Iodide

Iodide

SCHEMBL2044923

I.I.I.I.I.[Mo]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG

The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Iodide SCHEMBL673763 1.00
Iodide SCHEMBL11430821 1.00
Iodide SCHEMBL619552 1.00
Iodide SCHEMBL11406982 1.00
Iodide SCHEMBL14059946 0.82
Iodide SCHEMBL8327601 0.82
SCHEMBL25396888 0.71
SCHEMBL8989569 0.71
SCHEMBL10627283 0.71
Iodide SCHEMBL2757576 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118675982-A Deposition of metal borides and metal silicides ASM IP控股有限公司 2024-09-20 CN claimed
US-10865475-B2 Deposition of metal borides and silicides ASM IP HOLDING B.V. (NL) 2020-12-15 US claimed
US-20170306479-A1 DEPOSITION OF METAL BORIDES AND SILICIDES ASM IP HOLDING B.V. (NL) 2017-10-26 US claimed
US-6835671-B2 Method of making an integrated circuit using an EUV mask formed by atomic layer deposition FREESCALE SEMICONDUCTOR, INC. 2004-12-28 US claimed
US-20040033699-A1 Method of making an integrated circuit using an EUV mask formed by atomic layer deposition NXP, B.V. F/K/A FREESCALE SEMICONDUCTOR, INC. (NL) 2004-02-19 US claimed
US-20250266265-A1 METHODS AND SYSTEMS FOR ETCHING ASM IP HOLDING B.V. (NL) 2025-08-21 US disclosed
CN-118675982-A Deposition of metal borides and metal silicides ASM IP控股有限公司 2024-09-20 CN disclosed
US-10865475-B2 Deposition of metal borides and silicides ASM IP HOLDING B.V. (NL) 2020-12-15 US disclosed
US-20170306479-A1 DEPOSITION OF METAL BORIDES AND SILICIDES ASM IP HOLDING B.V. (NL) 2017-10-26 US disclosed
EP-2057205-B1 PRODUCTION OF META-BLOCK COPOLYMERS BY POLYMER SEGMENT INTERCHANGE DOW GLOBAL TECHNOLOGIES LLC (US) 2017-02-08 EP disclosed
EP-2061827-B1 PRODUCTION OF BLOCKCOPOLYMERS BY AMORPHOUS POLYMER SEGMENT INTERCHANGE VIA METATHESIS DOW GLOBAL TECHNOLOGIES LLC (US) 2016-03-02 EP disclosed
US-8557921-B2 Production of meta-block copolymers by polymer segment interchange DOW GLOBAL TECHNOLOGIES LLC 2013-10-15 US disclosed
US-4136247-A POLYALKENAMERS, IMPACT STRENGTH, HEAT RESISTANCE THE B. F. GOODRICH COMPANY (US) 1979-01-23 US disclosed
US-4136248-A POLYALKENAMERS, GLASS TRANSITION TEMPERATURE THE B. F. GOODRICH COMPANY (US) 1979-01-23 US disclosed
US-4136249-A POLYALKENAMERS, OXIDATION RESISTANCE, PROCESSABILITY THE B. F. GOODRICH COMPANY (US) 1979-01-23 US disclosed
US-4073820-A TUNGSTEN COMPOUND-ALKYLALUMINUM HALIDE-AMINE CATALYST THE GOODYEAR TIRE & RUBBER COMPANY (US) 1978-02-14 US disclosed
US-4049616-A Preparation of graft, block and crosslinked unsaturated polymers and copolymers by olefin metathesis THE GOODYEAR TIRE & RUBBER COMPANY (US) 1977-09-20 US disclosed
US-4010224-A Preparation of graft, block and crosslinked unsaturated polymers and copolymers by olefin metathesis THE GOODYEAR TIRE & RUBBER COMPANY (US) 1977-03-01 US disclosed
US-3935270-A Process for the preparation of cyclohexadecenones and derivatives THE GOODYEAR TIRE & RUBBER COMPANY (US) 1976-01-27 US disclosed
US-3932373-A Polymeric materials derived from ring-opening polymerization of 1,5-cyclooctadiene THE GOODYEAR TIRE & RUBBER COMPANY (US) 1976-01-13 US disclosed