⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16894668 | 0.76 | — | — | |
| SCHEMBL4389113 | 0.72 | — | — | |
| SCHEMBL11022133 | 0.72 | — | — | |
| SCHEMBL334063 | 0.69 | — | — | |
| SCHEMBL6260926 | 0.69 | — | — | |
| SCHEMBL333233 | 0.69 | — | — | |
| SCHEMBL12497856 | 0.64 | — | — | |
| SCHEMBL959080 | 0.62 | — | — | |
| SCHEMBL51798 | 0.62 | — | — | |
| SCHEMBL787775 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8337959-B2 | Mold is disposed in an evacuable chamber, cleaned to remove surface organic contamination and coated with the surface release layer in a chamber, all without relocation or undesired time delay; imprint lithography | NANONEX CORPORATION (US) | 2012-12-25 | — | — | US | claimed |
| US-20150259539-A1 | SUPERHYDROPHOBIC AND LIPOPHOBIC SURFACES AND METHODS FOR THEIR MANUFACTURE | CRESTLINE DIRECT FINANCE, L.P. | 2015-09-17 | — | — | US | disclosed |
| US-8728380-B2 | Lithographic method for forming a pattern | REGENTS OF THE UNIVERSITY OF MINNESOTA (US) | 2014-05-20 | — | — | US | disclosed |
| US-8337959-B2 | Mold is disposed in an evacuable chamber, cleaned to remove surface organic contamination and coated with the surface release layer in a chamber, all without relocation or undesired time delay; imprint lithography | NANONEX CORPORATION (US) | 2012-12-25 | — | — | US | disclosed |
| US-20110155060-A1 | Method And Apparatus To Apply Surface Release Coating For Imprint Mold | NANONEX CORPORATION | 2011-06-30 | — | — | US | disclosed |
| US-20100233309-A1 | RELEASE SURFACES, PARTICULARLY FOR USE IN NANOIMPRINT LITHOGRAPHY | CHOU STEPHEN Y | 2010-09-16 | — | — | US | disclosed |
| US-20080217813-A1 | RELEASE SURFACES, PARTICULARLY FOR USE IN NANOIMPRINT LITHOGRAPHY | CHOU STEPHEN Y | 2008-09-11 | — | — | US | disclosed |
| US-20080164637-A1 | RELEASE SURFACES, PARTICULARLY FOR USE IN NANOIMPRINT LITHOGRAPHY | CHOU STEPHEN Y | 2008-07-10 | — | — | US | disclosed |
| US-20080143019-A1 | RELEASE SURFACES, PARTICULARLY FOR USE IN NANOIMPRINT LITHOGRAPHY | CHOU STEPHEN Y | 2008-06-19 | — | — | US | disclosed |
| US-20080131623-A1 | METHOD AND APPARATUS TO APPLY SURFACE RELEASE COATING FOR IMPRINT MOLD | NANONEX CORPORATION | 2008-06-05 | — | — | US | disclosed |
| US-7114938-B2 | Lithographic apparatus for molding ultrafine features | REGENTS OF THE UNIVERSITY OF MINNESOTA (US) | 2006-10-03 | — | — | US | disclosed |
| US-20060127522-A1 | LITHOGRAPHIC APPARATUS FOR MOLDING ULTRAFINE FEATURES | CHOU STEPHEN Y | 2006-06-15 | — | — | US | disclosed |
| US-20050146079-A1 | Lithographic method for molding a pattern | CHOU STEPHEN Y (US) | 2005-07-07 | — | — | US | disclosed |
| US-20030080472-A1 | Lithographic method with bonded release layer for molding small patterns | CHOU STEPHEN Y (US) | 2003-05-01 | — | — | US | disclosed |
| US-20030080471-A1 | Lithographic method for molding pattern with nanoscale features | CHOU STEPHEN Y (US) | 2003-05-01 | — | — | US | disclosed |
| US-20030034329-A1 | Lithographic method for molding pattern with nanoscale depth | CHOU STEPHEN Y (US) | 2003-02-20 | — | — | US | disclosed |
| US-20020167117-A1 | Depositing film on substrate to provide a mold having a protruding feature and recess; urging mold into film whereby thickness of film under protruding feature is reduced and thin region is formed in film; removing mold; processing relief | REGENTS OF THE UNIVERSITY OF MINNESOTA | 2002-11-14 | — | — | US | disclosed |
| US-6309580-B1 | Release surfaces, particularly for use in nanoimprint lithography | REGENTS OF THE UNIVERSITY OF MINNESOTA | 2001-10-30 | — | — | US | disclosed |
| WO-2000000868-A9 | SURFACES WITH RELEASE AGENT | UNIV MINNESOTA (US) | 2000-03-23 | — | — | WO | disclosed |
| WO-2000000868-A1 | SURFACES WITH RELEASE AGENT | REGENTS OF THE UNIVERSITY OF MINNESOTA (US) | 2000-01-06 | — | — | WO | disclosed |