SCHEMBL2054686

SCHEMBL2054686

CB1OCC(C)(C)CO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17320894 0.75
SCHEMBL23352973 0.75
SCHEMBL13768253 0.71
SCHEMBL4432884 0.71
SCHEMBL13737727 0.71
SCHEMBL13857693 0.71
SCHEMBL18078703 0.71
SCHEMBL7130845 0.69
SCHEMBL7130848 0.69
SCHEMBL18732206 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 507 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12029744-B2 Bicyclic heteroaryl derivatives as ectonucleotide pyrophosphatase phosphodiesterase 1 inhibitors RIBOSCIENCE LLC (US) 2024-07-09 US disclosed
WO-2024135401-A1 INK COMPOSITION FOR PRODUCTION OF PHOTOELECTRIC CONVERSION ELEMENTS, METHOD FOR PRODUCING INK COMPOSITION FOR PRODUCTION OF PHOTOELECTRIC CONVERSION ELEMENTS, HIGH-MOLECULAR-WEIGHT COMPOUND, AND METHOD FOR PRODUCING HIGH-MOLECULAR-WEIGHT COMPOUND 住友化学株式会社 2024-06-27 WO disclosed
US-11803122-B2 Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound TOKYO OHKA KOGYO CO., LTD. (JP) 2023-10-31 US disclosed
US-11803122-B2 Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound TOKYO OHKA KOGYO CO., LTD. (JP) 2023-10-31 US disclosed
US-20230331640-A1 PRODUCTION METHOD FOR RADIOLABELED ARYL COMPOUND OSAKA UNIVERSITY (JP) 2023-10-19 US disclosed
US-20230331640-A1 PRODUCTION METHOD FOR RADIOLABELED ARYL COMPOUND OSAKA UNIVERSITY (JP) 2023-10-19 US disclosed
WO-2023181952-A1 COMPOUND, POLYMER COMPOUND, COMPOSITION, AND LIGHT EMITTING DEVICE 住友化学株式会社 2023-09-28 WO disclosed
EP-3932927-B1 METAL COMPLEX AND COMPOSITION INCLUDING SAID METAL COMPLEX SUMITOMO CHEMICAL CO (JP) 2023-09-27 EP disclosed
US-11754926-B2 Method of forming resist pattern, resist composition and method of producing the same TOKYO OHKA KOGYO CO., LTD. (JP) 2023-09-12 US disclosed
US-11754926-B2 Method of forming resist pattern, resist composition and method of producing the same TOKYO OHKA KOGYO CO., LTD. (JP) 2023-09-12 US disclosed
US-7390670-B2 Signalling compounds and methods for detecting hydrogen peroxide LUMIGEN, INC. (US) 2008-06-24 US disclosed
EP-1892234-A1 NOVEL ARYL COMPOUND Sumitomo Chemical Company, Limited (JP) 2008-02-27 EP disclosed
EP-1892258-A1 PROCESS FOR PRODUCING POLYMER Sumitomo Chemical Company, Limited (JP) 2008-02-27 EP disclosed
US-20080015351-A1 Fluoroboron compound, aminomethylating agent for aromatic ring made of the same, and production method of compound containing aminomethyl aromatic ring using aminomethylating agent EISAI R&D MANAGEMENT CO., LTD. 2008-01-17 US disclosed
US-20070122656-A1 Electroluminescent device containing an anthracene derivative EASTMAN KODAK COMPANY 2007-05-31 US disclosed
US-20070122657-A1 Electroluminescent device containing a phenanthroline derivative EASTMAN KODAK COMPANY 2007-05-31 US disclosed
US-20070080628-A1 Electroluminescent devices comprising 2-(p-triphenyl)-3-phenyl-pyrazine derivatives CIBA SPECIALTY CHEMICALS CORP. 2007-04-12 US disclosed
US-20070045592-A1 Process for the polymerisation of thiophene or selenophene compounds FLEXENABLE TECHNOLOGY LIMITED (GB) 2007-03-01 US disclosed
US-20070045592-A1 Process for the polymerisation of thiophene or selenophene compounds FLEXENABLE TECHNOLOGY LIMITED (GB) 2007-03-01 US disclosed
EP-1754736-A1 Process for the polymerisation of thiophene or selenophene derivatives Merck Patent GmbH (DE) 2007-02-21 EP disclosed