Oxygen

Oxygen

SCHEMBL206366

[O][O]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL284956 0.71
SCHEMBL23693 0.71
SCHEMBL29394270 0.71
Charcoal, Activated SCHEMBL1535100 0.71
Formaldehyde SCHEMBL10755982 0.71
SCHEMBL29631432 0.71
Methane SCHEMBL28827571 0.71
Krypton Kr 81M SCHEMBL29644748 0.71
Hydrochloric Acid SCHEMBL10386778 0.50
Bromide SCHEMBL11963742 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2000 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11988960-B2 Organometallic solution based high resolution patterning compositions INPRIA CORPORATION (US) 2024-05-21 US claimed
US-11988958-B2 Organometallic solution based high resolution patterning compositions INPRIA CORPORATION (US) 2024-05-21 US claimed
CN-117980833-A High resolution latent image processing, contrast enhancement and thermal development and apparatus for processing 因普利亚公司 2024-05-03 CN claimed
US-11966159-B2 Organometallic solution based high resolution patterning compositions INPRIA CORPORATION (US) 2024-04-23 US claimed
WO-2023225046-A1 RADIATION SENSITIVE ORGANOTIN COMPOSITIONS HAVING OXYGEN HETEROATOMS IN HYDROCARBYL LIGAND INPRIA CORPORATION (US) 2023-11-23 WO claimed
US-20230374338-A1 RADIATION SENSITIVE ORGANOTIN COMPOSITIONS HAVING OXYGEN HETEROATOMS IN HYDROCARBYL LIGAND INPRIA CORPORATION 2023-11-23 US claimed
EP-4273625-A2 ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND PATTERNING Inpria Corporation (US) 2023-11-08 EP claimed
WO-2023166349-A2 PHENYLUREA DERIVATIVE AND PHARMACEUTICAL USE THEREOF 杭州百诚医药科技股份有限公司 2023-09-07 WO claimed
US-11735721-B2 Positive electrode active material for lithium secondary battery, method for preparing the same and lithium secondary battery including the same LG ENERGY SOLUTION, LTD. 2023-08-22 US claimed
US-20230247813-A1 COMPOSITE COVER PLATE, METHOD FOR PREPARING THE SAME, AND DISPLAY DEVICE CONTAINING COMPOSITE COVER PLATE Xiamen Tianma Display Technology Co., Ltd. (CN) 2023-08-03 US claimed
EP-0065564-A1 METHOD FOR PREPARING HIGH MOLECULAR WEIGHT EPOXY RESINS CONTAINING HYDROLYZED GLYCIDYL GROUPS. DOW CHEMICAL CO (US) 1982-12-01 EP claimed
US-4340713-A IN THE PRESENCE OF HYDROLYSIS CATALYST THE DOW CHEMICAL COMPANY (US) 1982-07-20 US claimed
WO-1982001878-A1 METHOD FOR PREPARING HIGH MOLECULAR WEIGHT EPOXY RESINS CONTAINING HYDROLYZED GLYCIDYL GROUPS DOW CHEMICAL CO (US) 1982-06-10 WO claimed
US-4266975-A CONTAINING METAL PARTICLES, ALKYLENE AND POLYALKYLENE GLYCOLS, A CHROMIC ACID COMPONENT AND A BORIC ACID COMPONENT DIAMOND SHAMROCK CORPORATION (US) 1981-05-12 US claimed
US-4238573-A PHOSPHATED, AMINE NEUTRALIZED EPOXY RESIN E. I. DU PONT DE NEMOURS AND COMPANY (US) 1980-12-09 US claimed
EP-0017243-A1 Anticorrosive coating composition DIAMOND SHAMROCK CORPORATION (US) 1980-10-15 EP claimed
US-4113681-A Thermoplastic polyvinyl chloride-acrylic powder coating composition E. I. DU PONT DE NEMOURS AND COMPANY (US) 1978-09-12 US claimed
US-4111870-A PRIMER COMPOSITION OF AN ACRYLIC EPOXY ESTER GRAFT COPOLYMER, A HIGH MOLECULAR WEIGHT EPOXY RESIN AND A HEAT REACTIVE CONDENSATE E. I. DU PONT DE NEMOURS AND COMPANY (US) 1978-09-05 US claimed
US-4046728-A FINISH FOR METALS E. I. DU PONT DE NEMOURS AND COMPANY (US) 1977-09-06 US claimed
US-3979540-A WEATHERABILITY AND DURABILITY AS AUTOMOBILE ROOF COVERING E. I. DU PONT DE NEMOURS AND COMPANY (US) 1976-09-07 US claimed