⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16492082 | 1.00 | — | — | |
| SCHEMBL14422129 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL31119193 | 0.97 | — | — | |
| SCHEMBL13108001 | 0.85 | — | — | |
| SCHEMBL516493 | 0.84 | TSHR (0.32) | — | |
| SCHEMBL22157502 | 0.78 | — | — | |
| SCHEMBL16234553 | 0.78 | — | — | |
| SCHEMBL13788752 | 0.77 | — | — | |
| SCHEMBL16409485 | 0.77 | — | — | |
| SCHEMBL15834623 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108369907-B | Liquid composition and method for surface treatment of semiconductor substrate using same | 三菱瓦斯化学株式会社 | 2022-09-20 | — | — | CN | claimed |
| US-11094526-B2 | Liquid composition for imparting alcohol-repellency to semiconductor substrate material, and method for treating surface of semiconductor substrate using said liquid composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-08-17 | — | — | US | claimed |
| EP-3404700-B1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-05-13 | — | — | EP | claimed |
| US-20190019672-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-01-17 | — | — | US | claimed |
| EP-3404700-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-11-21 | — | — | EP | claimed |
| CN-108369907-A | Liquid composition for imparting alcohol repellency to semiconductor substrate material and method for surface treatment of semiconductor substrate using the same | 三菱瓦斯化学株式会社 | 2018-08-03 | — | — | CN | claimed |
| CN-108369907-B | Liquid composition and method for surface treatment of semiconductor substrate using same | 三菱瓦斯化学株式会社 | 2022-09-20 | — | — | CN | disclosed |
| EP-3884019-A1 | HOME CARE COMPOSITIONS | Colgate-Palmolive Company (US) | 2021-09-29 | — | — | EP | disclosed |
| US-11094526-B2 | Liquid composition for imparting alcohol-repellency to semiconductor substrate material, and method for treating surface of semiconductor substrate using said liquid composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-08-17 | — | — | US | disclosed |
| CN-113227340-A | Home care compositions | 高露洁-棕榄公司 | 2021-08-06 | — | — | CN | disclosed |
| US-11008533-B2 | Home care compositions | COLGATE-PALMOLIVE COMPANY (US) | 2021-05-18 | — | — | US | disclosed |
| US-20200208081-A1 | HOME CARE COMPOSITIONS | COLGATE-PALMOLIVE COMPANY (US) | 2020-07-02 | — | — | US | disclosed |
| WO-2020139335-A1 | HOME CARE COMPOSITIONS | COLGATE-PALMOLIVE COMPANY (US) | 2020-07-02 | — | — | WO | disclosed |
| EP-3404700-B1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-05-13 | — | — | EP | disclosed |
| US-20190019672-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-01-17 | — | — | US | disclosed |
| EP-3404700-A1 | LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-11-21 | — | — | EP | disclosed |
| CN-108369907-A | Liquid composition for imparting alcohol repellency to semiconductor substrate material and method for surface treatment of semiconductor substrate using the same | 三菱瓦斯化学株式会社 | 2018-08-03 | — | — | CN | disclosed |