⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL973329 | 0.96 | — | — | |
| SCHEMBL395013 | 0.96 | — | — | |
| SCHEMBL5948419 | 0.93 | — | — | |
| Water SCHEMBL5096747 | 0.93 | — | — | |
| SCHEMBL5948900 | 0.93 | — | — | |
| SCHEMBL25422624 | 0.89 | — | — | |
| SCHEMBL5948370 | 0.89 | — | — | |
| SCHEMBL5949049 | 0.89 | — | — | |
| SCHEMBL25421976 | 0.87 | — | — | |
| SCHEMBL25422683 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 202 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118420875-B | Preparation method of ink-grade polyurethane | 安庆市索隆新材料有限公司 | 2024-09-24 | — | — | CN | claimed |
| CN-115894402-B | Fluorine-containing liquid crystal epoxy organic micromolecule and preparation method thereof | 哈尔滨理工大学 | 2024-08-06 | — | — | CN | claimed |
| CN-118420875-A | Preparation method of ink-grade polyurethane | 安庆市索隆新材料有限公司 | 2024-08-02 | — | — | CN | claimed |
| CN-113683868-B | Liquid crystal polymer film for 5G communication flexible copper-clad plate and preparation method thereof | 宁波聚嘉新材料科技有限公司 | 2023-06-13 | — | — | CN | claimed |
| CN-115894402-A | Fluorine-containing liquid crystal epoxy organic micromolecule and preparation method thereof | 哈尔滨理工大学 | 2023-04-04 | — | — | CN | claimed |
| CN-113683748-A | Fluorine-modified hyperbranched waterborne polyurethane resin and waterborne nano anti-corrosion self-cleaning finish paint using same | 江苏苏博特新材料股份有限公司 | 2021-11-23 | — | — | CN | claimed |
| CN-113683868-A | Liquid crystal polymer film for 5G communication flexible copper clad laminate and preparation method thereof | 宁波聚嘉新材料科技有限公司 | 2021-11-23 | — | — | CN | claimed |
| CN-111909505-A | Preparation method of reactive flame-retardant sealing material for buildings | 东阳市琰安建筑工程有限公司 | 2020-11-10 | — | — | CN | claimed |
| CN-111848924-A | Synthetic method and application of low-viscosity fluorine-containing hyperbranched polyether type epoxy resin | 江南大学 | 2020-10-30 | — | — | CN | claimed |
| US-7671167-B2 | Poly(arylene ether) copolymer | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2010-03-02 | — | — | US | claimed |
| US-20090247724-A1 | POLY(ARYLENE ETHER) COPOLYMER | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2009-10-01 | — | — | US | claimed |
| EP-1969030-A2 | POLY (ARYLENE ETHER) COPOLYMER | GENERAL ELECTRIC COMPANY (US) | 2008-09-17 | — | — | EP | claimed |
| EP-1966279-A1 | POLYFUNCTIONAL POLY(ARYLENE ETHER) METHOD | General Electric Company (US) | 2008-09-10 | — | — | EP | claimed |
| WO-2007067669-A2 | POLY (ARYLENE ETHER) COPOLYMER | GENERAL ELECTRIC COMPANY (US) | 2007-06-14 | — | — | WO | claimed |
| US-20070135609-A1 | Poly(arylene ether) copolymer | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2007-06-14 | — | — | US | claimed |
| WO-2007058779-A1 | POLYFUNCTIONAL POLY(ARYLENE ETHER) METHOD | GENERAL ELECTRIC COMPANY (US) | 2007-05-24 | — | — | WO | claimed |
| US-20070106051-A1 | Polyfunctional poly(arylene ether) method | CITIBANK, N.A., AS COLLATERAL AGENT | 2007-05-10 | — | — | US | claimed |
| US-6512076-B2 | Condensation polymerization of a pentafluorophenyl sulfide and pentafluorophenyl sulfone monomer with dihydroxy monomer; heat, solvent and water resistance; use to make waveguides | KWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2003-01-28 | — | — | US | claimed |
| US-5075378-A | Coating of an epoxy resin, fluorocarbon polymer fluorinated curing agent | THE STANDARD OIL COMPANY (US) | 1991-12-24 | — | — | US | claimed |
| JP-6032884-A | — | — | None | — | — | JP | disclosed |
| EP-3636692-B1 | POLY(ARYLENE ETHER) COPOLYMER | SHPP GLOBAL TECH BV (NL) | 2026-04-29 | — | — | EP | disclosed |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| US-12503593-B2 | Curable thermosetting composition including poly(arylene ether) copolymer | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2025-12-23 | — | — | US | disclosed |
| WO-2025224626-A1 | THERMOPLASTIC POLYURETHANE AND ASSOCIATED METHOD AND ARTICLE | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2025-10-30 | — | — | WO | disclosed |
| EP-3919545-B1 | CURABLE THERMOSETTING COMPOSITION INCLUDING POLY(ARYLENE ETHER) COPOLYMER | SHPP GLOBAL TECH BV (NL) | 2025-10-22 | — | — | EP | disclosed |
| US-20250109219-A1 | FLUOROELASTOMER CROSSLINKABLE COMPOSITION AND ARTICLE | DAIKIN INDUSTRIES, LTD. (JP) | 2025-04-03 | — | — | US | disclosed |
| EP-4506414-A1 | COMPOSITION FOR FLUORINE RUBBER CROSSLINKING AND MOLDED ARTICLE | DAIKIN INDUSTRIES, LTD. (JP) | 2025-02-12 | — | — | EP | disclosed |
| WO-2025022769-A1 | CYANATE ESTER COMPOUND AND METHOD FOR PRODUCING SAME, RESIN COMPOSITION, AND CURED PRODUCT | 三菱瓦斯化学株式会社 | 2025-01-30 | — | — | WO | disclosed |
| WO-2025022768-A1 | CYANATE ESTER COMPOUND AND METHOD FOR PRODUCING SAME, RESIN COMPOSITION, AND CURED PRODUCT | 三菱瓦斯化学株式会社 | 2025-01-30 | — | — | WO | disclosed |
| CN-119053653-A | Composition for cross-linking fluororubber and molded article | 大金工业株式会社 | 2024-11-29 | — | — | CN | disclosed |
| US-20240376240-A1 | PHENYLENE ETHER OLIGOMER AND CURABLE THERMOSETTING COMPOSITION COMPRISING THE PHENYLENE ETHER OLIGOMER | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2024-11-14 | — | — | US | disclosed |
| WO-2024226888-A1 | FLUORINE-CONTAINING COMPOUNDS FOR USE IN HIGH-FREQUENCY SUBSTRATES | Chemours-Mitsui Fluoroproducts Co., Ltd. (JP) | 2024-10-31 | — | — | WO | disclosed |
| WO-2024226893-A1 | METHOD OF MANUFACTURING FLUORINE-CONTAINING COMPOUND | Chemours-Mitsui Fluoroproducts Co., Ltd. (JP) | 2024-10-31 | — | — | WO | disclosed |
| CN-118420875-B | Preparation method of ink-grade polyurethane | 安庆市索隆新材料有限公司 | 2024-09-24 | — | — | CN | disclosed |
| CN-118619832-A | Resveratrol-based fluorine-containing active ester compound and preparation method and application thereof | 广东工业大学 | 2024-09-10 | — | — | CN | disclosed |
| CN-118598750-A | Fluorine-containing active ester compound and preparation method and application thereof | 广东工业大学 | 2024-09-06 | — | — | CN | disclosed |
| CN-115894402-B | Fluorine-containing liquid crystal epoxy organic micromolecule and preparation method thereof | 哈尔滨理工大学 | 2024-08-06 | — | — | CN | disclosed |
| CN-118420875-A | Preparation method of ink-grade polyurethane | 安庆市索隆新材料有限公司 | 2024-08-02 | — | — | CN | disclosed |
| CN-115044040-B | Polyimide-containing polymer, positive photosensitive resin composition, negative photosensitive resin composition, and pattern forming method | 信越化学工业株式会社 | 2024-07-02 | — | — | CN | disclosed |
| EP-3919544-B1 | POLY(ARYLENE ETHER) COPOLYMER, METHOD TO PREPARE THE SAME, AND ARTICLE DERIVED THEREFROM | SHPP GLOBAL TECH BV (NL) | 2024-02-07 | — | — | EP | disclosed |
| CN-116969877-A | Monomer containing imide structure, fluorinated polyaryletherketone, preparation method and application thereof | 浙江大学衢州研究院 | 2023-10-31 | — | — | CN | disclosed |
| WO-2023195469-A1 | COMPOSITION FOR FLUORINE RUBBER CROSSLINKING AND MOLDED ARTICLE | ダイキン工業株式会社 | 2023-10-12 | — | — | WO | disclosed |
| EP-4056627-B1 | POLYIMIDE-BASED POLYMER, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSTION, PATTERNING METHOD, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHINETSU CHEMICAL CO (JP) | 2023-08-23 | — | — | EP | disclosed |
| US-20230227606-A1 | POLY(ARYLENE ETHER) COPOLYMER, METHOD TO PREPARE THE SAME, AND ARTICLE DERIVED THEREFROM | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2023-07-20 | — | — | US | disclosed |
| US-20230183477-A1 | CURABLE THERMOSETTING COMPOSITION INCLUDING POLY(ARYLENE ETHER) COPOLYMER | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2023-06-15 | — | — | US | disclosed |
| CN-113683868-B | Liquid crystal polymer film for 5G communication flexible copper-clad plate and preparation method thereof | 宁波聚嘉新材料科技有限公司 | 2023-06-13 | — | — | CN | disclosed |
| CN-113683868-B | Liquid crystal polymer film for 5G communication flexible copper-clad plate and preparation method thereof | 宁波聚嘉新材料科技有限公司 | 2023-06-13 | — | — | CN | disclosed |
| CN-115894402-A | Fluorine-containing liquid crystal epoxy organic micromolecule and preparation method thereof | 哈尔滨理工大学 | 2023-04-04 | — | — | CN | disclosed |
| US-20230069911-A1 | POLY(ARYLENE ETHER) COPOLYMER | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2023-03-09 | — | — | US | disclosed |
| CN-113651739-B | Oligo-ethylene glycol fluorinated aromatic ring organic small molecule and preparation method and application thereof | 山东师范大学 | 2023-01-03 | — | — | CN | disclosed |
| US-11505699-B2 | Poly(arylene ether) copolymer | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2022-11-22 | — | — | US | disclosed |
| EP-4079784-A1 | PHENYLENE ETHER OLIGOMER AND CURABLE THERMOSETTING COMPOSITION COMPRISING THE PHENYLENE ETHER OLIGOMER | SHPP Global Technologies B.V. (NL) | 2022-10-26 | — | — | EP | disclosed |
| US-20220289911-A1 | POLYIMIDE-BASED POLYMER, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-09-15 | — | — | US | disclosed |
| EP-4056627-A1 | POLYIMIDE-BASED POLYMER, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSTION, PATTERNING METHOD, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2022-09-14 | — | — | EP | disclosed |
| CN-115044040-A | Polyimide-containing polymer, positive photosensitive resin composition, negative photosensitive resin composition, and pattern formation method | 信越化学工业株式会社 | 2022-09-13 | — | — | CN | disclosed |
| EP-3919544-A1 | POLY(ARYLENE ETHER) COPOLYMER, METHOD TO PREPARE THE SAME, AND ARTICLE DERIVED THEREFROM | SHPP Global Technologies B.V. (NL) | 2021-12-08 | — | — | EP | disclosed |
| EP-3919545-A1 | CURABLE THERMOSETTING COMPOSITION INCLUDING POLY(ARYLENE ETHER) COPOLYMER | SHPP Global Technologies B.V. (NL) | 2021-12-08 | — | — | EP | disclosed |
| CN-113683748-A | Fluorine-modified hyperbranched waterborne polyurethane resin and waterborne nano anti-corrosion self-cleaning finish paint using same | 江苏苏博特新材料股份有限公司 | 2021-11-23 | — | — | CN | disclosed |
| CN-113683868-A | Liquid crystal polymer film for 5G communication flexible copper clad laminate and preparation method thereof | 宁波聚嘉新材料科技有限公司 | 2021-11-23 | — | — | CN | disclosed |
| CN-113683868-A | Liquid crystal polymer film for 5G communication flexible copper clad laminate and preparation method thereof | 宁波聚嘉新材料科技有限公司 | 2021-11-23 | — | — | CN | disclosed |
| CN-113651739-A | Oligo-ethylene glycol fluorinated aromatic ring organic small molecule and preparation method and application thereof | 山东师范大学 | 2021-11-16 | — | — | CN | disclosed |
| US-20210171883-A1 | ANTIVIRAL WIPER | FUJIFILM CORPORATION (JP) | 2021-06-10 | — | — | US | disclosed |
| US-10995215-B2 | Fluoromonomer and fluorooligomer compounds, photopolymerizable composition, and hydrophobic film using the same | EWHA University—Industry Collaboration Foundation (KR) | 2021-05-04 | — | — | US | disclosed |
| CN-109517316-B | Fluorine-containing active ester, preparation method thereof and resin cured product containing fluorine-containing active ester | 广东莱尔新材料科技股份有限公司 | 2021-05-04 | — | — | CN | disclosed |
| US-10995215-B2 | Fluoromonomer and fluorooligomer compounds, photopolymerizable composition, and hydrophobic film using the same | EWHA University—Industry Collaboration Foundation (KR) | 2021-05-04 | — | — | US | disclosed |
| US-20210079293-A1 | METHODS OF PRODUCING COATED PROPPANTS | SAUDI ARABIAN OIL COMPANY (SA) | 2021-03-18 | — | — | US | disclosed |
| US-10947338-B2 | Block polymer and polymer electrolyte membrane comprising same | LG CHEM, LTD. (KR) | 2021-03-16 | — | — | US | disclosed |
| CN-111909505-A | Preparation method of reactive flame-retardant sealing material for buildings | 东阳市琰安建筑工程有限公司 | 2020-11-10 | — | — | CN | disclosed |
| CN-111848924-A | Synthetic method and application of low-viscosity fluorine-containing hyperbranched polyether type epoxy resin | 江南大学 | 2020-10-30 | — | — | CN | disclosed |
| EP-3636692-A1 | POLY(ARYLENE ETHER) COPOLYMER | SABIC Global Technologies B.V. (NL) | 2020-04-15 | — | — | EP | disclosed |
| US-20200109281-A1 | POLY(ARYLENE ETHER) COPOLYMER | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2020-04-09 | — | — | US | disclosed |
| WO-2020013009-A1 | FLUORINE-CONTAINING POLYMER, FILM, AND MEDICAL INSTRUMENT | ＡＧＣ株式会社 | 2020-01-16 | — | — | WO | disclosed |
| EP-3013884-B1 | THERMOPLASTIC POLYURETHANE AND ASSOCIATED METHOD AND ARTICLE | SABIC GLOBAL TECHNOLOGIES BV (NL) | 2019-09-18 | — | — | EP | disclosed |
| US-10361447-B2 | Polymer and polymer electrolyte membrane comprising same | LG CHEM, LTD. (KR) | 2019-07-23 | — | — | US | disclosed |
| US-20190106530-A1 | BLOCK POLYMER AND POLYMER ELECTROLYTE MEMBRANE COMPRISING SAME | LG CHEM, LTD. (KR) | 2019-04-11 | — | — | US | disclosed |
| EP-2913302-B1 | CYANOGEN-HALIDE PRODUCTION METHOD, CYANATE ESTER COMPOUND AND PRODUCTION METHOD THEREFOR, AND RESIN COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-04-10 | — | — | EP | disclosed |
| US-20190016887-A1 | FLUOROMONOMER AND FLUOROOLIGOMER COMPOUNDS, PHOTOPOLYMERIZABLE COMPOSITION, AND HYDROPHOBIC FILM USING THE SAME | EWHA UNIVERSITY - INDUSTRY COLLABORATON FOUNDATON (KR) | 2019-01-17 | — | — | US | disclosed |
| US-20190016887-A1 | FLUOROMONOMER AND FLUOROOLIGOMER COMPOUNDS, PHOTOPOLYMERIZABLE COMPOSITION, AND HYDROPHOBIC FILM USING THE SAME | EWHA UNIVERSITY - INDUSTRY COLLABORATON FOUNDATON (KR) | 2019-01-17 | — | — | US | disclosed |
| EP-2977794-B1 | OPTICAL MEMBER, OPTICAL SYSTEM USING THE OPTICAL MEMBER, AND METHOD OF MANUFACTURING AN OPTICAL MEMBER | CANON KK (JP) | 2018-10-31 | — | — | EP | disclosed |
| EP-3027667-B1 | RIGID FOAM AND ASSOCIATED ARTICLE | SABIC GLOBAL TECHNOLOGIES BV (NL) | 2018-03-21 | — | — | EP | disclosed |
| EP-2516501-B1 | METHODS FOR THE PREPARATION OF A POLY(ARYLENE ETHER) POLYSILOXANE MULTIBLOCK COPOLYMER | SABIC GLOBAL TECHNOLOGIES BV (NL) | 2017-11-15 | — | — | EP | disclosed |
| US-20170317370-A1 | POLYMER AND POLYMER ELECTROLYTE MEMBRANE COMPRISING SAME | LG CHEM, LTD. (KR) | 2017-11-02 | — | — | US | disclosed |
| US-20170317370-A1 | POLYMER AND POLYMER ELECTROLYTE MEMBRANE COMPRISING SAME | LG CHEM, LTD. (KR) | 2017-11-02 | — | — | US | disclosed |
| EP-1969030-B1 | POLY (ARYLENE ETHER) COPOLYMER | SABIC GLOBAL TECHNOLOGIES BV (NL) | 2017-01-25 | — | — | EP | disclosed |
| US-9475761-B2 | Method for producing cyanogen-halide, cyanate ester compound and method for producing the same, and resin composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2016-10-25 | — | — | US | disclosed |
| US-9422394-B2 | Thermoplastic polyurethane and associated method and article | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2016-08-23 | — | — | US | disclosed |
| EP-3039076-A1 | COMPOSITION AND ARTICLE COMPRISING THERMOPLASTIC POLYURETHANE AND PARTICULATE ENGINEERING POLYMER | SABIC Global Technologies B.V. (NL) | 2016-07-06 | — | — | EP | disclosed |
| US-20160168418-A1 | HEAT-CURABLE COMPOSITION | JNC CORPORATION (JP) | 2016-06-16 | — | — | US | disclosed |
| EP-3030615-A1 | POLY(PHENYLENE ETHER) /EPOXY HOMOGENEOUS SOLID AND POWDER COATING COMPOSITION INCORPORATING SAME | SABIC Global Technologies B.V. (NL) | 2016-06-15 | — | — | EP | disclosed |
| EP-3027667-A1 | RIGID FOAM AND ASSOCIATED ARTICLE | SABIC Global Technologies B.V. (NL) | 2016-06-08 | — | — | EP | disclosed |
| EP-3013884-A1 | THERMOPLASTIC POLYURETHANE AND ASSOCIATED METHOD AND ARTICLE | SABIC Global Technologies B.V. (NL) | 2016-05-04 | — | — | EP | disclosed |
| US-9296916-B2 | Poly(phenylene ether)/epoxy homogeneous solid and powder coating composition incorporating same | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2016-03-29 | — | — | US | disclosed |
| EP-2977794-A1 | OPTICAL MEMBER, OPTICAL SYSTEM USING THE OPTICAL MEMBER, AND METHOD OF MANUFACTURING AN OPTICAL MEMBER | Canon Kabushiki Kaisha (JP) | 2016-01-27 | — | — | EP | disclosed |
| US-9169368-B2 | Rigid foam and associated article | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2015-10-27 | — | — | US | disclosed |
| US-20150299110-A1 | METHOD FOR PRODUCING CYANOGEN-HALIDE, CYANATE ESTER COMPOUND AND METHOD FOR PRODUCING THE SAME, AND RESIN COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-10-22 | — | — | US | disclosed |
| US-20150303397-A1 | INORGANIC BARRIER LAYERS | MERCK PATENT GMBH (DE) | 2015-10-22 | — | — | US | disclosed |
| US-20150303397-A1 | INORGANIC BARRIER LAYERS | MERCK PATENT GMBH (DE) | 2015-10-22 | — | — | US | disclosed |
| EP-2113797-B1 | OPTICAL MEMBER, OPTICAL SYSTEM USING THE SAME, AND METHOD FOR PRODUCING OPTICAL MEMBER | CANON KK (JP) | 2015-09-30 | — | — | EP | disclosed |
| EP-2913302-A1 | CYANOGEN-HALIDE PRODUCTION METHOD, CYANATE ESTER COMPOUND AND PRODUCTION METHOD THEREFOR, AND RESIN COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2015-09-02 | — | — | EP | disclosed |
| WO-2015115589-A1 | HALOGEN ATOM-SUBSTITUTED POLYMERIZABLE COMPOUND | 日産化学工業株式会社 | 2015-08-06 | — | — | WO | disclosed |
| US-20150064382-A1 | COMPOSITION AND ARTICLE COMPRISING THERMOPLASTIC POLYURETHANE AND PARTICULATE ENGINEERING POLYMER | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2015-03-05 | — | — | US | disclosed |
| WO-2015031292-A1 | COMPOSITION AND ARTICLE COMPRISING THERMOPLASTIC POLYURETHANE AND PARTICULATE ENGINEERING POLYMER | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2015-03-05 | — | — | WO | disclosed |
| US-20150045477-A1 | POLY(PHENYLENE ETHER)/EPOXY HOMOGENEOUS SOLID AND POWDER COATING COMPOSITION INCORPORATING SAME | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2015-02-12 | — | — | US | disclosed |
| WO-2015021090-A1 | POLY(PHENYLENE ETHER) /EPOXY HOMOGENEOUS SOLID AND POWDER COATING COMPOSITION INCORPORATING SAME | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2015-02-12 | — | — | WO | disclosed |
| WO-2015017368-A1 | RIGID FOAM AND ASSOCIATED ARTICLE | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2015-02-05 | — | — | WO | disclosed |
| US-20150038610-A1 | RIGID FOAM AND ASSOCIATED ARTICLE | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2015-02-05 | — | — | US | disclosed |
| US-20150004341-A1 | THERMOPLASTIC POLYURETHANE AND ASSOCIATED METHOD AND ARTICLE | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2015-01-01 | — | — | US | disclosed |
| WO-2014209934-A1 | THERMOPLASTIC POLYURETHANE AND ASSOCIATED METHOD AND ARTICLE | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2014-12-31 | — | — | WO | disclosed |
| EP-1785413-B1 | ARYLSULFONIC ACID COMPOUND AND USE THEREOF AS ELECTRON-ACCEPTOR MATERIAL | NISSAN CHEMICAL IND LTD (JP) | 2014-01-22 | — | — | EP | disclosed |
| US-8541049-B2 | Optical member, optical system using the optical member, and method of manufacturing an optical member | CANON KABUSHIKI KAISHA (JP) | 2013-09-24 | — | — | US | disclosed |
| US-8309655-B2 | Methods for the preparation of a poly(arylene ether) polysiloxane multiblock copolymer, multiblock copolymers produced thereby, and associated compositions and articles | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2012-11-13 | — | — | US | disclosed |
| EP-2516501-A1 | METHODS FOR THE PREPARATION OF A POLY(ARYLENE ETHER) POLYSILOXANE MULTIBLOCK COPOLYMER | SABIC Innovative Plastics IP B.V. (NL) | 2012-10-31 | — | — | EP | disclosed |
| US-8236923-B2 | Fluorine-containing polymer and method of producing fluorine-containing polymer | FUJIFILM CORPORATION (JP) | 2012-08-07 | — | — | US | disclosed |
| US-8236923-B2 | Fluorine-containing polymer and method of producing fluorine-containing polymer | FUJIFILM CORPORATION (JP) | 2012-08-07 | — | — | US | disclosed |
| EP-1640372-B1 | 1,4-BENZODIOXANE SULFONIC ACID COMPOUND AND USE THEREOF AS ELECTRON-ACCEPTOR MATERIAL | NISSAN CHEMICAL IND LTD (JP) | 2012-08-01 | — | — | EP | disclosed |
| US-20120171370-A1 | OPTICAL MEMBER, OPTICAL SYSTEM USING THE OPTICAL MEMBER, AND METHOD OF MANUFACTURING AN OPTICAL MEMBER | CANON KABUSHIKI KAISHA (JP) | 2012-07-05 | — | — | US | disclosed |
| US-8163333-B2 | Optical member, optical system using the optical member, and method of manufacturing an optical member | CANON KABUSHIKI KAISHA (JP) | 2012-04-24 | — | — | US | disclosed |
| US-8084082-B2 | one layer (a) formed of crystal containing hydrate of oxide or hydroxide of aluminum as main component and at least one layer containing an organic resin as a main component formed between substrate and layer (a), wherein organic resin includes an aromatic ring and/or imide ring in main chain; stability | CANON KABUSHIKI KAISHA (JP) | 2011-12-27 | — | — | US | disclosed |
| US-8034437-B2 | Optical member, optical system using the optical member, and method of manufacturing an optical member | CANON KABUSHIKI KAISHA (JP) | 2011-10-11 | — | — | US | disclosed |
| WO-2011077297-A1 | METHODS FOR THE PREPARATION OF A POLY(ARYLENE ETHER) POLYSILOXANE MULTIBLOCK COPOLYMER | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2011-06-30 | — | — | WO | disclosed |
| US-20110152471-A1 | METHODS FOR THE PREPARATION OF A POLY(ARYLENE ETHER) POLYSILOXANE MULTIBLOCK COPOLYMER, MULTIBLOCK COPOLYMERS PRODUCED THEREBY, AND ASSOCIATED COMPOSITIONS AND ARTICLES | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2011-06-23 | — | — | US | disclosed |
| US-7923116-B2 | Optic-purpose precursor composition, optic-purpose resin, optical element, and optical article | NIKON CORPORATION (JP) | 2011-04-12 | — | — | US | disclosed |
| US-7923116-B2 | Optic-purpose precursor composition, optic-purpose resin, optical element, and optical article | NIKON CORPORATION (JP) | 2011-04-12 | — | — | US | disclosed |
| US-7862747-B2 | Arylsulfonic acid compound and use thereof as electron-acceptor material | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-01-04 | — | — | US | disclosed |
| US-20100279090-A1 | OPTICAL MEMBER, OPTICAL SYSTEM USING THE OPTICAL MEMBER, AND METHOD OF MANUFACTURING AN OPTICAL MEMBER | CANON KABUSHIKI KAISHA (JP) | 2010-11-04 | — | — | US | disclosed |
| US-7771842-B2 | 1,4-benzodioxane sulfonic acid compound and use thereof as electron-acceptor material | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-08-10 | — | — | US | disclosed |
| US-7771842-B2 | 1,4-benzodioxane sulfonic acid compound and use thereof as electron-acceptor material | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-08-10 | — | — | US | disclosed |
| US-7771842-B2 | 1,4-benzodioxane sulfonic acid compound and use thereof as electron-acceptor material | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-08-10 | — | — | US | disclosed |
| US-7771832-B2 | Optical member, optical system using the optical member, and method of manufacturing an optical member | CANON KABUSHIKI KAISHA (JP) | 2010-08-10 | — | — | US | disclosed |
| US-7700714-B2 | Optical element and achromatic lens | TEIJIN CHEMICALS, LTD. (JP) | 2010-04-20 | — | — | US | disclosed |
| US-20100060986-A1 | Optic-purpose precursor composition, optic-purpose resin, optical element, and optical article | NIKON CORPORATION (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20100060986-A1 | Optic-purpose precursor composition, optic-purpose resin, optical element, and optical article | NIKON CORPORATION (JP) | 2010-03-11 | — | — | US | disclosed |
| US-7671167-B2 | Poly(arylene ether) copolymer | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2010-03-02 | — | — | US | disclosed |
| US-20090318650-A1 | NOVEL FLUORINE-CONTAINING POLYMER AND METHOD OF PRODUCING FLUORINE-CONTAINING POLYMER | FUJIFILM CORPORATION (JP) | 2009-12-24 | — | — | US | disclosed |
| US-20090318650-A1 | NOVEL FLUORINE-CONTAINING POLYMER AND METHOD OF PRODUCING FLUORINE-CONTAINING POLYMER | FUJIFILM CORPORATION (JP) | 2009-12-24 | — | — | US | disclosed |
| US-20090304929-A1 | OPTICAL MEMBER, OPTICAL SYSTEM USING THE OPTICAL MEMBER, AND METHOD OF MANUFACTURING AN OPTICAL MEMBER | CANON KABUSHIKI KAISHA (JP) | 2009-12-10 | — | — | US | disclosed |
| US-20090305014-A1 | OPTICAL MEMBER, OPTICAL SYSTEM USING THE OPTICAL MEMBER, AND METHOD OF MANUFACTURING AN OPTICAL MEMBER | CANON KABUSHIKI KAISHA (JP) | 2009-12-10 | — | — | US | disclosed |
| EP-2113797-A1 | OPTICAL MEMBER, OPTICAL SYSTEM USING THE SAME, AND METHOD FOR PRODUCING OPTICAL MEMBER | Canon Kabushiki Kaisha (JP) | 2009-11-04 | — | — | EP | disclosed |
| US-20090247724-A1 | POLY(ARYLENE ETHER) COPOLYMER | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2009-10-01 | — | — | US | disclosed |
| US-7553544-B2 | Precursor composition for optical resin, resin for optical use, optical element, and optical article | NIKON CORPORATION (JP) | 2009-06-30 | — | — | US | disclosed |
| US-7553544-B2 | Precursor composition for optical resin, resin for optical use, optical element, and optical article | NIKON CORPORATION (JP) | 2009-06-30 | — | — | US | disclosed |
| US-20090143560-A1 | Optical Element and Achromatic Lens | TEIJIN CHEMICALS, LTD. | 2009-06-04 | — | — | US | disclosed |
| EP-1669391-B1 | BLOCK COPOLYMERS AND USE THEREOF | SUMITOMO CHEMICAL CO (JP) | 2009-06-03 | — | — | EP | disclosed |
| US-7541421-B2 | Poly(arylene ether) copolymer | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2009-06-02 | — | — | US | disclosed |
| US-20080310026-A1 | OPTICAL MEMBER, OPTICAL SYSTEM USING THE OPTICAL MEMBER, AND METHOD OF MANUFACTURING AN OPTICAL MEMBER | CANON KABUSHIKI KAISHA (JP) | 2008-12-18 | — | — | US | disclosed |
| EP-1969030-A2 | POLY (ARYLENE ETHER) COPOLYMER | GENERAL ELECTRIC COMPANY (US) | 2008-09-17 | — | — | EP | disclosed |
| US-7425404-B2 | Chemical amplification resist composition and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2008-09-16 | — | — | US | disclosed |
| US-7425404-B2 | Chemical amplification resist composition and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2008-09-16 | — | — | US | disclosed |
| EP-1966279-A1 | POLYFUNCTIONAL POLY(ARYLENE ETHER) METHOD | General Electric Company (US) | 2008-09-10 | — | — | EP | disclosed |
| EP-1521782-B1 | PREPARATION OF CATALYST SYSTEMS | BASELL POLYOLEFINE GMBH (DE) | 2008-08-06 | — | — | EP | disclosed |
| EP-1947131-A1 | OPTICAL DEVICE AND ACHROMATIC LENS | Teijin Chemicals, Ltd. (JP) | 2008-07-23 | — | — | EP | disclosed |
| US-20080029742-A1 | Arylsulfonic Acid Compound And Use Thereof As Electron -Acceptor Material | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-02-07 | — | — | US | disclosed |
| US-20070299164-A1 | Heatcurable dielectric resin composition and heatcurable dielectric resin film | NIPPON PAINT CO., LTD. (JP) | 2007-12-27 | — | — | US | disclosed |
| EP-1188807-B1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORP (JP) | 2007-10-17 | — | — | EP | disclosed |
| WO-2007067669-A2 | POLY (ARYLENE ETHER) COPOLYMER | GENERAL ELECTRIC COMPANY (US) | 2007-06-14 | — | — | WO | disclosed |
| US-20070135609-A1 | Poly(arylene ether) copolymer | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2007-06-14 | — | — | US | disclosed |
| WO-2007058779-A1 | POLYFUNCTIONAL POLY(ARYLENE ETHER) METHOD | GENERAL ELECTRIC COMPANY (US) | 2007-05-24 | — | — | WO | disclosed |
| EP-1785413-A1 | ARYLSULFONIC ACID COMPOUND AND USE THEREOF AS ELECTRON-ACCEPTOR MATERIAL | Nissan Chemical Industries, Ltd. (JP) | 2007-05-16 | — | — | EP | disclosed |
| US-20070105030-A1 | 1, 4-Benzodioxane sulfonic acid compound and use thereof as electron-acceptor material | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-05-10 | — | — | US | disclosed |
| US-20070105030-A1 | 1, 4-Benzodioxane sulfonic acid compound and use thereof as electron-acceptor material | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-05-10 | — | — | US | disclosed |
| US-20070105030-A1 | 1, 4-Benzodioxane sulfonic acid compound and use thereof as electron-acceptor material | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-05-10 | — | — | US | disclosed |
| US-20070106051-A1 | Polyfunctional poly(arylene ether) method | CITIBANK, N.A., AS COLLATERAL AGENT | 2007-05-10 | — | — | US | disclosed |
| US-7166337-B2 | Liquid-crystal composition, methods of adjusting the resistance, and substituted phenols | MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) | 2007-01-23 | — | — | US | disclosed |
| US-7166337-B2 | Liquid-crystal composition, methods of adjusting the resistance, and substituted phenols | MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) | 2007-01-23 | — | — | US | disclosed |
| EP-1298176-B1 | Stacked film insulating film and substrate for semiconductor | JSR CORP (JP) | 2007-01-03 | — | — | EP | disclosed |
| US-7153767-B2 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2006-12-26 | — | — | US | disclosed |
| EP-1688965-A2 | Heatcurable dielectric resin composition and heatcurable dielectric resin film | Nippon Paint Co., Ltd. (JP) | 2006-08-09 | — | — | EP | disclosed |
| US-7034173-B2 | Chemical products suited for use as co-catalysts, method for the preparation thereof and their use in catalyst systems for producing polyolefins | BASELL POLYOLEFINE GMBH (DE) | 2006-04-25 | — | — | US | disclosed |
| EP-1640372-A1 | 1,4-BENZODIOXANE SULFONIC ACID COMPOUND AND USE THEREOF AS ELECTRON-ACCEPTOR MATERIAL | Nissan Chemical Industries, Ltd. (JP) | 2006-03-29 | — | — | EP | disclosed |
| US-6852370-B2 | Composition for film formation and material for insulating film formation | JSR CORPORATION (JP) | 2005-02-08 | — | — | US | disclosed |
| EP-1009729-B1 | HALOGENATED ACRYLATES AND POLYMERS DERIVED THEREFROM | MINNESOTA MINING & MFG (US) | 2005-01-19 | — | — | EP | disclosed |
| US-20050003218-A1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2005-01-06 | — | — | US | disclosed |
| US-20040260039-A1 | Process for producing organic compound epoxy resin composition, cured article obtained from the epoxy resin, and semiconductor device obtained with epoxy resin | MITSUI CHEMICALS, INC. (JP) | 2004-12-23 | — | — | US | disclosed |
| US-6824833-B2 | STACKED DIELECTRIC | JSR CORPORATION (JP) | 2004-11-30 | — | — | US | disclosed |
| US-20030144434-A1 | Chemical products suited for use as co-catalysts, method for the preparation thereof and their use in catalyst systems for producing polyolefins | EQUISTAR CHEMICALS, LP | 2003-07-31 | — | — | US | disclosed |
| US-20030077461-A1 | Stacked film, insulating film and substrate for semiconductor | JSR CORPORATION (JP) | 2003-04-24 | — | — | US | disclosed |
| EP-0972776-B1 | A phosphine sulfide, a manufacturing process therefor and a use thereof | MITSUI CHEMICALS INC (JP) | 2003-04-23 | — | — | EP | disclosed |
| EP-1298176-A2 | Stacked film insulating film and substrate for semiconductor | JSR Corporation (JP) | 2003-04-02 | — | — | EP | disclosed |
| EP-0950649-B1 | A process for preparing oxyalkylene derivatives in the presence of phosphine oxides | MITSUI CHEMICALS INC (JP) | 2003-03-26 | — | — | EP | disclosed |
| US-20020172652-A1 | Composition for film formation and material for insulating film formation | JSR CORPORATION (JP) | 2002-11-21 | — | — | US | disclosed |
| EP-1245638-A1 | Composition for insulating film formation | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |
| US-20020064953-A1 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR CORPORATION (JP) | 2002-05-30 | — | — | US | disclosed |
| US-6362379-B2 | ACRYLATES HAVING HIGH DEGREE OF HALOGENATION AND POLYMERS USING THESE MONOMERS; USEFUL FOR OPTICAL WAVEGUIDES AND TELECOMMUNICATION | 3M INNOVATIVE PROPERTIES COMPANY | 2002-03-26 | — | — | US | disclosed |
| EP-1188807-A2 | Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing | JSR Corporation (JP) | 2002-03-20 | — | — | EP | disclosed |
| US-6313245-B1 | USED IN OPTICAL DEVICES INCLUDING OPTICAL WAVEGUIDES AND INTERCONNECTING DEVICES | 3M INNOVATIVE PROPERTIES COMPANY | 2001-11-06 | — | — | US | disclosed |
| US-20010037028-A1 | Halogenated acrylates and polymers derived therefrom | 3M INNOVATIVE PROPERTIES COMPANY | 2001-11-01 | — | — | US | disclosed |
| US-6288266-B1 | HALOGENATED ACRYLATES OR THIOACRYLATES FOR POLYMERS | 3M INNOVATIVE PROPERTIES COMPANY | 2001-09-11 | — | — | US | disclosed |
| US-6153794-A | Phosphine sulfide, a manufacturing process therefor and use thereof | MITSUI CHEMICALS, INC. (JP) | 2000-11-28 | — | — | US | disclosed |
| US-6130346-A | ESTERIFICATION, CARBONATION, SULFONATION, ETHERIFICATION | MITSUI CHEMICALS, INC. (JP) | 2000-10-10 | — | — | US | disclosed |
| EP-1009729-A1 | HALOGENATED ACRYLATES AND POLYMERS DERIVED THEREFROM | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 2000-06-21 | — | — | EP | disclosed |
| EP-0972776-A1 | A phosphine sulfide, a manufacturing process therefor and a use thereof | Mitsui Chemicals, Inc. (JP) | 2000-01-19 | — | — | EP | disclosed |
| US-6005137-A | POLYMERS USED IN OPTICAL DEVICES INCLUDING OPTICAL WAVEGUIDES AND INTERCONNECTING DEVICES | 3M INNOVATIVE PROPERTIES COMPANY (US) | 1999-12-21 | — | — | US | disclosed |
| EP-0950649-A1 | A process for preparing oxyalkylene derivatives in the presence of phosphine oxides | Mitsui Chemicals, Inc. (JP) | 1999-10-20 | — | — | EP | disclosed |
| WO-1998056749-A1 | HALOGENATED ACRYLATES AND POLYMERS DERIVED THEREFROM | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1998-12-17 | — | — | WO | disclosed |
| EP-0824096-A2 | Process for the preparation of halogenated (meth)acrylic esters and poly (meth) arcylates obtained with said (meth)acrylic esters | Akzo Nobel N.V. (NL) | 1998-02-18 | — | — | EP | disclosed |
| JP-H0632884-A | POLYCARBONATE POLYMER, ITS PRODUCTION AND ELECTROPHOTOGRAPHIC SENSITIZED MATERIAL USING THE SAME | IDEMITSU KOSAN CO LTD | 1994-02-08 | — | — | JP | disclosed |
| EP-0364548-B1 | OCTAFLUOROBIPHENYLS | MERCK PATENT GmbH (DE) | 1993-06-09 | — | — | EP | disclosed |
| US-5075378-A | Coating of an epoxy resin, fluorocarbon polymer fluorinated curing agent | THE STANDARD OIL COMPANY (US) | 1991-12-24 | — | — | US | disclosed |
| EP-0230112-B1 | FLUOR-CONTAINING EPOXY FLUOROCARBON COATING COMPOSITION AND PROCESS FOR MAKING THE SAME | THE STANDARD OIL COMPANY (US) | 1990-05-02 | — | — | EP | disclosed |
| EP-0230112-A2 | Fluor-containing epoxy fluorocarbon coating composition and process for making the same | THE STANDARD OIL COMPANY (US) | 1987-07-29 | — | — | EP | disclosed |
| US-4096341-A | MONOMERS FOR POLYESTERS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1978-06-20 | — | — | US | disclosed |
| US-4085091-A | Thermally stable, rigid polyesters from thermally stable, rigid dibasic acids and aromatic dihydroxy compounds | E. I. DUPONT DE NEMOURS AND COMPANY (US) | 1978-04-18 | — | — | US | disclosed |
| US-4085091-A | Thermally stable, rigid polyesters from thermally stable, rigid dibasic acids and aromatic dihydroxy compounds | E. I. DUPONT DE NEMOURS AND COMPANY (US) | 1978-04-18 | — | — | US | disclosed |