 1992-04-14 US disclosed
US-5004828-A For blending with film-forming thermosetting and/or thermoplastic polymers; low-volatility automobile paints THE SHERWIN-WILLIAMS COMPANY (US) 1991-04-02 US disclosed
US-4735995-A COPOLYMERIZING POLYESTER WITH AN ACRYLIC UNSATURATED COMPOUND THE SHERWIN-WILLIAMS COMPANY (US) 1988-04-05 US disclosed
US-4243705-A POLYESTER, AMINO RESIN OR PRECONDENSATE CROSSLINKING AGENT, POLYEPOXIDE, STYRENE-HYDROXY ACRYLATE OR ALLYL ALCOHOL COPOLYMER THE SHERWIN-WILLIAMS COMPANY (US) 1981-01-06 US disclosed
US-4169825-A HYDROXY POLYESTER, EPOXY RESIN, CAPPED ISOCYANATE OR AMINO RESIN CROSSLINKING AGENT THE SHERWIN-WILLIAMS COMPANY (US) 1979-10-02 US disclosed
US-4125678-A Radiation polymerizable compositions THE SHERWIN-WILLIAMS COMPANY (US) 1978-11-14 US disclosed