SCHEMBL2027581

SCHEMBL2027581

C1CCC[Si]2(CC1)CCCCC2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2028741 1.00
SCHEMBL2027651 1.00
SCHEMBL2028152 1.00
SCHEMBL2029183 1.00
SCHEMBL2028205 0.95
SCHEMBL2024518 0.95
SCHEMBL2028196 0.94
SCHEMBL2024280 0.89
SCHEMBL725155 0.89
SCHEMBL2023518 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110159212-A1 INSULATING FILM MATERIAL, METHOD FOR FORMING FILM BY USING THE INSULATING FILM MATERIAL, AND INSULATING FILM NATIONAL INSTITUTE FOR MATERIALS SCIENCE (JP) 2011-06-30 US disclosed
US-7580111-B2 Liquid for immersion exposure and immersion exposure method JSR CORPORATION (JP) 2009-08-25 US disclosed
US-20070164261-A1 Liquid for immersion exposure and immersion exposure method JSR CORPORATION (JP) 2007-07-19 US disclosed