SCHEMBL20544142

SCHEMBL20544142

CC1C[CH]CC(C)C1N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3621638 1.00
SCHEMBL575445 0.78
SCHEMBL2368904 0.77
SCHEMBL7799129 0.72
SCHEMBL4165773 0.67
SCHEMBL11265925 0.67
SCHEMBL11124376 0.67
SCHEMBL9369110 0.67
SCHEMBL1766118 0.65
SCHEMBL219662 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104672888-B Polyamide molding material comprising cyclic olefine copolymer 埃姆斯·帕特恩特股份有限公司 2018-04-24 CN claimed
CN-107936552-A The polyamide mold plastic of glass filler enhancing based on amorphous copolyamide EMS专利股份公司 2018-04-20 CN claimed
CN-107108388-B Composition comprising (thio) phosphoric triamide and other compounds such as amines and colorants with improved urease-inhibiting effect 巴斯夫欧洲公司 2021-02-26 CN disclosed
CN-112374933-A Composition comprising (thio) phosphoric triamide and other compounds such as amines and colorants with improved urease-inhibiting effect 巴斯夫欧洲公司 2021-02-19 CN disclosed
CN-110016136-A Novel tetracarboxylic dianhydride, polyimide resin and its manufacturing method, photosensitive resin composition, pattern forming method 信越化学工业株式会社 2019-07-16 CN disclosed
EP-3394139-A1 POLYURETHANE COMPOSITION WITH LOWER PLASTICISER MIGRATION Sika Technology AG (CH) 2018-10-31 EP disclosed
CN-103403058-B polymer compositions and methods 诺沃梅尔公司 2016-12-21 CN disclosed