SCHEMBL20525465

SCHEMBL20525465

CC(CN)C(N)C1CCC(C(N)C(C)CN)CC1

nearest known ligand 0.38

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.38
EPHX1 P07099 1/20 0.33
TP53 P04637 1/20 0.31
KDM4E B2RXH2 1/20 0.30
GMNN O75496 1/20 0.30
LMNA P02545 1/20 0.30
MAPT P10636 1/20 0.30
BLM P54132 1/20 0.30
PMP22 Q01453 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17740802 0.88 EPHX1 (0.50) ALDH1A1EPHX1TP53KDM4EGMNN
SCHEMBL16169037 0.79
SCHEMBL17509728 0.78 ANPEP (0.33)
SCHEMBL22507716 0.72 EPHX1 (0.32) ALDH1A1EPHX1TP53
SCHEMBL1086729 0.71
SCHEMBL19020235 0.71
SCHEMBL12960411 0.71
SCHEMBL4760397 0.71
SCHEMBL18473174 0.70 EPHX1 (0.41) ALDH1A1EPHX1TP53KDM4EGMNN
Hydrochloric Acid SCHEMBL1086203 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3180382-B1 AMINE FOR LOW-EMISSION EPOXY RESIN COMPOSITIONS SIKA TECH AG (CH) 2018-10-10 EP claimed
EP-3180382-B1 AMINE FOR LOW-EMISSION EPOXY RESIN COMPOSITIONS SIKA TECH AG (CH) 2018-10-10 EP disclosed